Emiel Jozef Melanie Eussen

Person

Margraten, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Stage system and lithographic apparatus comprising such stage system
- Patent number 8,279,407
- Issue date Oct 2, 2012
- ASML Netherlands B.V.
- Ramidin Izair Kamidi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and calibration method
- Patent number 8,248,583
- Issue date Aug 21, 2012
- ASML Netherlands B.V.
- Marinus Aart Van Den Brink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic projection apparatus and method for controlling a supp...
- Patent number 8,174,671
- Issue date May 8, 2012
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and sensor calibration method
- Patent number 7,999,912
- Issue date Aug 16, 2011
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus temperature compensation
- Patent number 7,978,339
- Issue date Jul 12, 2011
- ASML Netherlands B.V.
- Tjarko Adriaan Rudolf Van Empel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,619,207
- Issue date Nov 17, 2009
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,602,489
- Issue date Oct 13, 2009
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement system and lithographic apparatus
- Patent number 7,599,043
- Issue date Oct 6, 2009
- ASML Netherlands B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,557,903
- Issue date Jul 7, 2009
- ASML Netherlands B.V.
- Carolus Johannes Catharina Schoormans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,505,113
- Issue date Mar 17, 2009
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic interferometer system with an absolute measurement sub...
- Patent number 7,474,409
- Issue date Jan 6, 2009
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G01 - MEASURING TESTING
Information Patent Grant
Integrated plane mirror and differential plane mirror interferomete...
- Patent number 7,443,511
- Issue date Oct 28, 2008
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G01 - MEASURING TESTING
Information Patent Grant
Position measurement system and lithographic apparatus
- Patent number 7,348,574
- Issue date Mar 25, 2008
- ASML Netherlands, B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and position measuring method
- Patent number 7,310,130
- Issue date Dec 18, 2007
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a method of calibrating such an apparatus
- Patent number 7,283,249
- Issue date Oct 16, 2007
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, and apparatus and method for measuring an o...
- Patent number 7,242,454
- Issue date Jul 10, 2007
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for manipulation and routing of a metrology beam
- Patent number 7,177,059
- Issue date Feb 13, 2007
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,136,148
- Issue date Nov 14, 2006
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20120242969
- Publication date Sep 27, 2012
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING A...
- Publication number 20120050709
- Publication date Mar 1, 2012
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF A ST...
- Publication number 20110208459
- Publication date Aug 25, 2011
- ASML NETHERLANDS B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20110116066
- Publication date May 19, 2011
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS HAVING A SUBSTRATE SUPPORT WITH OPEN CELL PL...
- Publication number 20100271611
- Publication date Oct 28, 2010
- ASML NETHERLANDS B.V.
- Engelbertus, Antonius, Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Calibration Method
- Publication number 20100007867
- Publication date Jan 14, 2010
- ASML NETHERLANDS B.V.
- Marinus Aart VAN DEN BRINK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stage System and Lithographic Apparatus Comprising Such Stage System
- Publication number 20090279067
- Publication date Nov 12, 2009
- ASML NETHERLANDS B.V.
- Ramidin Izair KAMIDI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENCODER-TYPE MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD...
- Publication number 20090237634
- Publication date Sep 24, 2009
- ASML NETHERLANDS B.V.
- Emiel Jozef Melanie EUSSEN
- G01 - MEASURING TESTING
Information Patent Application
Stage system, lithographic apparatus including such stage system, a...
- Publication number 20090128791
- Publication date May 21, 2009
- ASML NETHERLANDS B.V.
- Willem Herman Gertruda Anna Koenen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Projection Apparatus and Method for Controlling a Supp...
- Publication number 20080319569
- Publication date Dec 25, 2008
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus having encoder type position sensor system
- Publication number 20080291413
- Publication date Nov 27, 2008
- ASML NETHERLANDS B.V.
- Peter Paul Steijaert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and sensor calibration method
- Publication number 20080278702
- Publication date Nov 13, 2008
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080105026
- Publication date May 8, 2008
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, AND APPARATUS AND METHOD FOR MEASURING AN O...
- Publication number 20070146661
- Publication date Jun 28, 2007
- ASML NETHERLANDS B.V.
- Emiel Jozef Melanie Eussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070132980
- Publication date Jun 14, 2007
- ASML NETHERLANDS B.V.
- Carolus Johannes Catharina Schoormans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device and method for manipulation and routing of a metrology beam
- Publication number 20040233494
- Publication date Nov 25, 2004
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Emiel Jozef Melanie Eussen

Person

Patents Grantslast 30 patents

Stage system and lithographic apparatus comprising such stage system

Lithographic apparatus and calibration method

Lithographic projection apparatus and method for controlling a supp...

Lithographic apparatus and sensor calibration method

Lithographic apparatus temperature compensation

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Position measurement system and lithographic apparatus

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic interferometer system with an absolute measurement sub...

Integrated plane mirror and differential plane mirror interferomete...

Position measurement system and lithographic apparatus

Lithographic apparatus and position measuring method

Lithographic apparatus and a method of calibrating such an apparatus

Lithographic apparatus, and apparatus and method for measuring an o...

Device and method for manipulation and routing of a metrology beam

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS

STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING A...

LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF A ST...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS HAVING A SUBSTRATE SUPPORT WITH OPEN CELL PL...

Lithographic Apparatus and Calibration Method

Stage System and Lithographic Apparatus Comprising Such Stage System

ENCODER-TYPE MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD...

Stage system, lithographic apparatus including such stage system, a...

Lithographic Projection Apparatus and Method for Controlling a Supp...

Lithographic apparatus having encoder type position sensor system

Lithographic apparatus and sensor calibration method

Lithographic apparatus and device manufacturing method

LITHOGRAPHIC APPARATUS, AND APPARATUS AND METHOD FOR MEASURING AN O...

Lithographic apparatus and device manufacturing method

Device and method for manipulation and routing of a metrology beam