Emiel Jozef Melanie Eussen

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Position measurement system and lithographic apparatus
- Patent number 10,331,045
- Issue date Jun 25, 2019
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus, lithographic apparatus and method of positioning a...
- Patent number 9,915,880
- Issue date Mar 13, 2018
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 9,696,638
- Issue date Jul 4, 2017
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus, lithographic apparatus and method of positioning a...
- Patent number 9,316,928
- Issue date Apr 19, 2016
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 9,229,340
- Issue date Jan 5, 2016
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement system, lithographic apparatus and device manu...
- Patent number 8,922,756
- Issue date Dec 30, 2014
- ASML Netherlands B.V.
- Willem Herman Gertruda Anna Koenen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus having an encoder type position sensor system
- Patent number 8,836,913
- Issue date Sep 16, 2014
- ASML Netherlands B.V.
- Peter Paul Steijaert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method for correcting a position of a st...
- Patent number 8,781,775
- Issue date Jul 15, 2014
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus having encoder type position sensor system
- Patent number 8,760,615
- Issue date Jun 24, 2014
- ASML Netherlands B.V.
- Peter Paul Steijaert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,730,485
- Issue date May 20, 2014
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus having an encoder position sensor system
- Patent number 8,687,166
- Issue date Apr 1, 2014
- ASML Netherlands B.V.
- Peter Paul Steijaert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Encoder-type measurement system, lithographic apparatus and method...
- Patent number 8,614,783
- Issue date Dec 24, 2013
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus
- Patent number 8,570,492
- Issue date Oct 29, 2013
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage system, lithographic apparatus including such stage system, a...
- Patent number 8,451,454
- Issue date May 28, 2013
- ASML Netherlands B.V.
- Willem Herman Gertruda Anna Koenen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus having a substrate support with open cell pl...
- Patent number 8,400,617
- Issue date Mar 19, 2013
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING A...
- Publication number 20160223917
- Publication date Aug 4, 2016
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20160109812
- Publication date Apr 21, 2016
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20140022527
- Publication date Jan 23, 2014
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANU...
- Publication number 20130050670
- Publication date Feb 28, 2013
- ASML NETHERLANDS B.V.
- Willem Herman Gertruda Anna Koenen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithographic Apparatus Having an Encoder Type Position Sensor System
- Publication number 20120075613
- Publication date Mar 29, 2012
- ASML NETHERLANDS B.V.
- Peter Paul STEIJAERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus having encoder type position sensor system
- Publication number 20090002653
- Publication date Jan 1, 2009
- ASML NETHERLANDS B.V.
- Peter Paul Steijaert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070195296
- Publication date Aug 23, 2007
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus temperature compensation
- Publication number 20070076218
- Publication date Apr 5, 2007
- ASML NETHERLANDS B.V.
- Tjarko Adriaan Rudolf Van Empel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070070313
- Publication date Mar 29, 2007
- ASML NETHERLANDS B.V.
- Emiel Jozef Melanie Eussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Position measurement system and lithographic apparatus
- Publication number 20070052976
- Publication date Mar 8, 2007
- ASML NETHERLANDS B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Position measurement system and lithographic apparatus
- Publication number 20070051160
- Publication date Mar 8, 2007
- ASML NETHERLANDS B.V.
- Wouter Onno Pril
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and a method of calibrating such an apparatus
- Publication number 20060227332
- Publication date Oct 12, 2006
- ASML NETHERLANDS B.V.
- Emiel Jozef Melanie Eussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and position measuring method
- Publication number 20060072089
- Publication date Apr 6, 2006
- ASML NETHERLANDS B.V.
- Emiel Jozef Melanie Eussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic interferometer system
- Publication number 20050248771
- Publication date Nov 10, 2005
- ASML NETHERLANDS B.V.
- Emiel Jozef Melanie Eussen
- G01 - MEASURING TESTING
Information Patent Application
Lithographic interferometer system
- Publication number 20050111005
- Publication date May 26, 2005
- ASML NETHERLANDS B.V.
- Emiel Jozef Melanie Eussen
- G01 - MEASURING TESTING

Emiel Jozef Melanie Eussen

Person

Patents Grantslast 30 patents

Position measurement system and lithographic apparatus

Stage apparatus, lithographic apparatus and method of positioning a...

Lithographic apparatus

Stage apparatus, lithographic apparatus and method of positioning a...

Lithographic apparatus

Position measurement system, lithographic apparatus and device manu...

Lithographic apparatus having an encoder type position sensor system

Lithographic apparatus and method for correcting a position of a st...

Lithographic apparatus having encoder type position sensor system

Lithographic apparatus and device manufacturing method

Lithographic apparatus having an encoder position sensor system

Encoder-type measurement system, lithographic apparatus and method...

Lithographic apparatus

Stage system, lithographic apparatus including such stage system, a...

Lithographic apparatus having a substrate support with open cell pl...

Patents Applicationslast 30 patents

STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING A...

LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS

POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANU...

Lithographic Apparatus Having an Encoder Type Position Sensor System

Lithographic apparatus having encoder type position sensor system

Lithographic apparatus and device manufacturing method

Lithographic apparatus temperature compensation

Lithographic apparatus and device manufacturing method

Position measurement system and lithographic apparatus

Position measurement system and lithographic apparatus

Lithographic apparatus and a method of calibrating such an apparatus

Lithographic apparatus and position measuring method

Lithographic interferometer system

Lithographic interferometer system