Emily F. Gallagher

Person

Burlington, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming an extreme ultraviolet lithography pellicle
- Patent number 11,599,019
- Issue date Mar 7, 2023
- Imec VZW
- Marina Timmermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography device
- Patent number 11,360,380
- Issue date Jun 14, 2022
- Imec VZW
- Joern-Holger Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography scanner
- Patent number 11,181,818
- Issue date Nov 23, 2021
- Imec VZW
- Emily Gallagher
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING
Information Patent Grant
Induced stress for EUV pellicle tensioning
- Patent number 11,163,229
- Issue date Nov 2, 2021
- Imec VZW
- Marina Mariano Juste
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a pellicle
- Patent number 11,092,886
- Issue date Aug 17, 2021
- Imec VZW
- Marina Timmermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a mask
- Patent number 10,720,336
- Issue date Jul 21, 2020
- Imec VZW
- Emily Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a carbon nanotube pellicle membrane
- Patent number 10,712,659
- Issue date Jul 14, 2020
- Imec VZW
- Emily Gallagher
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic reticle system
- Patent number 10,353,284
- Issue date Jul 16, 2019
- Imec VZW
- Rik Jonckheere
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method for fixing phase effects on EUV mask
- Patent number 9,551,924
- Issue date Jan 24, 2017
- International Business Machines Corporation
- Martin Burkhardt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks
- Patent number 9,052,617
- Issue date Jun 9, 2015
- International Business Machines Corporation
- Emily E. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing edge die reflectivity in extreme ultraviolet lithography
- Patent number 8,765,331
- Issue date Jul 1, 2014
- International Business Machines Corporation
- Emily E. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining mask operation activities
- Patent number 8,769,445
- Issue date Jul 1, 2014
- International Business Machines Corporation
- Emily E. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks
- Patent number 8,748,063
- Issue date Jun 10, 2014
- International Business Machines Corporation
- Emily E. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for feature function aware priority printing
- Patent number 8,586,950
- Issue date Nov 19, 2013
- International Business Machines Corporation
- Brian N. Caldwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask program defect test
- Patent number 8,538,129
- Issue date Sep 17, 2013
- International Business Machines Corporation
- Karen D. Badger
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for feature function aware priority printing
- Patent number 8,227,774
- Issue date Jul 24, 2012
- International Business Machines Corporation
- Brian N. Caldwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting lithographic mask flatness using thermally ind...
- Patent number 7,826,038
- Issue date Nov 2, 2010
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for storing and transporting photomasks in fluid
- Patent number 7,537,114
- Issue date May 26, 2009
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting lithographic mask flatness using thermally ind...
- Patent number 7,355,680
- Issue date Apr 8, 2008
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light scattering EUVL mask
- Patent number 7,198,872
- Issue date Apr 3, 2007
- International Business Machines Corporation
- Emily E. Gallagher
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Monolithic hard pellicle
- Patent number 7,110,195
- Issue date Sep 19, 2006
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method for Forming an Extreme Ultraviolet Lithography Pellicle
- Publication number 20210191255
- Publication date Jun 24, 2021
- IMEC vzw
- Marina Timmermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Lithography Device
- Publication number 20210011370
- Publication date Jan 14, 2021
- IMEC vzw
- Joern-Holger Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Scanner
- Publication number 20200209737
- Publication date Jul 2, 2020
- IMEC vzw
- Emily Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Induced Stress for EUV Pellicle Tensioning
- Publication number 20200201169
- Publication date Jun 25, 2020
- IMEC vzw
- Marina Mariano Juste
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Manufacturing a Mask
- Publication number 20190074186
- Publication date Mar 7, 2019
- IMEC vzw
- Emily Gallagher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming a Carbon Nanotube Pellicle Membrane
- Publication number 20180329289
- Publication date Nov 15, 2018
- IMEC vzw
- Emily Gallagher
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic Reticle System
- Publication number 20180329290
- Publication date Nov 15, 2018
- IMEC vzw
- Rik Jonckheere
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Forming a Pellicle
- Publication number 20180329291
- Publication date Nov 15, 2018
- IMEC vzw
- Marina Timmermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE AND METHOD FOR FIXING PHASE EFFECTS ON EUV MASK
- Publication number 20160238924
- Publication date Aug 18, 2016
- International Business Machines Corporation
- Martin Burkhardt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET (EUV) MULTILAYER DEFECT COMPENSATION AND EUV MASKS
- Publication number 20140272687
- Publication date Sep 18, 2014
- International Business Machines Corporation
- Emily E. GALLAGHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING EDGE DIE REFLECTIVITY IN EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20140051015
- Publication date Feb 20, 2014
- International Business Machines Corporation
- Emily E. GALLAGHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET (EUV) MULTILAYER DEFECT COMPENSATION AND EUV MASKS
- Publication number 20140038087
- Publication date Feb 6, 2014
- International Business Machines Corporation
- Emily E. GALLAGHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR FEATURE FUNCTION AWARE PRIORITY PRINTING
- Publication number 20120204136
- Publication date Aug 9, 2012
- International Business Machines Corporation
- Brian Neal CALDWELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING MASK OPERATION ACTIVITIES
- Publication number 20120070064
- Publication date Mar 22, 2012
- International Business Machines Corporation
- Emily E. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR FEATURE FUNCTION AWARE PRIORITY PRINTING
- Publication number 20110165502
- Publication date Jul 7, 2011
- INTERNATIONAL BUINESS MACHINE CORPORATION
- Brian Neal CALDWELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Program Defect Test
- Publication number 20110085723
- Publication date Apr 14, 2011
- International Business Machines Corporation
- Karen D. Badger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR ADJUSTING LITHOGRAPHIC MASK FLATNESS USING THERMALLY IND...
- Publication number 20080131795
- Publication date Jun 5, 2008
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING APPARATUS FOR SEMICONDUTOR FABRICATION
- Publication number 20080093342
- Publication date Apr 24, 2008
- Timothy J. Dalton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Determining Photomask Inspection Capabilities
- Publication number 20070174012
- Publication date Jul 26, 2007
- Karen D. Badger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System And Method For Storing And Transporting Photomasks In Fluid
- Publication number 20070172743
- Publication date Jul 26, 2007
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK REPAIR
- Publication number 20060199082
- Publication date Sep 7, 2006
- International Business Machines Corporation
- Philip S. Flanigan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING APPARATUS FOR SEMICONDUCTOR FABRICATION
- Publication number 20060191638
- Publication date Aug 31, 2006
- International Business Machines Corporation
- Timothy J. Dalton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ADJUSTING LITHOGRAPHIC MASK FLATNESS USING THERMALLY IND...
- Publication number 20060146313
- Publication date Jul 6, 2006
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT SCATTERING EUVL MASK
- Publication number 20050266317
- Publication date Dec 1, 2005
- International Business Machines Corporation
- Emily E. Gallagher
- B82 - NANO-TECHNOLOGY
Information Patent Application
MONOLITHIC HARD PELLICLE
- Publication number 20050243452
- Publication date Nov 3, 2005
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Emily F. Gallagher

Person

Patents Grantslast 30 patents

Method for forming an extreme ultraviolet lithography pellicle

Extreme ultraviolet lithography device

Lithography scanner

Induced stress for EUV pellicle tensioning

Method for forming a pellicle

Method for manufacturing a mask

Method for forming a carbon nanotube pellicle membrane

Lithographic reticle system

Structure and method for fixing phase effects on EUV mask

Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks

Reducing edge die reflectivity in extreme ultraviolet lithography

Method for determining mask operation activities

Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks

Method and system for feature function aware priority printing

Mask program defect test

Method and system for feature function aware priority printing

Method for adjusting lithographic mask flatness using thermally ind...

System and method for storing and transporting photomasks in fluid

Method for adjusting lithographic mask flatness using thermally ind...

Light scattering EUVL mask

Monolithic hard pellicle

Patents Applicationslast 30 patents

Method for Forming an Extreme Ultraviolet Lithography Pellicle

Extreme Ultraviolet Lithography Device

Lithography Scanner

Induced Stress for EUV Pellicle Tensioning

Method for Manufacturing a Mask

Method for Forming a Carbon Nanotube Pellicle Membrane

Lithographic Reticle System

Method for Forming a Pellicle

STRUCTURE AND METHOD FOR FIXING PHASE EFFECTS ON EUV MASK

EXTREME ULTRAVIOLET (EUV) MULTILAYER DEFECT COMPENSATION AND EUV MASKS

REDUCING EDGE DIE REFLECTIVITY IN EXTREME ULTRAVIOLET LITHOGRAPHY

EXTREME ULTRAVIOLET (EUV) MULTILAYER DEFECT COMPENSATION AND EUV MASKS

METHOD AND SYSTEM FOR FEATURE FUNCTION AWARE PRIORITY PRINTING

METHOD FOR DETERMINING MASK OPERATION ACTIVITIES

METHOD AND SYSTEM FOR FEATURE FUNCTION AWARE PRIORITY PRINTING

Mask Program Defect Test

METHOD FOR ADJUSTING LITHOGRAPHIC MASK FLATNESS USING THERMALLY IND...

ETCHING APPARATUS FOR SEMICONDUTOR FABRICATION

Method Of Determining Photomask Inspection Capabilities

System And Method For Storing And Transporting Photomasks In Fluid

MASK REPAIR

ETCHING APPARATUS FOR SEMICONDUCTOR FABRICATION

METHOD FOR ADJUSTING LITHOGRAPHIC MASK FLATNESS USING THERMALLY IND...

LIGHT SCATTERING EUVL MASK

MONOLITHIC HARD PELLICLE