Emmanuel Drege

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Modeling and cross correlation of design predicted criticalities fo...
- Patent number 8,407,630
- Issue date Mar 26, 2013
- Cadence Design Systems, Inc.
- Kevin Chan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods, systems, and computer program product for implementing hot...
- Patent number 8,302,052
- Issue date Oct 30, 2012
- Cadence Design Systems, Inc.
- Brian Lee
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method and system for mask optimization
- Patent number 8,156,450
- Issue date Apr 10, 2012
- Cadence Design Systems, Inc.
- Kevin Chan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for process optimization
- Patent number 8,146,024
- Issue date Mar 27, 2012
- Cadence Design Systems, Inc.
- Kevin Chan
- G05 - CONTROLLING REGULATING
Information Patent Grant
Optical metrology of structures formed on semiconductor wafers usin...
- Patent number 7,831,528
- Issue date Nov 9, 2010
- Tokyo Electron Limited
- Srinivas Doddi
- G01 - MEASURING TESTING
Information Patent Grant
Modeling and cross correlation of design predicted criticalities fo...
- Patent number 7,694,244
- Issue date Apr 6, 2010
- Cadence Design Systems, Inc.
- Kevin Chan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for inspection optimization in design and product...
- Patent number 7,665,048
- Issue date Feb 16, 2010
- Cadence Design Systems, Inc.
- Kevin Chan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical metrology model optimization based on goals
- Patent number 7,588,949
- Issue date Sep 15, 2009
- Tokyo Electron Limited
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selecting a profile model for use in optical metrology using a mach...
- Patent number 7,523,076
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Emmanuel Drege
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model and parameter selection for optical metrology
- Patent number 7,505,153
- Issue date Mar 17, 2009
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selection of wavelengths for integrated circuit optical metrology
- Patent number 7,474,993
- Issue date Jan 6, 2009
- Timbre Technologies, Inc.
- Srinivas Doddi
- G01 - MEASURING TESTING
Information Patent Grant
Selecting a hypothetical profile to use in optical metrology
- Patent number 7,394,554
- Issue date Jul 1, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Model and parameter selection for optical metrology
- Patent number 7,330,279
- Issue date Feb 12, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selection of wavelengths for integrated circuit optical metrology
- Patent number 7,216,045
- Issue date May 8, 2007
- Timbre Technologies, Inc.
- Srinivas Doddi
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology model optimization based on goals
- Patent number 7,171,284
- Issue date Jan 30, 2007
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Edge roughness measurement in optical metrology
- Patent number 7,046,375
- Issue date May 16, 2006
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Metrology hardware adaptation with universal library
- Patent number 6,853,942
- Issue date Feb 8, 2005
- Timbre Technologies, Inc.
- Emmanuel Drege
- G01 - MEASURING TESTING
Information Patent Grant
Integrated circuit profile value determination
- Patent number 6,842,261
- Issue date Jan 11, 2005
- Timbre Technologies, Inc.
- Junwei Bao
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHODS, SYSTEMS, AND COMPUTER PROGRAM PRODUCT FOR IMPLEMENTING HOT...
- Publication number 20100324878
- Publication date Dec 23, 2010
- Cadence Design Systems, Inc.
- Brian LEE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS, SYSTEM, AND COMPUTER PROGRAM PRODCUT FOR IMPLEMENTING COMP...
- Publication number 20100083200
- Publication date Apr 1, 2010
- Cadence Design Systems, Inc.
- Li J. Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL METROLOGY OF STRUCTURES FORMED ON SEMICONDUCTOR WAFERS USIN...
- Publication number 20090198635
- Publication date Aug 6, 2009
- Timbre Technologies, Inc.
- Srinivas Doddi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODEL AND PARAMETER SELECTION FOR OPTICAL METROLOGY
- Publication number 20080151269
- Publication date Jun 26, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR PROCESS OPTIMIZATION
- Publication number 20080148194
- Publication date Jun 19, 2008
- Cadence Design Systems, Inc.
- Kevin Chan
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND SYSTEM FOR INSPECTION OPTIMIZATION
- Publication number 20080148195
- Publication date Jun 19, 2008
- Cadence Design Systems, Inc.
- Kevin Chan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODELING AND CROSS CORRELATION OF DESIGN PREDICTED CRITICALITIES FO...
- Publication number 20080147374
- Publication date Jun 19, 2008
- Cadence Design Systems, Inc.
- Kevin Chan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR MASK OPTIMIZATION
- Publication number 20080148216
- Publication date Jun 19, 2008
- Cadence Design Systems, Inc.
- Kevin Chan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Selection of wavelengths for integrated circuit optical metrology
- Publication number 20070198211
- Publication date Aug 23, 2007
- Timbre Technologies, Inc.
- Srinivas Doddi
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology model optimization based on goals
- Publication number 20070135959
- Publication date Jun 14, 2007
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical metrology model optimization based on goals
- Publication number 20060064280
- Publication date Mar 23, 2006
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Selecting a profile model for use in optical metrology using a mach...
- Publication number 20050192914
- Publication date Sep 1, 2005
- Timbre Technologies, Inc.
- Emmanuel Drege
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Selecting a hypothetical profile to use in optical metrology
- Publication number 20050057748
- Publication date Mar 17, 2005
- TimbreTechnologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology of structures formed on semiconductor wafer using...
- Publication number 20040267397
- Publication date Dec 30, 2004
- Srinivas Doddi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Edge roughness measurement in optical metrology
- Publication number 20040218192
- Publication date Nov 4, 2004
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Diffraction order selection for optical metrology simulation
- Publication number 20040090629
- Publication date May 13, 2004
- Emmanuel Drege
- G01 - MEASURING TESTING
Information Patent Application
Integrated circuit profile value determination
- Publication number 20040039473
- Publication date Feb 26, 2004
- Junwei Bao
- G01 - MEASURING TESTING
Information Patent Application
Model and parameter selection for optical metrology
- Publication number 20040017574
- Publication date Jan 29, 2004
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Selection of wavelengths for integrated circuit optical metrology
- Publication number 20030225535
- Publication date Dec 4, 2003
- Srinivas Doddi
- G01 - MEASURING TESTING
Information Patent Application
Metrology hardware adaptation with universal library
- Publication number 20030187604
- Publication date Oct 2, 2003
- Emmanuel Drege
- G01 - MEASURING TESTING

Emmanuel Drege

Person

Patents Grantslast 30 patents

Modeling and cross correlation of design predicted criticalities fo...

Methods, systems, and computer program product for implementing hot...

Method and system for mask optimization

Method and system for process optimization

Optical metrology of structures formed on semiconductor wafers usin...

Modeling and cross correlation of design predicted criticalities fo...

Method and system for inspection optimization in design and product...

Optical metrology model optimization based on goals

Selecting a profile model for use in optical metrology using a mach...

Model and parameter selection for optical metrology

Selection of wavelengths for integrated circuit optical metrology

Selecting a hypothetical profile to use in optical metrology

Model and parameter selection for optical metrology

Selection of wavelengths for integrated circuit optical metrology

Optical metrology model optimization based on goals

Edge roughness measurement in optical metrology

Metrology hardware adaptation with universal library

Integrated circuit profile value determination

Patents Applicationslast 30 patents

METHODS, SYSTEMS, AND COMPUTER PROGRAM PRODUCT FOR IMPLEMENTING HOT...

METHODS, SYSTEM, AND COMPUTER PROGRAM PRODCUT FOR IMPLEMENTING COMP...

OPTICAL METROLOGY OF STRUCTURES FORMED ON SEMICONDUCTOR WAFERS USIN...

MODEL AND PARAMETER SELECTION FOR OPTICAL METROLOGY

METHOD AND SYSTEM FOR PROCESS OPTIMIZATION

METHOD AND SYSTEM FOR INSPECTION OPTIMIZATION

MODELING AND CROSS CORRELATION OF DESIGN PREDICTED CRITICALITIES FO...

METHOD AND SYSTEM FOR MASK OPTIMIZATION

Selection of wavelengths for integrated circuit optical metrology

Optical metrology model optimization based on goals

Optical metrology model optimization based on goals

Selecting a profile model for use in optical metrology using a mach...

Selecting a hypothetical profile to use in optical metrology

Optical metrology of structures formed on semiconductor wafer using...

Edge roughness measurement in optical metrology

Diffraction order selection for optical metrology simulation

Integrated circuit profile value determination

Model and parameter selection for optical metrology

Selection of wavelengths for integrated circuit optical metrology

Metrology hardware adaptation with universal library