En Hao Lai

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Hsinchu, TW

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Patents Grantslast 30 patents

Information Patent Grant
Particle image velocimetry of extreme ultraviolet lithography systems
- Patent number 11,029,324
- Issue date Jun 8, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- En Hao Lai
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
PARTICLE IMAGE VELOCIMETRY OF EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS
- Publication number 20210294220
- Publication date Sep 23, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- En Hao LAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY