Engelbertus Antonius Fransiscus Van Der Pasch

Person

Oirschot, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Imprint apparatus with movable stages
- Patent number 12,147,167
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus
- Patent number 11,940,739
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 11,914,308
- Issue date Feb 27, 2024
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometer system, method of determining a mode hop of a laser...
- Patent number 11,719,529
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Maarten Jozef Jansen
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus
- Patent number 11,609,503
- Issue date Mar 21, 2023
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometric stage positioning apparatus
- Patent number 11,476,077
- Issue date Oct 18, 2022
- ASML Netherlands B.V.
- Marcel Koenraad Marie Baggen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic error measurements and calibration procedures in interferome...
- Patent number 11,287,242
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Maarten Jozef Jansen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus
- Patent number 11,262,661
- Issue date Mar 1, 2022
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus
- Patent number 10,976,675
- Issue date Apr 13, 2021
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement of optical elements in a lithographic apparatus
- Patent number 10,908,508
- Issue date Feb 2, 2021
- Carl Zeiss SMT GmbH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical device and associated system
- Patent number 10,712,667
- Issue date Jul 14, 2020
- ASML Netherlands B.V.
- Sumant Sukdew Ramanujan Oemrawsingh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,620,553
- Issue date Apr 14, 2020
- ASML Netherlands B.V.
- Jan Steven Christiaan Westerlaken
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 10,571,815
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement of optical elements in a lithographic apparatus
- Patent number 10,509,325
- Issue date Dec 17, 2019
- Carl Zeiss SMT GmbH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 10,466,599
- Issue date Nov 5, 2019
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and apparatus
- Patent number 10,444,635
- Issue date Oct 15, 2019
- ASML Netherlands B.V.
- Carolus Johannes Catharina Schoormans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,345,717
- Issue date Jul 9, 2019
- ASML Netherlands B.V.
- Günes Nakiboglu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement system and lithographic apparatus
- Patent number 10,331,045
- Issue date Jun 25, 2019
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positioning device, lithographic apparatus and device manufacturing...
- Patent number 10,310,392
- Issue date Jun 4, 2019
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement system, interferometer and lithographic apparatus
- Patent number 10,289,011
- Issue date May 14, 2019
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,216,102
- Issue date Feb 26, 2019
- ASML Netherlands B.V.
- Jan Steven Christiaan Westerlaken
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,209,634
- Issue date Feb 19, 2019
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 9,977,348
- Issue date May 22, 2018
- ASML Netherlands B.V.
- Günes Nakiboglu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus, lithographic apparatus and method of positioning a...
- Patent number 9,915,880
- Issue date Mar 13, 2018
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,891,542
- Issue date Feb 13, 2018
- ASML Netherlands B.V.
- Jan Steven Christiaan Westerlaken
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage system and lithographic apparatus comprising such stage system
- Patent number 9,785,060
- Issue date Oct 10, 2017
- ASML Netherlands B.V.
- Ruud Antonius Catharina Maria Beerens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method for measuring a position
- Patent number 9,746,312
- Issue date Aug 29, 2017
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 9,696,638
- Issue date Jul 4, 2017
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for calibration of an encoder scale and a lithographic appar...
- Patent number 9,606,458
- Issue date Mar 28, 2017
- ASML Netherlands B.V.
- Jeroen Dekkers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and displacemen...
- Patent number 9,575,416
- Issue date Feb 21, 2017
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Imprint Apparatus with Movable Stages
- Publication number 20250028259
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Junichi KANEHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus
- Publication number 20240184218
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERFEROMETER SYSTEM, METHOD OF DETERMINING A MODE HOP OF A LASER...
- Publication number 20230324164
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Maarten Jozef JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20230266678
- Publication date Aug 24, 2023
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERFEROMETER SYSTEM, METHOD OF DETERMINING A MODE HOP OF A LASER...
- Publication number 20220205775
- Publication date Jun 30, 2022
- ASML NETHERLANDS B.V.
- Maarten Jozef JANSEN
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY APPARATUS
- Publication number 20220121127
- Publication date Apr 21, 2022
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20210223703
- Publication date Jul 22, 2021
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS
- Publication number 20210149309
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wavelength Tracking System, Method to Calibrate a Wavelength Tracki...
- Publication number 20210072088
- Publication date Mar 11, 2021
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G01 - MEASURING TESTING
Information Patent Application
INTERFEROMETRIC STAGE POSITIONING APPARATUS
- Publication number 20200234911
- Publication date Jul 23, 2020
- ASML NETHERLANDS B.V.
- Marcel Koenraad Marie BAGGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20200159126
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS
- Publication number 20200089126
- Publication date Mar 19, 2020
- Carl Zeiss SMT GMBH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus
- Publication number 20190384184
- Publication date Dec 19, 2019
- ASML NETHERLANDS B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20190377266
- Publication date Dec 12, 2019
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
An Optical Device and Associated Systems
- Publication number 20190377267
- Publication date Dec 12, 2019
- ASML NETHERLANDS B.V.
- Sumant Sukdew Ramanujan OEMRAWSINGH
- G02 - OPTICS
Information Patent Application
CYCLIC ERROR MEASUREMENTS AND CALIBRATION PROCEDURES IN INTERFEROME...
- Publication number 20190265019
- Publication date Aug 29, 2019
- ASML NETHERLANDS B.V.
- Maarten Jozef JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190235398
- Publication date Aug 1, 2019
- ASML NETHERLANDS B.V.
- Jan Steven Christiaan WESTERLAKEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20190187566
- Publication date Jun 20, 2019
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Method and Apparatus
- Publication number 20190163072
- Publication date May 30, 2019
- ASML NETHERLANDS B.V.
- Carolus Johannes Catharina SCHOORMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS
- Publication number 20190086813
- Publication date Mar 21, 2019
- Carl Zeiss SMT GMBH
- Erik Loopstra
- G02 - OPTICS
Information Patent Application
POSITIONING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING...
- Publication number 20180335705
- Publication date Nov 22, 2018
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Method of Operating a Lithographic Appar...
- Publication number 20180329292
- Publication date Nov 15, 2018
- ASML NETHERLANDS B.V.
- Junichi KANEHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20180239258
- Publication date Aug 23, 2018
- ASML NETHERLANDS B.V.
- Günes NAKIBOGLU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASUREMENT SYSTEM, INTERFEROMETER AND LITHOGRAPHIC APPARATUS
- Publication number 20180224757
- Publication date Aug 9, 2018
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180164705
- Publication date Jun 14, 2018
- ASML NETHERLANDS B.V.
- Jan Steven Christiaan WESTERLAKEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180017879
- Publication date Jan 18, 2018
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20170219930
- Publication date Aug 3, 2017
- ASML NETHERLANDS B.V.
- Günes NAKIBOGLU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING A...
- Publication number 20160223917
- Publication date Aug 4, 2016
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20160109812
- Publication date Apr 21, 2016
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MAN...
- Publication number 20150277242
- Publication date Oct 1, 2015
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Engelbertus Antonius Fransiscus Van Der Pasch

Person

Patents Grantslast 30 patents

Imprint apparatus with movable stages

Metrology apparatus

Lithographic apparatus

Interferometer system, method of determining a mode hop of a laser...

Lithographic apparatus

Interferometric stage positioning apparatus

Cyclic error measurements and calibration procedures in interferome...

Metrology apparatus

Lithographic apparatus

Position measurement of optical elements in a lithographic apparatus

Optical device and associated system

Lithographic apparatus and device manufacturing method

Lithographic apparatus

Position measurement of optical elements in a lithographic apparatus

Lithographic apparatus

Lithographic method and apparatus

Lithographic apparatus and method

Position measurement system and lithographic apparatus

Positioning device, lithographic apparatus and device manufacturing...

Position measurement system, interferometer and lithographic apparatus

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and method

Stage apparatus, lithographic apparatus and method of positioning a...

Lithographic apparatus and device manufacturing method

Stage system and lithographic apparatus comprising such stage system

Lithographic apparatus and method for measuring a position

Lithographic apparatus

Method for calibration of an encoder scale and a lithographic appar...

Lithographic apparatus, device manufacturing method and displacemen...

Patents Applicationslast 30 patents

Imprint Apparatus with Movable Stages

Metrology Apparatus

INTERFEROMETER SYSTEM, METHOD OF DETERMINING A MODE HOP OF A LASER...

LITHOGRAPHIC APPARATUS

INTERFEROMETER SYSTEM, METHOD OF DETERMINING A MODE HOP OF A LASER...

METROLOGY APPARATUS

LITHOGRAPHIC APPARATUS

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS

Wavelength Tracking System, Method to Calibrate a Wavelength Tracki...

INTERFEROMETRIC STAGE POSITIONING APPARATUS

LITHOGRAPHIC APPARATUS

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS

Metrology Apparatus

LITHOGRAPHIC APPARATUS

An Optical Device and Associated Systems

CYCLIC ERROR MEASUREMENTS AND CALIBRATION PROCEDURES IN INTERFEROME...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS

Lithographic Method and Apparatus

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS

POSITIONING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING...

Lithographic Apparatus and Method of Operating a Lithographic Appar...

LITHOGRAPHIC APPARATUS AND METHOD

POSITION MEASUREMENT SYSTEM, INTERFEROMETER AND LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND METHOD

STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING A...

LITHOGRAPHIC APPARATUS

SUBSTRATE POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MAN...