Eran Amit

Person

Pardes Hanna-Karkur, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology target design for tilted device designs
- Patent number 12,117,347
- Issue date Oct 15, 2024
- KLA Corporation
- Myungjun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for assessing performance
- Patent number 11,756,687
- Issue date Sep 12, 2023
- MOTIONIZE ISRAEL LTD.
- Yoav Wegrzyn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Device-like metrology targets
- Patent number 11,709,433
- Issue date Jul 25, 2023
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for providing a quality metric for improved proce...
- Patent number 11,372,340
- Issue date Jun 28, 2022
- KLA Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Machine learning in metrology measurements
- Patent number 11,248,905
- Issue date Feb 15, 2022
- KLA-Tencor Corporation
- Eran Amit
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay measurement using multiple wavelengths
- Patent number 11,158,548
- Issue date Oct 26, 2021
- KLA-Tencor Corporation
- Yuval Lamhot
- G01 - MEASURING TESTING
Information Patent Grant
Single cell grey scatterometry overlay targets and their measuremen...
- Patent number 11,119,417
- Issue date Sep 14, 2021
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Enhancing metrology target information content
- Patent number 11,085,754
- Issue date Aug 10, 2021
- KLA Corporation
- Eran Amit
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System for combined imaging and scatterometry metrology
- Patent number 11,067,904
- Issue date Jul 20, 2021
- KLA Corporation
- Eran Amit
- G01 - MEASURING TESTING
Information Patent Grant
Polarization measurements of metrology targets and corresponding ta...
- Patent number 11,060,845
- Issue date Jul 13, 2021
- KLA Corporation
- Eran Amit
- G01 - MEASURING TESTING
Information Patent Grant
Device metrology targets and methods
- Patent number 11,054,752
- Issue date Jul 6, 2021
- KLA Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for gait analysis
- Patent number 11,006,860
- Issue date May 18, 2021
- MOTIONIZE ISRAEL LTD.
- Eran Amit
- A43 - FOOTWEAR
Information Patent Grant
Recipe optimization based zonal analysis
- Patent number 10,763,146
- Issue date Sep 1, 2020
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quick adjustment of metrology measurement parameters according to p...
- Patent number 10,699,969
- Issue date Jun 30, 2020
- KLA-Tencor Corporation
- Einat Peled
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology using overlay and yield critical patterns
- Patent number 10,685,165
- Issue date Jun 16, 2020
- KLA-Tencor Corporation
- Daniel Kandel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay measurement using phase and amplitude modeling
- Patent number 10,622,238
- Issue date Apr 14, 2020
- KLA-Tencor Corporation
- Nadav Gutman
- G01 - MEASURING TESTING
Information Patent Grant
Device metrology targets and methods
- Patent number 10,571,811
- Issue date Feb 25, 2020
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology targets with supplementary structures in an intermediate...
- Patent number 10,551,749
- Issue date Feb 4, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound imaging metrology targets
- Patent number 10,527,951
- Issue date Jan 7, 2020
- KLA-Tencor Corporation
- Raviv Yohanan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target location in semiconductor manufacturing
- Patent number 10,504,802
- Issue date Dec 10, 2019
- KLA-Tencor Corporation
- Naomi Ittah
- G01 - MEASURING TESTING
Information Patent Grant
Overlay measurements of overlapping target structures based on symm...
- Patent number 10,473,460
- Issue date Nov 12, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polarization measurements of metrology targets and corresponding ta...
- Patent number 10,458,777
- Issue date Oct 29, 2019
- KLA-Tencor Corporation
- Eran Amit
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Estimating and eliminating inter-cell process variation inaccuracy
- Patent number 10,415,963
- Issue date Sep 17, 2019
- KLA-Tencor Corporation
- Tal Marciano
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Identifying registration errors of DSA lines
- Patent number 10,401,841
- Issue date Sep 3, 2019
- KLA-Tencor Corporation
- Roie Volkovich
- G05 - CONTROLLING REGULATING
Information Patent Grant
Scatterometry overlay based on reflection peak locations
- Patent number 10,365,230
- Issue date Jul 30, 2019
- KLA-Tencor Corporation
- Eran Amit
- G01 - MEASURING TESTING
Information Patent Grant
Lithography systems with integrated metrology tools having enhanced...
- Patent number 10,331,050
- Issue date Jun 25, 2019
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for direct self assembly in target design and...
- Patent number 10,303,835
- Issue date May 28, 2019
- KLA-Tencor Corporation
- Eran Amit
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology target for combined imaging and scatterometry metrology
- Patent number 10,274,837
- Issue date Apr 30, 2019
- KLA-Tencor Corporation
- Eran Amit
- G01 - MEASURING TESTING
Information Patent Grant
On-product derivation and adjustment of exposure parameters in a di...
- Patent number 10,025,285
- Issue date Jul 17, 2018
- KLA-Tencor Corporation
- Roie Volkovich
- G05 - CONTROLLING REGULATING
Information Patent Grant
Removing process-variation-related inaccuracies from scatterometry...
- Patent number 9,874,527
- Issue date Jan 23, 2018
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method and System for Providing a Quality Metric for Improved Proce...
- Publication number 20230051705
- Publication date Feb 16, 2023
- KLA Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR ASSESSING PERFORMANCE
- Publication number 20220415515
- Publication date Dec 29, 2022
- Motionize Israel Ltd.
- Yoav WEGRZYN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICE-LIKE METROLOGY TARGETS
- Publication number 20220197152
- Publication date Jun 23, 2022
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Machine Learning in Metrology Measurements
- Publication number 20220107175
- Publication date Apr 7, 2022
- KLA-Tencor Corporation
- Eran AMIT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR GAIT ANALYSIS
- Publication number 20210386325
- Publication date Dec 16, 2021
- Motionize Israel Ltd.
- Eran AMIT
- A43 - FOOTWEAR
Information Patent Application
Single Cell Grey Scatterometry Overlay Targets and Their Measuremen...
- Publication number 20210373445
- Publication date Dec 2, 2021
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY MEASUREMENT USING MULTIPLE WAVELENGTHS
- Publication number 20200381312
- Publication date Dec 3, 2020
- KLA-Tencor Corporation
- Yuval Lamhot
- G01 - MEASURING TESTING
Information Patent Application
Single Cell Grey Scatterometry Overlay Targets and Their Measuremen...
- Publication number 20200159129
- Publication date May 21, 2020
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
POLARIZATION MEASUREMENTS OF METROLOGY TARGETS AND CORRESPONDING TA...
- Publication number 20200158492
- Publication date May 21, 2020
- KLA-Tencor Corporation
- Eran AMIT
- G01 - MEASURING TESTING
Information Patent Application
DEVICE-LIKE METROLOGY TARGETS
- Publication number 20200124981
- Publication date Apr 23, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Overlay Measurement Using Phase and Amplitude Modeling
- Publication number 20190378737
- Publication date Dec 12, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMBINED IMAGING AND SCATTEROMETRY METROLOGY
- Publication number 20190250521
- Publication date Aug 15, 2019
- KLA-Tencor Corporation
- Eran AMIT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Overlay Measurements of Overlapping Target Structures Based on Symm...
- Publication number 20190178639
- Publication date Jun 13, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- G01 - MEASURING TESTING
Information Patent Application
Enhancing Metrology Target Information Content
- Publication number 20190178630
- Publication date Jun 13, 2019
- KLA-Tencor Corporation
- Eran Amit
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Recipe Optimization Based Zonal Analysis
- Publication number 20190088514
- Publication date Mar 21, 2019
- KLA-Tencor Corporation
- Roie VOLKOVICH
- G01 - MEASURING TESTING
Information Patent Application
Machine Learning in Metrology Measurements
- Publication number 20190086200
- Publication date Mar 21, 2019
- KLA-Tencor Corporation
- Eran AMIT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Quick Adjustment Of Metrology Measurement Parameters According To P...
- Publication number 20190074227
- Publication date Mar 7, 2019
- Einat Peled
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE METROLOGY TARGETS AND METHODS
- Publication number 20190004438
- Publication date Jan 3, 2019
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Systems with Integrated Metrology Tools Having Enhanced...
- Publication number 20180299791
- Publication date Oct 18, 2018
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Target Location in Semiconductor Manufacturing
- Publication number 20180301385
- Publication date Oct 18, 2018
- KLA-Tencor Corporation
- Naomi Ittah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device-Like Metrology Targets
- Publication number 20180188663
- Publication date Jul 5, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS
- Publication number 20170023358
- Publication date Jan 26, 2017
- KLA-Tencor Corporation
- Myungjun Lee
- G01 - MEASURING TESTING
Information Patent Application
DEVICE METROLOGY TARGETS AND METHODS
- Publication number 20160266505
- Publication date Sep 15, 2016
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY USING OVERLAY AND YIELD CRITICAL PATTERNS
- Publication number 20160253450
- Publication date Sep 1, 2016
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
COMPOUND IMAGING METROLOGY TARGETS
- Publication number 20160179017
- Publication date Jun 23, 2016
- KLA-Tencor Corporation
- Raviv YOHANAN
- G02 - OPTICS
Information Patent Application
POLARIZATION MEASUREMENTS OF METROLOGY TARGETS AND CORRESPONDING TA...
- Publication number 20160178351
- Publication date Jun 23, 2016
- KLA-Tencor Corporation
- Eran AMIT
- G01 - MEASURING TESTING
Information Patent Application
IDENTIFYING REGISTRATION ERRORS OF DSA LINES
- Publication number 20160018819
- Publication date Jan 21, 2016
- KLA-Tencor Corporation
- Roie VOLKOVICH
- G05 - CONTROLLING REGULATING
Information Patent Application
REMOVING PROCESS-VARIATION-RELATED INACCURACIES FROM SCATTEROMETRY...
- Publication number 20150316490
- Publication date Nov 5, 2015
- KLA-Tencor Corporation
- Eran Amit
- G01 - MEASURING TESTING
Information Patent Application
ON-PRODUCT DERIVATION AND ADJUSTMENT OF EXPOSURE PARAMETERS IN A DI...
- Publication number 20150301514
- Publication date Oct 22, 2015
- KLA-Tencor Corporation
- Roie VOLKOVICH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESTIMATING AND ELIMINATING INTER-CELL PROCESS VARIATION INACCURACY
- Publication number 20150292877
- Publication date Oct 15, 2015
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Metrology target design for tilted device designs

Method and system for assessing performance

Device-like metrology targets

Method and system for providing a quality metric for improved proce...

Machine learning in metrology measurements

Overlay measurement using multiple wavelengths

Single cell grey scatterometry overlay targets and their measuremen...

Enhancing metrology target information content

System for combined imaging and scatterometry metrology

Polarization measurements of metrology targets and corresponding ta...

Device metrology targets and methods

Method and apparatus for gait analysis

Recipe optimization based zonal analysis

Quick adjustment of metrology measurement parameters according to p...

Metrology using overlay and yield critical patterns

Overlay measurement using phase and amplitude modeling

Device metrology targets and methods

Metrology targets with supplementary structures in an intermediate...

Compound imaging metrology targets

Target location in semiconductor manufacturing

Overlay measurements of overlapping target structures based on symm...

Polarization measurements of metrology targets and corresponding ta...

Estimating and eliminating inter-cell process variation inaccuracy

Identifying registration errors of DSA lines

Scatterometry overlay based on reflection peak locations

Lithography systems with integrated metrology tools having enhanced...

Method and apparatus for direct self assembly in target design and...

Metrology target for combined imaging and scatterometry metrology

On-product derivation and adjustment of exposure parameters in a di...

Removing process-variation-related inaccuracies from scatterometry...

Patents Applicationslast 30 patents

Method and System for Providing a Quality Metric for Improved Proce...

METHOD AND SYSTEM FOR ASSESSING PERFORMANCE

DEVICE-LIKE METROLOGY TARGETS

Machine Learning in Metrology Measurements

METHOD AND APPARATUS FOR GAIT ANALYSIS

Single Cell Grey Scatterometry Overlay Targets and Their Measuremen...

OVERLAY MEASUREMENT USING MULTIPLE WAVELENGTHS

Single Cell Grey Scatterometry Overlay Targets and Their Measuremen...

POLARIZATION MEASUREMENTS OF METROLOGY TARGETS AND CORRESPONDING TA...

DEVICE-LIKE METROLOGY TARGETS

Overlay Measurement Using Phase and Amplitude Modeling

COMBINED IMAGING AND SCATTEROMETRY METROLOGY

Overlay Measurements of Overlapping Target Structures Based on Symm...

Enhancing Metrology Target Information Content

Recipe Optimization Based Zonal Analysis

Machine Learning in Metrology Measurements

Quick Adjustment Of Metrology Measurement Parameters According To P...

DEVICE METROLOGY TARGETS AND METHODS

Lithography Systems with Integrated Metrology Tools Having Enhanced...

Target Location in Semiconductor Manufacturing

Device-Like Metrology Targets

METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS

DEVICE METROLOGY TARGETS AND METHODS

METROLOGY USING OVERLAY AND YIELD CRITICAL PATTERNS

COMPOUND IMAGING METROLOGY TARGETS

POLARIZATION MEASUREMENTS OF METROLOGY TARGETS AND CORRESPONDING TA...

IDENTIFYING REGISTRATION ERRORS OF DSA LINES

REMOVING PROCESS-VARIATION-RELATED INACCURACIES FROM SCATTEROMETRY...

ON-PRODUCT DERIVATION AND ADJUSTMENT OF EXPOSURE PARAMETERS IN A DI...

ESTIMATING AND ELIMINATING INTER-CELL PROCESS VARIATION INACCURACY