Eric Brian CATEY

Person

Danbury, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Adaptive filter for in-line correction
- Patent number 10,928,738
- Issue date Feb 23, 2021
- ASML Holding N.V.
- Eric Brian Catey
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic cluster, lithographic apparatus, and device manufactur...
- Patent number 10,895,813
- Issue date Jan 19, 2021
- ASML Holding N.V.
- Irit Tzemah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement method comprising in-situ printing of apparatus mark an...
- Patent number 10,481,507
- Issue date Nov 19, 2019
- ASML Holding N.V.
- Kevin J. Violette
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus, lithographic apparatus, and device manufactur...
- Patent number 9,285,687
- Issue date Mar 15, 2016
- ASML Holding N.V.
- Stanislav Y Smirnov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask inspection system
- Patent number 9,046,754
- Issue date Jun 2, 2015
- ASML Holding N.V.
- Harry Sewell
- G01 - MEASURING TESTING
Information Patent Grant
Mask inspection with fourier filtering and image compare
- Patent number 9,041,903
- Issue date May 26, 2015
- ASML Holding N.V.
- Michael L. Nelson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Time differential reticle inspection
- Patent number 8,623,576
- Issue date Jan 7, 2014
- ASML Holding N.V.
- Eric Brian Catey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High numerical aperture catadioptric objectives without obscuration...
- Patent number 8,259,398
- Issue date Sep 4, 2012
- ASML Holding N.V.
- Stanislav Y. Smirnov
- G02 - OPTICS
Information Patent Grant
Reticle inspection systems and method
- Patent number 8,189,203
- Issue date May 29, 2012
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G01 - MEASURING TESTING
Information Patent Grant
High numerical aperture catadioptric objectives without obscuration...
- Patent number 8,064,148
- Issue date Nov 22, 2011
- ASML Holding N.V.
- Stanislav Y. Smirnov
- G02 - OPTICS
Information Patent Grant
System and method for uniformity correction
- Patent number 7,525,641
- Issue date Apr 28, 2009
- ASML Holding N.V.
- Richard C. Zimmerman
- G02 - OPTICS
Information Patent Grant
Removable cover for protecting a reticle, system including and meth...
- Patent number 6,239,863
- Issue date May 29, 2001
- Silicon Valley Group, Inc.
- Eric B. Catey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK
- Publication number 20240263941
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Rui CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Cluster, Lithographic Apparatus, and Device Manufactur...
- Publication number 20200326640
- Publication date Oct 15, 2020
- ASML Holding N.V.
- Irit TZEMAH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adaptive Filter for In-Line Correction
- Publication number 20190227443
- Publication date Jul 25, 2019
- ASML Holding N.V.
- Eric Brian CATEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT METHOD COMPRISING IN-SITU PRINTING OF APPARATUS MARK AN...
- Publication number 20190196341
- Publication date Jun 27, 2019
- ASML Holding N.V.
- Kevin J VIOLETTE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Apparatus, Lithographic Apparatus, and Device Manufactur...
- Publication number 20130083306
- Publication date Apr 4, 2013
- ASML Holding N.V.
- Stanislav Y. Smirnov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Holographic Mask Inspection System with Spatial Filter
- Publication number 20120281197
- Publication date Nov 8, 2012
- ASML NETHERLANDS B.V.
- Robert Albert Tharaldsen
- G01 - MEASURING TESTING
Information Patent Application
Time Differential Reticle Inspection
- Publication number 20120171600
- Publication date Jul 5, 2012
- ASML Holding N.V.
- Eric Brian Catey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Inspection with Fourier Filtering and Image Compare
- Publication number 20120075606
- Publication date Mar 29, 2012
- Michael L. Nelson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High Numerical Aperture Catadioptric Objectives without Obscuration...
- Publication number 20120026607
- Publication date Feb 2, 2012
- ASML Holding N.V.
- Stanislav Y. SMIRNOV
- G02 - OPTICS
Information Patent Application
Reticle Inspection Systems and Method
- Publication number 20100149548
- Publication date Jun 17, 2010
- ASML Holding N.V.
- YEVGENIY KONSTANTINOVICH SHMAREV
- G01 - MEASURING TESTING
Information Patent Application
EUV Mask Inspection System
- Publication number 20100149505
- Publication date Jun 17, 2010
- ASML Holding N.V.
- Harry SEWELL
- G01 - MEASURING TESTING
Information Patent Application
High Numerical Aperture Catadioptric Objectives Without Obscuration...
- Publication number 20090257053
- Publication date Oct 15, 2009
- ASML Holding N.V.
- Stanislav Y. SMIRNOV
- G02 - OPTICS
Information Patent Application
System and method for uniformity correction
- Publication number 20070103665
- Publication date May 10, 2007
- ASML Holding N.V.
- Richard C. Zimmerman
- G02 - OPTICS
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20040160583
- Publication date Aug 19, 2004
- ASML NETHERLANDS B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Eric Brian CATEY

Person

Patents Grantslast 30 patents

Adaptive filter for in-line correction

Lithographic cluster, lithographic apparatus, and device manufactur...

Measurement method comprising in-situ printing of apparatus mark an...

Inspection apparatus, lithographic apparatus, and device manufactur...

EUV mask inspection system

Mask inspection with fourier filtering and image compare

Time differential reticle inspection

High numerical aperture catadioptric objectives without obscuration...

Reticle inspection systems and method

High numerical aperture catadioptric objectives without obscuration...

System and method for uniformity correction

Removable cover for protecting a reticle, system including and meth...

Patents Applicationslast 30 patents

INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK

Lithographic Cluster, Lithographic Apparatus, and Device Manufactur...

Adaptive Filter for In-Line Correction

MEASUREMENT METHOD COMPRISING IN-SITU PRINTING OF APPARATUS MARK AN...

Inspection Apparatus, Lithographic Apparatus, and Device Manufactur...

Holographic Mask Inspection System with Spatial Filter

Time Differential Reticle Inspection

Mask Inspection with Fourier Filtering and Image Compare

High Numerical Aperture Catadioptric Objectives without Obscuration...

Reticle Inspection Systems and Method

EUV Mask Inspection System

High Numerical Aperture Catadioptric Objectives Without Obscuration...

System and method for uniformity correction

Lithographic apparatus, device manufacturing method, and device man...