Eric J. Kirchner

Person

Gersham, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated circuit process monitoring and metrology system
- Patent number 7,115,425
- Issue date Oct 3, 2006
- LSI Logic Corporation
- Peter A. Burke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit process monitoring and metrology system
- Patent number 6,964,924
- Issue date Nov 15, 2005
- LSI Logic Corporation
- Peter A. Burke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Through-pad drainage of slurry during chemical mechanical polishing
- Patent number 6,692,338
- Issue date Feb 17, 2004
- LSI Logic Corporation
- Eric J. Kirchner
- B24 - GRINDING POLISHING
Information Patent Grant
Photolithography overlay control
- Patent number 6,472,316
- Issue date Oct 29, 2002
- LSI Logic Corporation
- James R. B. Elmer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modifying contact areas of a polishing pad to promote uniform remov...
- Patent number 6,254,456
- Issue date Jul 3, 2001
- LSI Logic Corporation
- Eric J. Kirchner
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical-mechanical polishing pad conditioning systems
- Patent number 6,093,280
- Issue date Jul 25, 2000
- LSI Logic Corporation
- Eric J. Kirchner
- B24 - GRINDING POLISHING
Information Patent Grant
Use of hydrofluoric acid for effective pad conditioning
- Patent number 5,913,715
- Issue date Jun 22, 1999
- LSI Logic Corporation
- Eric J. Kirchner
- B24 - GRINDING POLISHING
Information Patent Grant
Controlling groove dimensions for enhanced slurry flow
- Patent number 5,888,121
- Issue date Mar 30, 1999
- LSI Logic Corporation
- Eric J. Kirchner
- B24 - GRINDING POLISHING
Information Patent Grant
Method for determining optical constants prior to film processing t...
- Patent number 5,835,226
- Issue date Nov 10, 1998
- LSI Logic Corporation
- Michael J. Berman
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Integrated circuit process monitoring and metrology system
- Publication number 20050181615
- Publication date Aug 18, 2005
- LSI Logic Corporation
- Peter A. Burke
- H01 - BASIC ELECTRIC ELEMENTS

Eric J. Kirchner

Person

Patents Grantslast 30 patents

Integrated circuit process monitoring and metrology system

Integrated circuit process monitoring and metrology system

Through-pad drainage of slurry during chemical mechanical polishing

Photolithography overlay control

Modifying contact areas of a polishing pad to promote uniform remov...

Chemical-mechanical polishing pad conditioning systems

Use of hydrofluoric acid for effective pad conditioning

Controlling groove dimensions for enhanced slurry flow

Method for determining optical constants prior to film processing t...

Patents Applicationslast 30 patents

Integrated circuit process monitoring and metrology system