Eric J. Strang

Person

Chandler, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dry non-plasma treatment system
- Patent number 11,745,202
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Martin Kent
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for chemical vapor deposition control
- Patent number 9,139,910
- Issue date Sep 22, 2015
- Tokyo Electron Limited
- Eric M. Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry non-plasma treatment system and method of using
- Patent number 9,115,429
- Issue date Aug 25, 2015
- Tokyo Electron Limited
- Martin Kent
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermally zoned substrate holder assembly
- Patent number 8,927,907
- Issue date Jan 6, 2015
- Tokyo Electron Limited
- Steven T. Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower head gas injection apparatus with secondary high pressure pu...
- Patent number 8,877,000
- Issue date Nov 4, 2014
- Tokyo Electron Limited
- Eric J. Strang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for chemical vapor deposition control
- Patent number 8,852,347
- Issue date Oct 7, 2014
- Tokyo Electron Limited
- Eric M. Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry non-plasma treatment system and method of using
- Patent number 8,828,185
- Issue date Sep 9, 2014
- Tokyo Electron Limited
- Martin Kent
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method and apparatus for atomic layer deposition
- Patent number 8,562,743
- Issue date Oct 22, 2013
- Tokyo Electron Limited
- Eric J. Strang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for using first-principles simulation to analyze...
- Patent number 8,296,687
- Issue date Oct 23, 2012
- Tokyo Electron Limited
- Eric J. Strang
- G05 - CONTROLLING REGULATING
Information Patent Grant
Temperature controlled substrate holder with non-uniform insulation...
- Patent number 8,207,476
- Issue date Jun 26, 2012
- Tokyo Electron Limited
- Yuji Tsukamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermally zoned substrate holder assembly
- Patent number 8,092,602
- Issue date Jan 10, 2012
- Tokyo Electron Limited
- Steven T. Fink
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
System and method for using first-principles simulation to control...
- Patent number 8,073,667
- Issue date Dec 6, 2011
- Tokyo Electron Limited
- Eric J. Strang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for using first-principles simulation to provide...
- Patent number 8,050,900
- Issue date Nov 1, 2011
- Tokyo Electron Limited
- Andrej S. Mitrovic
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method and system for controlling radical distribution
- Patent number 8,038,834
- Issue date Oct 18, 2011
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for using first-principles simulation to control...
- Patent number 8,036,869
- Issue date Oct 11, 2011
- Tokyo Electron Limited
- Eric J. Strang
- G05 - CONTROLLING REGULATING
Information Patent Grant
System and method for using first-principles simulation to facilita...
- Patent number 8,032,348
- Issue date Oct 4, 2011
- Tokyo Electron Limited
- Andrej S. Mitrovic
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for using first-principles simulation to characte...
- Patent number 8,014,991
- Issue date Sep 6, 2011
- Tokyo Electron Limited
- Andrej S. Mitrovic
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Thermally zoned substrate holder assembly
- Patent number 7,850,782
- Issue date Dec 14, 2010
- Tokyo Electron Limited
- Steven T. Fink
Information Patent Grant
High rate atomic layer deposition apparatus and method of using
- Patent number 7,740,704
- Issue date Jun 22, 2010
- Tokyo Electron Limited
- Eric J. Strang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for wall film monitoring
- Patent number 7,732,227
- Issue date Jun 8, 2010
- Tokyo Electron Limited
- Eric J. Strang
- G01 - MEASURING TESTING
Information Patent Grant
Temperature controlled substrate holder with non-uniform insulation...
- Patent number 7,723,648
- Issue date May 25, 2010
- Tokyo Electron Limited
- Yuji Tsukamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for controlling radical distribution
- Patent number 7,718,030
- Issue date May 18, 2010
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry non-plasma treatment system and method of using
- Patent number 7,718,032
- Issue date May 18, 2010
- Tokyo Electron Limited
- Martin Kent
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method of gas injection sequencing
- Patent number 7,666,479
- Issue date Feb 23, 2010
- Tokyo Electron Limited
- Eric J. Strang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for an improved focus ring in a plasma process...
- Patent number 7,582,186
- Issue date Sep 1, 2009
- Tokyo Electron Limited
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for gas injection system with minimum particul...
- Patent number 7,563,328
- Issue date Jul 21, 2009
- Tokyo Electron Limited
- Eric J. Strang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for electron density measurement
- Patent number 7,544,269
- Issue date Jun 9, 2009
- Tokyo Electron Limited
- Eric J. Strang
- G01 - MEASURING TESTING
Information Patent Grant
Chemical processing system and method
- Patent number 7,540,305
- Issue date Jun 2, 2009
- Tokyo Electron Limited
- Eric Strang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled high-density plasma source
- Patent number 7,482,757
- Issue date Jan 27, 2009
- Tokyo Electron Limited
- Bill H. Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved baffle plate
- Patent number 7,461,614
- Issue date Dec 9, 2008
- Tokyo Electron Limited
- Steven T Fink
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DRY NON-PLASMA TREATMENT SYSTEM
- Publication number 20150314313
- Publication date Nov 5, 2015
- TOKYO ELECTRON LIMITED
- Martin Kent
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
DRY NON-PLASMA TREATMENT SYSTEM AND METHOD OF USING
- Publication number 20140360979
- Publication date Dec 11, 2014
- Martin Kent
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD FOR FORMING A PATTERN AND A SEMICONDUCTOR DEVICE MANUFACTURI...
- Publication number 20120083127
- Publication date Apr 5, 2012
- TOKYO ELECTRON LIMITED
- Robert D. Clark
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
THERMALLY ZONED SUBSTRATE HOLDER ASSEMBLY
- Publication number 20120067866
- Publication date Mar 22, 2012
- TOKYO ELECTRON LIMITED
- Steven T. FINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for chemical vapor deposition control
- Publication number 20110303145
- Publication date Dec 15, 2011
- TOKYO ELECTRON LIMITED
- Eric M. LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for chemical vapor deposition control
- Publication number 20110305831
- Publication date Dec 15, 2011
- TOKYO ELECTRON LIMITED
- Eric M. LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION
- Publication number 20110203523
- Publication date Aug 25, 2011
- TOKYO ELECTRON LIMITED
- ERIC J. STRANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY NON-PLASMA TREATMENT SYSTEM AND METHOD OF USING
- Publication number 20100237046
- Publication date Sep 23, 2010
- TOKYO ELECTRON LIMITED
- MARTIN KENT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR CONTROLLING RADICAL DISTRIBUTION
- Publication number 20100193471
- Publication date Aug 5, 2010
- TOKYO ELECTRON LIMITED
- Merritt FUNK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPERATURE CONTROLLED SUBSTRATE HOLDER WITH NON-UNIFORM INSULATION...
- Publication number 20100078424
- Publication date Apr 1, 2010
- TOKYO ELECTRON LIMITED
- Yuji Tsukamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMALLY ZONED SUBSTRATE HOLDER ASSEMBLY
- Publication number 20080092818
- Publication date Apr 24, 2008
- TOKYO ELECTRON LIMITED
- Steven T. Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature controlled substrate holder with non-uniform insulation...
- Publication number 20080083723
- Publication date Apr 10, 2008
- TOKYO ELECTRON LIMITED
- Yuji Tsukamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
A DRY NON-PLASMA TREATMENT SYSTEM AND METHOD OF USING
- Publication number 20070298972
- Publication date Dec 27, 2007
- TOKYO ELECTRON LIMITED
- MARTIN KENT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD OF GAS INJECTION SEQUENCING
- Publication number 20070204907
- Publication date Sep 6, 2007
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR MONITORING COMPONENT CONSUMPTION
- Publication number 20070192059
- Publication date Aug 16, 2007
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G01 - MEASURING TESTING
Information Patent Application
Method and system for controlling radical distribution
- Publication number 20070068625
- Publication date Mar 29, 2007
- TOKYO ELECTRON LIMITED
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for wall film monitoring
- Publication number 20070020776
- Publication date Jan 25, 2007
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for determining consumable lifetime
- Publication number 20060138082
- Publication date Jun 29, 2006
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for flowing a supercritical fluid in a high press...
- Publication number 20060130966
- Publication date Jun 22, 2006
- Darko Babic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical processing system and method
- Publication number 20060090850
- Publication date May 4, 2006
- TOKYO ELECTRON LIMITED
- Arthur H. Laflamme
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for atomic layer deposition
- Publication number 20060093746
- Publication date May 4, 2006
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and system for arc suppression in a plasma processing system
- Publication number 20060081564
- Publication date Apr 20, 2006
- TOKYO ELECTRON LIMITED
- Paul Moroz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and method
- Publication number 20060060303
- Publication date Mar 23, 2006
- TOKYO ELECTRON LIMITED
- Steven T. Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for electron density measurement
- Publication number 20060032287
- Publication date Feb 16, 2006
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High rate atomic layer deposition apparatus and method of using
- Publication number 20050284370
- Publication date Dec 29, 2005
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical processing system and method
- Publication number 20050270895
- Publication date Dec 8, 2005
- TOKYO ELECTRON LIMITED
- Eric Strang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for monitoring film deposition in a process ch...
- Publication number 20050235917
- Publication date Oct 27, 2005
- TOKYO ELECTRON LIMITED
- Jim N. Fordemwalt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and system for performing atomic layer deposition
- Publication number 20050221021
- Publication date Oct 6, 2005
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing system and method
- Publication number 20050189069
- Publication date Sep 1, 2005
- TOKYO ELECTRON LIMITED
- Audunn Ludviksson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for active temperature control of susceptors
- Publication number 20050178335
- Publication date Aug 18, 2005
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS

Eric J. Strang

Person

Patents Grantslast 30 patents

Dry non-plasma treatment system

Method for chemical vapor deposition control

Dry non-plasma treatment system and method of using

Thermally zoned substrate holder assembly

Shower head gas injection apparatus with secondary high pressure pu...

Apparatus for chemical vapor deposition control

Dry non-plasma treatment system and method of using

Method and apparatus for atomic layer deposition

System and method for using first-principles simulation to analyze...

Temperature controlled substrate holder with non-uniform insulation...

Thermally zoned substrate holder assembly

System and method for using first-principles simulation to control...

System and method for using first-principles simulation to provide...

Method and system for controlling radical distribution

System and method for using first-principles simulation to control...

System and method for using first-principles simulation to facilita...

System and method for using first-principles simulation to characte...

Thermally zoned substrate holder assembly

High rate atomic layer deposition apparatus and method of using

Method and apparatus for wall film monitoring

Temperature controlled substrate holder with non-uniform insulation...

Method and system for controlling radical distribution

Dry non-plasma treatment system and method of using

Apparatus and method of gas injection sequencing

Method and apparatus for an improved focus ring in a plasma process...

Method and apparatus for gas injection system with minimum particul...

Method and apparatus for electron density measurement

Chemical processing system and method

Inductively coupled high-density plasma source

Method and apparatus for improved baffle plate

Patents Applicationslast 30 patents

DRY NON-PLASMA TREATMENT SYSTEM

DRY NON-PLASMA TREATMENT SYSTEM AND METHOD OF USING

METHOD FOR FORMING A PATTERN AND A SEMICONDUCTOR DEVICE MANUFACTURI...

THERMALLY ZONED SUBSTRATE HOLDER ASSEMBLY

Apparatus for chemical vapor deposition control

Method for chemical vapor deposition control

METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION

DRY NON-PLASMA TREATMENT SYSTEM AND METHOD OF USING

METHOD AND SYSTEM FOR CONTROLLING RADICAL DISTRIBUTION

TEMPERATURE CONTROLLED SUBSTRATE HOLDER WITH NON-UNIFORM INSULATION...

THERMALLY ZONED SUBSTRATE HOLDER ASSEMBLY

Temperature controlled substrate holder with non-uniform insulation...

A DRY NON-PLASMA TREATMENT SYSTEM AND METHOD OF USING

APPARATUS AND METHOD OF GAS INJECTION SEQUENCING

METHOD AND SYSTEM FOR MONITORING COMPONENT CONSUMPTION

Method and system for controlling radical distribution

Method and apparatus for wall film monitoring

Method and apparatus for determining consumable lifetime

Method and system for flowing a supercritical fluid in a high press...

Chemical processing system and method

Method and apparatus for atomic layer deposition

Method and system for arc suppression in a plasma processing system

Plasma processing system and method

Method and system for electron density measurement

High rate atomic layer deposition apparatus and method of using

Chemical processing system and method

Method and apparatus for monitoring film deposition in a process ch...

Method and system for performing atomic layer deposition

Plasma processing system and method

Method and apparatus for active temperature control of susceptors