Eric Kent

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process based metrology target design
- Patent number 10,296,681
- Issue date May 21, 2019
- ASML Netherlands B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process based metrology target design
- Patent number 10,007,744
- Issue date Jun 26, 2018
- ASML Netherlands B.V.
- Guangqing Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 9,804,504
- Issue date Oct 31, 2017
- ASML Netherlands B.V.
- Guangqing Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 9,355,200
- Issue date May 31, 2016
- ASML Netherlands B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Stepper lens specific reticle compensation for critical dimension c...
- Patent number 6,529,623
- Issue date Mar 4, 2003
- Advanced Micro Devices, Inc.
- Eric Kent
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure correction based on reflective index for photolithographic...
- Patent number 6,482,573
- Issue date Nov 19, 2002
- Advanced Micro Devices, Inc.
- Jayendra D. Bhakta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Apparatus for automatically cleaning resist nozzle
- Patent number 6,418,946
- Issue date Jul 16, 2002
- Advanced Micro Devices, Inc.
- Vincent L. Marinaro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual track/stepper interface configuration for wafer processing
- Patent number 6,368,985
- Issue date Apr 9, 2002
- Advanced Micro Devices, Inc.
- Ted Wakamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual resist dispense nozzle for wafer tracks
- Patent number 6,360,959
- Issue date Mar 26, 2002
- Advanced Micro Devices, Inc.
- Eric R. Kent
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Mechanism for dispensing liquid onto an integrated circuit wafer wi...
- Patent number 6,361,599
- Issue date Mar 26, 2002
- Advanced Micro Devices, Inc.
- Vincent L. Marinaro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for purging air bubbles from filters
- Patent number 6,336,960
- Issue date Jan 8, 2002
- Advanced Micro Devices, Inc.
- Vince L. Marinaro
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Semiconductor wafer manufacturing method and apparatus for an impro...
- Patent number 6,318,913
- Issue date Nov 20, 2001
- Advanced Micro Devices, Inc.
- Ted Wakamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developer nozzle clean combs
- Patent number 6,299,688
- Issue date Oct 9, 2001
- Advanced Micro Devices, Inc.
- Vincent L. Marinaro
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Semiconductor wafer manufacturing method and apparatus for an impro...
- Patent number 6,250,822
- Issue date Jun 26, 2001
- Advanced Micro Device, Inc.
- Ted Wakamiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for detecting adjustment error in photolithographic stepping...
- Patent number 6,245,584
- Issue date Jun 12, 2001
- Advanced Micro Devices
- Vincent Marinaro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanism for dispensing liquid onto an integrated circuit wafer wi...
- Patent number 6,238,747
- Issue date May 29, 2001
- Advanced Micro Devices, Inc.
- Vincent L. Marinaro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for automatically cleaning resist nozzle
- Patent number 6,170,494
- Issue date Jan 9, 2001
- Advanced Micro Devices, Inc.
- Vincent L. Marinaro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming semiconductor structures using a calibrating ret...
- Patent number 6,130,016
- Issue date Oct 10, 2000
- Advanced Micro Devices, Inc.
- Eric R. Kent
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mechanism for cleaning an integrated circuit wafer hot plate while...
- Patent number 6,082,379
- Issue date Jul 4, 2000
- Advanced Micro Devices, Inc.
- Eric R. Kent
- B08 - CLEANING
Information Patent Grant
Method for detecting malfunction in photolithographic fabrication t...
- Patent number 6,051,348
- Issue date Apr 18, 2000
- Advanced Micro Devices
- Vincent Marinaro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROCESS BASED METROLOGY TARGET DESIGN
- Publication number 20180268093
- Publication date Sep 20, 2018
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
- Publication number 20160252820
- Publication date Sep 1, 2016
- ASML NETHERLANDS B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS BASED METROLOGY TARGET DESIGN
- Publication number 20160140267
- Publication date May 19, 2016
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
- Publication number 20150186581
- Publication date Jul 2, 2015
- ASML NETHERLANDS B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Semiconductor wafer manufacturing method and apparatus for an impro...
- Publication number 20010012457
- Publication date Aug 9, 2001
- Ted Wakamiya
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Process based metrology target design

Process based metrology target design

Method and apparatus for design of a metrology target

Method and apparatus for design of a metrology target

Stepper lens specific reticle compensation for critical dimension c...

Exposure correction based on reflective index for photolithographic...

Apparatus for automatically cleaning resist nozzle

Dual track/stepper interface configuration for wafer processing

Dual resist dispense nozzle for wafer tracks

Mechanism for dispensing liquid onto an integrated circuit wafer wi...

System and method for purging air bubbles from filters

Semiconductor wafer manufacturing method and apparatus for an impro...

Developer nozzle clean combs

Semiconductor wafer manufacturing method and apparatus for an impro...

Method for detecting adjustment error in photolithographic stepping...

Mechanism for dispensing liquid onto an integrated circuit wafer wi...

Method for automatically cleaning resist nozzle

Method for forming semiconductor structures using a calibrating ret...

Mechanism for cleaning an integrated circuit wafer hot plate while...

Method for detecting malfunction in photolithographic fabrication t...

Patents Applicationslast 30 patents

PROCESS BASED METROLOGY TARGET DESIGN

METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET

PROCESS BASED METROLOGY TARGET DESIGN

METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET

Semiconductor wafer manufacturing method and apparatus for an impro...