Eric M. Coker

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Burlington, VT, US

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Patents Grantslast 30 patents

Information Patent Grant
Method for correction of defects in lithography masks
- Patent number 7,494,748
- Issue date Feb 24, 2009
- International Business Machines Corporation
- James W. Adkisson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual damascene multi-level metallization
- Patent number 7,470,613
- Issue date Dec 30, 2008
- International Business Machines Corporation
- Birendra N. Agarwala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated thin-film resistor with direct contact
- Patent number 7,382,055
- Issue date Jun 3, 2008
- International Business Machines Corporation
- Eric M. Coker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated thin-film resistor with direct contact
- Patent number 7,303,972
- Issue date Dec 4, 2007
- International Business Machines Incorporated
- Eric M. Coker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-damascene metallization interconnection
- Patent number 7,224,063
- Issue date May 29, 2007
- International Business Machines Corporation
- Birendra N. Agarwala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trough adjusted optical proximity correction for vias
- Patent number 6,760,901
- Issue date Jul 6, 2004
- International Business Machines Corporation
- Bette L. Bergman Reuter
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED THIN-FILM RESISTOR WITH DIRECT CONTACT
- Publication number 20070290272
- Publication date Dec 20, 2007
- Eric M. Coker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED THIN-FILM RESISTOR WITH DIRECT CONTACT
- Publication number 20070166909
- Publication date Jul 19, 2007
- Eric M. Coker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL DAMASCENE MULTI-LEVEL METALLIZATION
- Publication number 20070111510
- Publication date May 17, 2007
- Birendra N. Agarwala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for correction of defects in lithography masks
- Publication number 20060093924
- Publication date May 4, 2006
- International Business Machines Corporation
- James W. Adkisson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Trough adjusted optical proximity correction for vias
- Publication number 20030196178
- Publication date Oct 16, 2003
- International Business Machines Corporation
- Bette L. Bergman Reuter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dual damascene multi-level metallization
- Publication number 20020182855
- Publication date Dec 5, 2002
- Birendra N. Agarwala
- H01 - BASIC ELECTRIC ELEMENTS