Eric M. Panning

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
EUVL process structure fabrication methods
- Patent number 8,865,376
- Issue date Oct 21, 2014
- Sematech, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active hardmask for lithographic patterning
- Patent number 7,527,920
- Issue date May 5, 2009
- Intel Corporation
- Michael Goldstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modular containment cell arrangements
- Patent number 7,316,893
- Issue date Jan 8, 2008
- Intel Corporation
- Eric M. Panning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustment of distance between source plasma and mirrors to change...
- Patent number 7,208,747
- Issue date Apr 24, 2007
- Intel Corporation
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV energy detection
- Patent number 7,154,101
- Issue date Dec 26, 2006
- Intel Corporation
- Eric Panning
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Extreme ultraviolet illumination source
- Patent number 7,109,504
- Issue date Sep 19, 2006
- Intel Corporation
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Adjustable illumination source
- Patent number 7,098,466
- Issue date Aug 29, 2006
- Intel Corporation
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Active hardmask for lithographic patterning
- Patent number 7,033,739
- Issue date Apr 25, 2006
- Intel Corporation
- Michael Goldstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EUVL PROCESS STRUCTURE FABRICATION METHODS
- Publication number 20140255828
- Publication date Sep 11, 2014
- Intel Corporation
- Vibhu JINDAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective optical illumination collector
- Publication number 20080073592
- Publication date Mar 27, 2008
- Eric M. Panning
- G02 - OPTICS
Information Patent Application
Adjustment of distance between source plasma and mirrors to change...
- Publication number 20060289810
- Publication date Dec 28, 2006
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Application
Active hardmask for lithographic patterning
- Publication number 20060093972
- Publication date May 4, 2006
- Michael Goldstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme ultraviolet illumination source
- Publication number 20060017024
- Publication date Jan 26, 2006
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Application
Adjustable illumination source
- Publication number 20060002113
- Publication date Jan 5, 2006
- Manish Chandhok
- B82 - NANO-TECHNOLOGY
Information Patent Application
Active hardmask for lithographic patterning
- Publication number 20040214113
- Publication date Oct 28, 2004
- Michael Goldstein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV energy detection
- Publication number 20040188627
- Publication date Sep 30, 2004
- Eric Panning
- G01 - MEASURING TESTING
Information Patent Application
Modular containment cell arrangements
- Publication number 20040106048
- Publication date Jun 3, 2004
- Eric M. Panning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Eric M. Panning

Person

Patents Grantslast 30 patents

EUVL process structure fabrication methods

Active hardmask for lithographic patterning

Modular containment cell arrangements

Adjustment of distance between source plasma and mirrors to change...

EUV energy detection

Extreme ultraviolet illumination source

Adjustable illumination source

Active hardmask for lithographic patterning

Patents Applicationslast 30 patents

EUVL PROCESS STRUCTURE FABRICATION METHODS

Reflective optical illumination collector

Adjustment of distance between source plasma and mirrors to change...

Active hardmask for lithographic patterning

Extreme ultraviolet illumination source

Adjustable illumination source

Active hardmask for lithographic patterning

EUV energy detection

Modular containment cell arrangements