Eric S. MOYER

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Aurora, IL, US

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Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical planarization pads with constant groove volume
- Patent number 11,938,584
- Issue date Mar 26, 2024
- CMC MATERIALS LLC
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization pads via vat-based production
- Patent number 11,845,157
- Issue date Dec 19, 2023
- CMC Materials, Inc.
- Eric S. Moyer
- B24 - GRINDING POLISHING
Information Patent Grant
UV-curable resins used for chemical mechanical polishing pads
- Patent number 11,807,710
- Issue date Nov 7, 2023
- CMC Materials, Inc.
- Chen-Chih Tsai
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL PLANARIZATION PADS WITH CONSTANT GROOVE VOLUME
- Publication number 20240238937
- Publication date Jul 18, 2024
- CMC Materials LLC
- Paul Andre LEFEVRE
- B24 - GRINDING POLISHING
Information Patent Application
UV-CURABLE RESINS USED FOR CHEMICAL MECHANICAL POLISHING PADS
- Publication number 20220119586
- Publication date Apr 21, 2022
- CMC Materials, Inc.
- Chen-Chih TSAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL MECHANICAL PLANARIZATION PADS VIA VAT-BASED PRODUCTION
- Publication number 20200353586
- Publication date Nov 12, 2020
- Cabot Microelectronics Corporation
- Eric S. MOYER
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
CHEMICAL MECHANICAL PLANARIZATION PADS WITH CONSTANT GROOVE VOLUME
- Publication number 20200353588
- Publication date Nov 12, 2020
- Cabot Microelectronics Corporation
- Paul Andre LEFEVRE
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY