Eric Wagganer

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Fremont, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Line edge roughness reduction for trench etch
- Patent number 6,949,460
- Issue date Sep 27, 2005
- Lam Research Corporation
- Eric Wagganer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching of organic antireflective coating
- Patent number 6,630,407
- Issue date Oct 7, 2003
- Lam Research Corporation
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile control of oxide trench features for dual damascene applica...
- Patent number 6,540,885
- Issue date Apr 1, 2003
- LAM Research Corp.
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic method for creating damascene metallization layers
- Patent number 6,146,986
- Issue date Nov 14, 2000
- Lam Research Corporation
- Eric D. Wagganer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method to create three-dimensional images of semiconductor structur...
- Publication number 20090296073
- Publication date Dec 3, 2009
- LAM RESEARCH CORPORATION
- Eric Wagganer
- G01 - MEASURING TESTING
Information Patent Application
Line edge roughness reduction for trench etch
- Publication number 20050277289
- Publication date Dec 15, 2005
- Eric Wagganer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line edge roughness reduction for trench etch
- Publication number 20050101126
- Publication date May 12, 2005
- Lam Research Corporation
- Eric Wagganer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching of organic antireflective coating
- Publication number 20020173160
- Publication date Nov 21, 2002
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS