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Erik Achilles ABEGG

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  • Eindhoven, NL
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Patents Grantslast 30 patents

  • Information Patent Grant

    Method of manufacturing a pellicle for a lithographic apparatus, a...
    • Patent number 12,298,663
    • Issue date May 13, 2025
    • ASML Netherlands B.V.
    • Mária Péter
    • G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
  • Information Patent Grant

    Pellicle and pellicle assembly
    • Patent number 12,066,758
    • Issue date Aug 20, 2024
    • ASML Netherlands B.V.
    • David Ferdinand Vles
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Membrane for EUV lithography
    • Patent number 11,762,281
    • Issue date Sep 19, 2023
    • ASML Netherlands B.V.
    • Maxim Aleksandrovich Nasalevich
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pellicle and pellicle assembly
    • Patent number 11,347,142
    • Issue date May 31, 2022
    • ASML Netherlands B.V.
    • David Ferdinand Vles
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pellicle and pellicle assembly
    • Patent number 10,983,431
    • Issue date Apr 20, 2021
    • ASML Netherlands B.V.
    • David Ferdinand Vles
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Membrane for EUV lithography
    • Patent number 10,908,496
    • Issue date Feb 2, 2021
    • ASML Netherlands B.V.
    • Maxim Aleksandrovich Nasalevich
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pellicle and pellicle assembly
    • Patent number 10,466,585
    • Issue date Nov 5, 2019
    • ASML Netherlands B.V.
    • David Ferdinand Vles
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

  • Information Patent Application

    MEMBRANE FOR EUV LITHOGRAPHY
    • Publication number 20240004283
    • Publication date Jan 4, 2024
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich Nasalevich
    • G02 - OPTICS
  • Information Patent Application

    PELLICLE AND PELLICLE ASSEMBLY
    • Publication number 20220252974
    • Publication date Aug 11, 2022
    • ASML NETHERLANDS B.V.
    • David Ferdinand VLES
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PELLICLE AND PELLICLE ASSEMBLY
    • Publication number 20210208500
    • Publication date Jul 8, 2021
    • ASML NETHERLANDS B.V.
    • David Ferdinand VLES
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    MEMBRANE FOR EUV LITHOGRAPHY
    • Publication number 20210109438
    • Publication date Apr 15, 2021
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich Nasalevich
    • G02 - OPTICS
  • Information Patent Application

    PELLICLE AND PELLICLE ASSEMBLY
    • Publication number 20200064731
    • Publication date Feb 27, 2020
    • ASML NETHERLANDS B.V.
    • David Ferdinand VLES
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    A MEMBRANE FOR EUV LITHOGRAPHY
    • Publication number 20190129299
    • Publication date May 2, 2019
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich NASALEVICH
    • G02 - OPTICS
  • Information Patent Application

    METHOD OF MANUFACTURING A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A...
    • Publication number 20190056654
    • Publication date Feb 21, 2019
    • ASML NETHERLANDS B.V.
    • Mária PÉTER
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PELLICLE AND PELLICLE ASSEMBLY
    • Publication number 20180364561
    • Publication date Dec 20, 2018
    • ASML NETHERLANDS B.V.
    • David Ferdinand VLES
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY