Erik Johannes Maria WALLERBOS

Person

Helmond, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,782,349
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,592,753
- Issue date Feb 28, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimization of a lithographic process
- Patent number 11,480,884
- Issue date Oct 25, 2022
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimizing a sequence of processes for manufacturing of product units
- Patent number 11,442,367
- Issue date Sep 13, 2022
- ASML Netherlands B.V.
- Jochem Sebastiaan Wildenberg
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for determining contribution to a fingerprint
- Patent number 11,378,891
- Issue date Jul 5, 2022
- ASML Netherlands B.V.
- Davit Harutyunyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,327,407
- Issue date May 10, 2022
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 11,170,072
- Issue date Nov 9, 2021
- ASML Netherands B.V.
- Everhardus Cornelis Mos
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimizing a sequence of processes for manufacturing of product units
- Patent number 11,106,141
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Jochem Sebastiaan Wildenberg
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for characterizing distortions in a lithographic process, li...
- Patent number 10,928,737
- Issue date Feb 23, 2021
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process
- Patent number 10,877,381
- Issue date Dec 29, 2020
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining contribution to a fingerprint
- Patent number 10,816,904
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Davit Harutyunyan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of monitoring and device manufacturing method
- Patent number 10,809,631
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimization of a lithographic process
- Patent number 10,802,408
- Issue date Oct 13, 2020
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20220229373
- Publication date Jul 21, 2022
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20220027437
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS
- Publication number 20210389684
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Jochem Sebastiaan Wildenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20210080836
- Publication date Mar 18, 2021
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20210003927
- Publication date Jan 7, 2021
- ASML NETHERLANDS B.V.
- Davit Harutyunyan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS
- Publication number 20200356012
- Publication date Nov 12, 2020
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS
- Publication number 20200026200
- Publication date Jan 23, 2020
- ASML NETHERLANDS B.V.
- Jochem Sebastiaan WILDENBERG
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS
- Publication number 20200019067
- Publication date Jan 16, 2020
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS
- Publication number 20190317412
- Publication date Oct 17, 2019
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20190271919
- Publication date Sep 5, 2019
- ASML NETHERLANDS B.V.
- Davit HARUTYUNYAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CHARACTERIZING DISTORTIONS IN A LITHOGRAPHIC PROCESS, LI...
- Publication number 20190011842
- Publication date Jan 10, 2019
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MONITORING AND DEVICE MANUFACTURING METHOD
- Publication number 20180307145
- Publication date Oct 25, 2018
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20180067900
- Publication date Mar 8, 2018
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G06 - COMPUTING CALCULATING COUNTING

Erik Johannes Maria WALLERBOS

Person

Patents Grantslast 30 patents

Methods of determining corrections for a patterning process, device...

Methods of determining corrections for a patterning process, device...

Method for optimization of a lithographic process

Optimizing a sequence of processes for manufacturing of product units

Method for determining contribution to a fingerprint

Methods of determining corrections for a patterning process, device...

Method and apparatus for inspection and metrology

Optimizing a sequence of processes for manufacturing of product units

Method for characterizing distortions in a lithographic process, li...

Methods of determining corrections for a patterning process

Method for determining contribution to a fingerprint

Method of monitoring and device manufacturing method

Method for optimization of a lithographic process

Patents Applicationslast 30 patents

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS

OPTIMIZING A SEQUENCE OF PROCESSES FOR MANUFACTURING OF PRODUCT UNITS

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS

A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

METHOD FOR CHARACTERIZING DISTORTIONS IN A LITHOGRAPHIC PROCESS, LI...

METHOD OF MONITORING AND DEVICE MANUFACTURING METHOD

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY