Erik Loopstra

Person

Eindhoven, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing a mirror of a microlithographic projection exp...
- Patent number 12,117,731
- Issue date Oct 15, 2024
- Carl Zeiss SMT GmbH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement of optical elements in a lithographic apparatus
- Patent number 10,908,508
- Issue date Feb 2, 2021
- Carl Zeiss SMT GmbH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus, and method for reducing deformations...
- Patent number 10,599,051
- Issue date Mar 24, 2020
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement for use in a projection exposure tool for microlithogra...
- Patent number 9,354,529
- Issue date May 31, 2016
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...
- Publication number 20240192605
- Publication date Jun 13, 2024
- Carl Zeiss SMT GMBH
- Christoph ZACZEK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A MIRROR OF A LITHOGRAPHY SYSTEM
- Publication number 20240027730
- Publication date Jan 25, 2024
- Carl Zeiss SMT GMBH
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...
- Publication number 20240019613
- Publication date Jan 18, 2024
- Carl Zeiss SMT GMBH
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATI...
- Publication number 20230375939
- Publication date Nov 23, 2023
- Carl Zeiss SMT GMBH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE FOR POSITIONING AND HOLDING AT LEAST ONE OPTICAL ELEMENT, ME...
- Publication number 20230350311
- Publication date Nov 2, 2023
- Carl Zeiss SMT GMBH
- Thomas GROEZINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS
- Publication number 20210149309
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS
- Publication number 20200089126
- Publication date Mar 19, 2020
- Carl Zeiss SMT GMBH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS, AND METHOD FOR REDUCING DEFORMATIONS...
- Publication number 20190219926
- Publication date Jul 18, 2019
- Carl Zeiss SMT GMBH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Erik Loopstra

Person

Patents Grantslast 30 patents

Method for producing a mirror of a microlithographic projection exp...

Position measurement of optical elements in a lithographic apparatus

Projection exposure apparatus, and method for reducing deformations...

Arrangement for use in a projection exposure tool for microlithogra...

Patents Applicationslast 30 patents

METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...

METHOD FOR PRODUCING A MIRROR OF A LITHOGRAPHY SYSTEM

METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...

METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATI...

DEVICE FOR POSITIONING AND HOLDING AT LEAST ONE OPTICAL ELEMENT, ME...

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS

PROJECTION EXPOSURE APPARATUS, AND METHOD FOR REDUCING DEFORMATIONS...