Erik Marie Jose Smeets

Person

Prinsenbeek, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate distortion measurement
- Patent number 8,194,242
- Issue date Jun 5, 2012
- ASML Netherlands B.V.
- Antonius Theodorus Anna Maria Derksen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate distortion measurement
- Patent number 8,139,218
- Issue date Mar 20, 2012
- ASML Netherlands B.V.
- Erik Marie Jose Smeets
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,936,447
- Issue date May 3, 2011
- ASML Netherlands B.V.
- Antonius Theodorus Anna Maria Derksen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method for masking a substrate
- Patent number 7,808,612
- Issue date Oct 5, 2010
- ASML Netherlands B.V.
- Remko Wakker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus with mask to prevent exposure of peripheral...
- Patent number 7,777,863
- Issue date Aug 17, 2010
- ASML Netherlands B.V.
- Erik Marie José Smeets
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement substrate, substrate table, lithographic apparatus, met...
- Patent number 7,398,177
- Issue date Jul 8, 2008
- ASML Netherlands B.V.
- Erik Marie Jose Smeets
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,359,030
- Issue date Apr 15, 2008
- ASML Netherlands B.V.
- Klaus Simon
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE DISTORTION MEASUREMENT
- Publication number 20120270150
- Publication date Oct 25, 2012
- ASML NETHERLANDS B.V.
- Erik Marie José SMEETS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, POSITIONING SYSTEM, AND POSITIONING METHOD
- Publication number 20100265487
- Publication date Oct 21, 2010
- ASML NETHERLANDS B.V.
- Erik Marie José SMEETS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus
- Publication number 20080297748
- Publication date Dec 4, 2008
- ASML NETHERLANDS B.V.
- Erik Marie Jose Smeets
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and method
- Publication number 20080055577
- Publication date Mar 6, 2008
- ASML NETHERLANDS B.V.
- Erik Marie Jose Smeets
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Erik Marie Jose Smeets

Person

Patents Grantslast 30 patents

Substrate distortion measurement

Substrate distortion measurement

Lithographic apparatus and device manufacturing method

Lithographic apparatus and method for masking a substrate

Lithographic apparatus with mask to prevent exposure of peripheral...

Measurement substrate, substrate table, lithographic apparatus, met...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

SUBSTRATE DISTORTION MEASUREMENT

LITHOGRAPHIC APPARATUS, POSITIONING SYSTEM, AND POSITIONING METHOD

Lithographic apparatus

Lithographic apparatus and method