Erik Petrus Buurman

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation source
- Patent number 10,222,702
- Issue date Mar 5, 2019
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus, excimer laser and device manufacturing method
- Patent number 9,316,924
- Issue date Apr 19, 2016
- ASML Netherlands B.V.
- Robertus Cornelis Martinus De Kruif
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, EUV radiation generation apparatus and devi...
- Patent number 9,110,377
- Issue date Aug 18, 2015
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation source, method of controlling a radiation source, lithogr...
- Patent number 8,663,881
- Issue date Mar 4, 2014
- ASML Netherlands B.V.
- Erik Petrus Buurman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV radiation source comprising a droplet accelerator and lithograp...
- Patent number 8,598,551
- Issue date Dec 3, 2013
- ASML Netherlands B.V.
- Wilbert Jan Mestrom
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser device
- Patent number 8,462,826
- Issue date Jun 11, 2013
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation source and lithographic apparatus
- Patent number 8,431,916
- Issue date Apr 30, 2013
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus, excimer laser and device manufacturing method
- Patent number 8,089,613
- Issue date Jan 3, 2012
- ASML Netherlands B.V.
- Robertus Cornelis Martinus De Kruif
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, source, source controller and control method
- Patent number 7,868,999
- Issue date Jan 11, 2011
- ASML Netherlands B.V.
- Johannes Heintze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, excimer laser and device manufacturing method
- Patent number 7,817,247
- Issue date Oct 19, 2010
- ASML Netherlands B.V.
- Robertus Cornelis Martinus De Kruif
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,655,367
- Issue date Feb 2, 2010
- ASML Netherlands B.V.
- Erik Petrus Buurman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, excimer laser and device manufacturing method
- Patent number 7,595,863
- Issue date Sep 29, 2009
- ASML Netherlands B.V.
- Robertus Cornelis Martinus Kruif
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,525,638
- Issue date Apr 28, 2009
- ASML Netherlands B.V.
- Erik Petrus Buurman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,491,478
- Issue date Feb 17, 2009
- ASML Netherlands B.V.
- Erik Petrus Buurman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Increasing pulse-to-pulse radiation beam uniformity
- Patent number 7,453,551
- Issue date Nov 18, 2008
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Radiation Source
- Publication number 20180031979
- Publication date Feb 1, 2018
- ASML NETHERLANDS B.V.
- Arno Jan BLEEKER
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, EUV RADIATION GENERATION APPARATUS AND DEVI...
- Publication number 20130141709
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
RADIATION SOURCE, METHOD OF CONTROLLING A RADIATION SOURCE, LITHOGR...
- Publication number 20130022901
- Publication date Jan 24, 2013
- ASML NETHERLANDS B.V.
- Erik Petrus BUURMAN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
- Publication number 20120280148
- Publication date Nov 8, 2012
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV RADIATION SOURCE COMPRISING A DROPLET ACCELERATOR AND LITHOGRAP...
- Publication number 20120280149
- Publication date Nov 8, 2012
- ASML NETHERLANDS B.V.
- Wilbert Jan Mestrom
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC APPARATUS, EXCIMER LASER AND DEVICE MANUFACTURING METHOD
- Publication number 20120057144
- Publication date Mar 8, 2012
- ASML NETHERLANDS B.V.
- Robertus Cornelis Martinus DE KRUIF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SOURCE, METHOD OF CONTROLLING A RADIATION SOURCE, LITHOGR...
- Publication number 20110273691
- Publication date Nov 10, 2011
- ASML NETHERLANDS B.V.
- Erik Petrus BUURMAN
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC APPARATUS, EXCIMER LASER AND DEVICE MANUFACTURING METHOD
- Publication number 20100329290
- Publication date Dec 30, 2010
- ASML NETHERLANDS B.V.
- Robertus Cornelis Martinus DE KRUIF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER DEVICE
- Publication number 20100182579
- Publication date Jul 22, 2010
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
- Publication number 20100110405
- Publication date May 6, 2010
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20100091260
- Publication date Apr 15, 2010
- ASML NETHERLANDS B.V.
- Erik Petrus Buurman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Increasing pulse-to-pulse radiation beam uniformity
- Publication number 20080111982
- Publication date May 15, 2008
- ASML NETHERLANDS B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, source, source controller and control method
- Publication number 20080036991
- Publication date Feb 14, 2008
- ASML NETHERLANDS B.V.
- Johannes Heintze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060227310
- Publication date Oct 12, 2006
- ASML NETHERLANDS B.V.
- Erik Petrus Buurman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060215134
- Publication date Sep 28, 2006
- ASML Netherland B.V.
- Erik Petrus Buurman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, excimer laser and device manufacturing method
- Publication number 20060170899
- Publication date Aug 3, 2006
- ASML NETHERLANDS B.V.
- Robertus Cornelis Martinus De Kruif
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, excimer laser and device manufacturing method
- Publication number 20060146310
- Publication date Jul 6, 2006
- ASML NETHERLANDS B.V.
- Robertus Cornelis Martinus De Kruif
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060017906
- Publication date Jan 26, 2006
- ASML NETHERLANDS B.V.
- Erik Petrus Buurman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Erik Petrus Buurman

Person

Patents Grantslast 30 patents

Radiation source

Lithographic apparatus, excimer laser and device manufacturing method

Lithographic apparatus, EUV radiation generation apparatus and devi...

Radiation source, method of controlling a radiation source, lithogr...

EUV radiation source comprising a droplet accelerator and lithograp...

Laser device

Radiation source and lithographic apparatus

Lithographic apparatus, excimer laser and device manufacturing method

Lithographic apparatus, source, source controller and control method

Lithographic apparatus, excimer laser and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus, excimer laser and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Increasing pulse-to-pulse radiation beam uniformity

Patents Applicationslast 30 patents

Radiation Source

LITHOGRAPHIC APPARATUS, EUV RADIATION GENERATION APPARATUS AND DEVI...

RADIATION SOURCE, METHOD OF CONTROLLING A RADIATION SOURCE, LITHOGR...

EUV RADIATION SOURCE AND LITHOGRAPHIC APPARATUS

EUV RADIATION SOURCE COMPRISING A DROPLET ACCELERATOR AND LITHOGRAP...

LITHOGRAPHIC APPARATUS, EXCIMER LASER AND DEVICE MANUFACTURING METHOD

RADIATION SOURCE, METHOD OF CONTROLLING A RADIATION SOURCE, LITHOGR...

LITHOGRAPHIC APPARATUS, EXCIMER LASER AND DEVICE MANUFACTURING METHOD

LASER DEVICE

RADIATION SOURCE AND LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Increasing pulse-to-pulse radiation beam uniformity

Lithographic apparatus, source, source controller and control method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus, excimer laser and device manufacturing method

Lithographic apparatus, excimer laser and device manufacturing method

Lithographic apparatus and device manufacturing method