Ermin Chong

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Shanghai, CN

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor structure and fabrication method thereof
- Patent number 11,646,315
- Issue date May 9, 2023
- Semiconductor Manufacturing International (Shanghai) Corporation
- Shuaijie Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing dual gate oxide devices
- Patent number 8,962,494
- Issue date Feb 24, 2015
- Shanghai Huali Microelectronics Corporation
- Jun Huang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF
- Publication number 20210358912
- Publication date Nov 18, 2021
- Semiconductor Manufacturing International (Shanghai) Corporation
- Shuaijie CHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING DUAL GATE OXIDE DEVICES
- Publication number 20140342565
- Publication date Nov 20, 2014
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Jun Huang
- H01 - BASIC ELECTRIC ELEMENTS