Ernst Kratschmer

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Yorktown Heights, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Electron beam lithography with dynamic fin overlay correction
- Patent number 12,099,304
- Issue date Sep 24, 2024
- International Business Machines Corporation
- Simon Dawes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography with dynamic fin overlay correction
- Patent number 11,852,975
- Issue date Dec 26, 2023
- International Business Machines Corporation
- Simon Dawes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-aspect ratio resist development using safe-solvent mixtures of...
- Patent number 6,440,639
- Issue date Aug 27, 2002
- International Business Machines Corporation
- Robert E. Fontana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON BEAM LITHOGRAPHY WITH DYNAMIC FIN OVERLAY CORRECTION
- Publication number 20240061342
- Publication date Feb 22, 2024
- International Business Machines Corporation
- Simon DAWES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRON BEAM LITHOGRAPHY WITH DYNAMIC FIN OVERLAY CORRECTION
- Publication number 20220013362
- Publication date Jan 13, 2022
- International Business Machines Corporation
- Simon DAWES
- H01 - BASIC ELECTRIC ELEMENTS