Erwin Paul SMAKMAN

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods of profiling charged-particle beams
- Patent number 12,165,836
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Maikel Robert Goosen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed charged-particle beam system
- Patent number 11,942,302
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Arno Jan Bleeker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of controlling an energy spread of a charg...
- Patent number 11,881,374
- Issue date Jan 23, 2024
- ASML Netherlands B.V.
- Shakeeb Bin Hasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection
- Patent number 11,875,966
- Issue date Jan 16, 2024
- ASML Netherlands B.V.
- Bernardo Kastrup
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aperture array with integrated current measurement
- Patent number 11,791,132
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Albertus Victor Gerardus Mangnus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determining the combination of patterns to be applied to a substrat...
- Patent number 11,747,738
- Issue date Sep 5, 2023
- ASML Netherlands B.V.
- Coen Adrianus Verschuren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection tool, lithographic apparatus, electron beam source and a...
- Patent number 11,243,179
- Issue date Feb 8, 2022
- ASML Netherlands B.V.
- Erwin Paul Smakman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection
- Patent number 11,094,502
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Bernardo Kastrup
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for direct write maskless lithography
- Patent number 10,928,736
- Issue date Feb 23, 2021
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for direct write maskless lithography
- Patent number 10,712,669
- Issue date Jul 14, 2020
- ASML Netherlands B.V.
- Erwin Paul Smakman
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Apparatus for direct write maskless lithography
- Patent number 10,527,950
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Erwin Paul Smakman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD
- Publication number 20240339294
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Marijke SCOTUZZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE DEVICE, CHARGED PARTICLE ASSESSMENT APPARATUS, MEA...
- Publication number 20240339292
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...
- Publication number 20240331968
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION
- Publication number 20240186107
- Publication date Jun 6, 2024
- Bernardo KASTRUP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240128043
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD
- Publication number 20230324318
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED CHARGED-PARTICLE BEAM SYSTEM
- Publication number 20230154722
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Arno Jan BLEEKER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF CONTROL OF A CHARGED PARTICLE BEAM
- Publication number 20230048580
- Publication date Feb 16, 2023
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS OF PROFILING CHARGED-PARTICLE BEAMS
- Publication number 20220392741
- Publication date Dec 8, 2022
- ASML NETHERLANDS B.V.
- Maikel Robert GOOSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF CONTROLLING AN ENERGY SPREAD OF A CHARG...
- Publication number 20220148842
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Shakeeb Bin HASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION
- Publication number 20210375581
- Publication date Dec 2, 2021
- ASML NETHERLANDS B.V.
- Bernardo KASTRUP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM APPARATUS, INSPECTION TOOL AND INSPECTION METHOD
- Publication number 20210249224
- Publication date Aug 12, 2021
- ASML NETHERLANDS B.V.
- Erwin Paul SMAKMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION SYSTEM, LITHOGRAPHIC APPARATUS, AND INSPECTION METHOD
- Publication number 20210055660
- Publication date Feb 25, 2021
- ASML NETHERLANDS B.V.
- Alexey Olegovich POLYAKOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT
- Publication number 20200312619
- Publication date Oct 1, 2020
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION TOOL, LITHOGRAPHIC APPARATUS, ELECTRON BEAM SOURCE AND A...
- Publication number 20200249181
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Erwin Paul SMAKMAN
- G01 - MEASURING TESTING
Information Patent Application
SEM IMAGE ENHANCEMENT METHODS AND SYSTEMS
- Publication number 20200018944
- Publication date Jan 16, 2020
- ASML Netherlands B.V.
- Wei FANG
- G02 - OPTICS
Information Patent Application
DETERMINING THE COMBINATION OF PATTERNS TO BE APPLIED TO A SUBSTRAT...
- Publication number 20190339621
- Publication date Nov 7, 2019
- ASML NETHERLANDS B.V.
- Coen Adrianus VERSCHUREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY
- Publication number 20190227442
- Publication date Jul 25, 2019
- ASML NETHERLANDS B.V.
- Erwin Paul SMAKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY
- Publication number 20190011841
- Publication date Jan 10, 2019
- ASML NETHERLANDS B.V.
- Pieter Willem Herman DE JAGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION
- Publication number 20190006147
- Publication date Jan 3, 2019
- ASML NETHERLANDS B.V.
- Bernardo KASTRUP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY
- Publication number 20180373159
- Publication date Dec 27, 2018
- ASML Netherlands B.V.
- Erwin Paul SMAKMAN
- B82 - NANO-TECHNOLOGY

Erwin Paul SMAKMAN

Person

Patents Grantslast 30 patents

Systems and methods of profiling charged-particle beams

Pulsed charged-particle beam system

Apparatus for and method of controlling an energy spread of a charg...

Method and apparatus for inspection

Aperture array with integrated current measurement

Determining the combination of patterns to be applied to a substrat...

Inspection tool, lithographic apparatus, electron beam source and a...

Method and apparatus for inspection

Method and apparatus for direct write maskless lithography

Method and apparatus for direct write maskless lithography

Apparatus for direct write maskless lithography

Patents Applicationslast 30 patents

CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD

CHARGED PARTICLE DEVICE, CHARGED PARTICLE ASSESSMENT APPARATUS, MEA...

CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...

METHOD AND APPARATUS FOR INSPECTION

CHARGED PARTICLE APPARATUS AND METHOD

CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD

PULSED CHARGED-PARTICLE BEAM SYSTEM

APPARATUS FOR AND METHOD OF CONTROL OF A CHARGED PARTICLE BEAM

SYSTEMS AND METHODS OF PROFILING CHARGED-PARTICLE BEAMS

APPARATUS FOR AND METHOD OF CONTROLLING AN ENERGY SPREAD OF A CHARG...

METHOD AND APPARATUS FOR INSPECTION

ELECTRON BEAM APPARATUS, INSPECTION TOOL AND INSPECTION METHOD

INSPECTION SYSTEM, LITHOGRAPHIC APPARATUS, AND INSPECTION METHOD

APERTURE ARRAY WITH INTEGRATED CURRENT MEASUREMENT

INSPECTION TOOL, LITHOGRAPHIC APPARATUS, ELECTRON BEAM SOURCE AND A...

SEM IMAGE ENHANCEMENT METHODS AND SYSTEMS

DETERMINING THE COMBINATION OF PATTERNS TO BE APPLIED TO A SUBSTRAT...

APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY

METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY

METHOD AND APPARATUS FOR INSPECTION

METHOD AND APPARATUS FOR DIRECT WRITE MASKLESS LITHOGRAPHY