Erwin Slot

Person

Zoetermeer, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Beam grid layout
- Patent number RE49952
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Charged particle lithography system with alignment sensor and beam...
- Patent number RE49732
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Paul IJmert Scheffers
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number RE49602
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Pieter Kruit
Information Patent Grant
Apparatus for transferring a substrate in a lithography system
- Patent number RE48903
- Issue date Jan 25, 2022
- ASML Netherlands B.V.
- Vincent Sylvester Kuiper
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number RE48046
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Pieter Kruit
Information Patent Grant
Beam grid layout
- Patent number 9,934,943
- Issue date Apr 3, 2018
- Mapper Lithography IP B.V.
- Vincent Sylvester Kuiper
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle lithography system with alignment sensor and beam...
- Patent number 9,665,014
- Issue date May 30, 2017
- Mapper Lithography IP B.V.
- Paul Ijmert Scheffers
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus for transferring a substrate in a lithography system
- Patent number 9,575,418
- Issue date Feb 21, 2017
- Mapper Lithography IP B.V.
- Vincent Sylvester Kuiper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Network architecture for lithography machine cluster
- Patent number 9,244,726
- Issue date Jan 26, 2016
- Mapper Lithography IP B.V.
- Erwin Slot
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus for transferring a substrate in a lithography system
- Patent number 9,176,397
- Issue date Nov 3, 2015
- Mapper Lithography IP B.V.
- Vincent Sylvester Kuiper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of processing a substrate in a lithography system
- Patent number 8,936,994
- Issue date Jan 20, 2015
- Mapper Lithography IP B.V.
- Vincent Sylvester Kuiper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and method of processing substrates in such a li...
- Patent number 8,895,943
- Issue date Nov 25, 2014
- Mapper Lithography IP B.V.
- Guido De Boer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number RE45206
- Issue date Oct 28, 2014
- Mapper Lithography IP B.V.
- Pieter Kruit
- 250 - Radiant energy
Information Patent Grant
Lithography system, sensor and measuring method
- Patent number 7,868,300
- Issue date Jan 11, 2011
- Mapper Lithography IP B.V.
- Pieter Kruit
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD
- Publication number 20240288389
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- B08 - CLEANING
Information Patent Application
CHARGED PARTICLE-OPTICAL DEVICE, CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240234081
- Publication date Jul 11, 2024
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240145208
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE-OPTICAL DEVICE, CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240136147
- Publication date Apr 25, 2024
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE...
- Publication number 20240128045
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD
- Publication number 20230324318
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT DETERMINATION METHOD AND COMPUTER PROGRAM
- Publication number 20230207259
- Publication date Jun 29, 2023
- ASML NETHERLANDS B.V.
- Erwin SLOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE DEVICE, DETECTOR, AND METHODS
- Publication number 20230005706
- Publication date Jan 5, 2023
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for transferring a substrate in a lithography system
- Publication number 20160004173
- Publication date Jan 7, 2016
- MAPPER LITHOGRAPHY IP BV
- Vincent Sylvester KUIPER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH ALIGNMENT SENSOR AND BEAM...
- Publication number 20150109601
- Publication date Apr 23, 2015
- MAPPER LITHOGRAPHY IP BV
- Paul IJmert Scheffers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for transferring a substrate in a lithography system
- Publication number 20130044305
- Publication date Feb 21, 2013
- MAPPER LITHOGRAPHY IP BV
- Vincent Sylvester KUIPER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Network architecture for lithography machine cluster
- Publication number 20130037730
- Publication date Feb 14, 2013
- MAPPER LITHOGRAPHY IP BV
- Erwin SLOT
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of processing a substrate in a lithography system
- Publication number 20130034421
- Publication date Feb 7, 2013
- MAPPER LITHOGRAPHY IP BV
- Vincent Sylvester KUIPER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY SYSTEM AND METHOD OF PROCESSING SUBSTRATES IN SUCH A LI...
- Publication number 20120175527
- Publication date Jul 12, 2012
- MAPPER LITHOGRAPHY IP BV
- Guido DE BOER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography system, sensor and measuring method
- Publication number 20070057204
- Publication date Mar 15, 2007
- Pieter Kruit
- B82 - NANO-TECHNOLOGY

Person

Patents Grantslast 30 patents

Beam grid layout

Charged particle lithography system with alignment sensor and beam...

Lithography system, sensor and measuring method

Apparatus for transferring a substrate in a lithography system

Lithography system, sensor and measuring method

Beam grid layout

Charged particle lithography system with alignment sensor and beam...

Apparatus for transferring a substrate in a lithography system

Network architecture for lithography machine cluster

Apparatus for transferring a substrate in a lithography system

Method of processing a substrate in a lithography system

Lithography system and method of processing substrates in such a li...

Lithography system, sensor and measuring method

Lithography system, sensor and measuring method

Patents Applicationslast 30 patents

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD

CHARGED PARTICLE-OPTICAL DEVICE, CHARGED PARTICLE APPARATUS AND METHOD

CHARGED PARTICLE APPARATUS AND METHOD

CHARGED PARTICLE-OPTICAL DEVICE, CHARGED PARTICLE APPARATUS AND METHOD

CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD OF ALIGNING A SAMPLE...

CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD

ALIGNMENT DETERMINATION METHOD AND COMPUTER PROGRAM

CHARGED PARTICLE DEVICE, DETECTOR, AND METHODS

Apparatus for transferring a substrate in a lithography system

CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH ALIGNMENT SENSOR AND BEAM...

Apparatus for transferring a substrate in a lithography system

Network architecture for lithography machine cluster

Method of processing a substrate in a lithography system

LITHOGRAPHY SYSTEM AND METHOD OF PROCESSING SUBSTRATES IN SUCH A LI...

Lithography system, sensor and measuring method