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Etsuo Iijima

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  • Amagasaki-shi, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Dry-etching method
    • Patent number 8,288,286
    • Issue date Oct 16, 2012
    • Tokyo Electron Limited
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Dry-etching method
    • Patent number 7,531,460
    • Issue date May 12, 2009
    • Tokyo Electron Limited
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus and plasma processing method
    • Patent number 7,504,040
    • Issue date Mar 17, 2009
    • Tokyo Electron Limited
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Dry-etching method
    • Patent number 7,476,624
    • Issue date Jan 13, 2009
    • Tokyo Electron Limited
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Dry-etching method
    • Patent number 7,183,217
    • Issue date Feb 27, 2007
    • Tokyo Electron Limited
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    DRY-ETCHING METHOD
    • Publication number 20130025789
    • Publication date Jan 31, 2013
    • TOKYO ELECTRON LIMITED
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DRY-ETCHING METHOD
    • Publication number 20090098736
    • Publication date Apr 16, 2009
    • TOKYO ELECTRON LIMITED
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD
    • Publication number 20080261406
    • Publication date Oct 23, 2008
    • TOKYO ELECTRON LIMITED
    • Etsuo IIJIMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20070184657
    • Publication date Aug 9, 2007
    • TOKYO ELECTRON LIMITED
    • Etsuo IIJIMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing apparatus and plasma processing method
    • Publication number 20070148364
    • Publication date Jun 28, 2007
    • TOKYO ELECTRON LIMITED
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Dry-etching method
    • Publication number 20060172546
    • Publication date Aug 3, 2006
    • TOKYO ELECTON LIMITED
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Capacitive coupling plasma processing apparatus
    • Publication number 20060081337
    • Publication date Apr 20, 2006
    • Shinji Himori
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Dry-etcching method
    • Publication number 20040192056
    • Publication date Sep 30, 2004
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Dry-etching method
    • Publication number 20040171254
    • Publication date Sep 2, 2004
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Etching method
    • Publication number 20040009667
    • Publication date Jan 15, 2004
    • Etsuo Iijima
    • H01 - BASIC ELECTRIC ELEMENTS