Euhngi LEE

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Santa Clara, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment process to densify oxide layers
- Patent number 12,094,709
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Jung Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DOPED SILICON OXIDE FOR BOTTOM-UP DEPOSITION
- Publication number 20240420949
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Woongsik Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT PROCESS TO DENSIFY OXIDE LAYERS
- Publication number 20240404823
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Jung Chan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD OF SIBN THIN FILMS WITH LOW LEAKAGE CURRENT
- Publication number 20240304437
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Chuanxi YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA TREATMENT PROCESS TO DENSIFY OXIDE LAYERS
- Publication number 20230030436
- Publication date Feb 2, 2023
- Applied Materials, Inc.
- Jung Chan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING FILMS CONTAINING SILICON BORON WITH LOW LEAKAGE...
- Publication number 20200211834
- Publication date Jul 2, 2020
- Applied Materials, Inc.
- Chuanxi YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...