EVANS LEE

Person

Milpitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Electrostatic chuck assembly having a dielectric filler
- Patent number 10,930,540
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly having a dielectric filler
- Patent number 10,504,765
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for processing substrates in process systems having shared...
- Patent number 8,721,798
- Issue date May 13, 2014
- Applied Materials, Inc.
- James P. Cruse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for processing substrates in process systems having shared...
- Patent number 8,496,756
- Issue date Jul 30, 2013
- Applied Materials, Inc.
- James P. Cruse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for providing uniform plasma in a magnetic fie...
- Patent number 7,374,636
- Issue date May 20, 2008
- Applied Materials, Inc.
- Keiji Horioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling the magnetic field intensity i...
- Patent number 7,316,199
- Issue date Jan 8, 2008
- Applied Materials, Inc.
- Keiji Horioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnet assembly for plasma containment
- Patent number 7,294,224
- Issue date Nov 13, 2007
- Applied Materials, Inc.
- Anthony Vesci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 7,147,719
- Issue date Dec 12, 2006
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlled window with a fluid supply system
- Patent number 6,916,399
- Issue date Jul 12, 2005
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic barrier for plasma in chamber exhaust
- Patent number 6,863,835
- Issue date Mar 8, 2005
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric etch chamber with expanded process window
- Patent number 6,797,639
- Issue date Sep 28, 2004
- Applied Materials Inc.
- James D Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic barrier for plasma in chamber exhaust
- Patent number 6,773,544
- Issue date Aug 10, 2004
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric etch chamber with expanded process window
- Patent number 6,716,302
- Issue date Apr 6, 2004
- Applied Materials Inc.
- James D Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 6,647,918
- Issue date Nov 18, 2003
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjusting DC bias voltage in plasma chamber
- Patent number 6,513,452
- Issue date Feb 4, 2003
- Applied Materials Inc.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor cooled ceiling with an array of thermally isolated p...
- Patent number 6,432,259
- Issue date Aug 13, 2002
- Applied Materials, Inc.
- Hamid Noorbakhsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support assembly with thermal expansion compensation
- Patent number 6,364,957
- Issue date Apr 2, 2002
- Applied Materials, Inc.
- Gerhard M. Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adjusting DC bias voltage in plasma chamber
- Patent number 6,221,782
- Issue date Apr 24, 2001
- Applied Materials, Inc.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 6,192,827
- Issue date Feb 27, 2001
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film processing plasma reactor chamber with radially upward sl...
- Patent number 6,076,482
- Issue date Jun 20, 2000
- Applied Materials, Inc.
- Ji Ding
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjusting DC bias voltage in plasma chambers
- Patent number 5,891,350
- Issue date Apr 6, 1999
- Applied Materials, Inc.
- Hong Ching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable dc bias control in a plasma reactor
- Patent number 5,605,637
- Issue date Feb 25, 1997
- Applied Materials Inc.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTROSTATIC CHUCK ASSEMBLY HAVING A DIELECTRIC FILLER
- Publication number 20200066566
- Publication date Feb 27, 2020
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck Assembly Having A Dielectric Filler
- Publication number 20180308736
- Publication date Oct 25, 2018
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TWIN CHAMBER PROCESSING SYSTEM
- Publication number 20110265951
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- MING XU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TWIN CHAMBER PROCESSING SYSTEM WITH SHARED VACUUM PUMP
- Publication number 20110265884
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- MING XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...
- Publication number 20110265814
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JAMES P. CRUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...
- Publication number 20110266256
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JAMES P. CRUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REFURBISHING A MAGNET ASSEMBLY FOR PLASMA PROCESS CHAMBER
- Publication number 20080066785
- Publication date Mar 20, 2008
- APPLIED MATERIALS, INC.
- Anthony Vesci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROLLED SEMICONDUCTOR PROCESSING CHAMBER LINER
- Publication number 20070091535
- Publication date Apr 26, 2007
- APPLIED MATERIALS, INC.
- Hamid Noorbakhsh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnet assembly for plasma containment
- Publication number 20050115678
- Publication date Jun 2, 2005
- Anthony Vesci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20050003675
- Publication date Jan 6, 2005
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Double slit-valve doors for plasma processing
- Publication number 20040083978
- Publication date May 6, 2004
- APPLIED MATERIALS, INC.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for controlling the magnetic field intensity i...
- Publication number 20030085000
- Publication date May 8, 2003
- APPLIED MATERIALS, INC.
- Keiji Horioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20030037880
- Publication date Feb 27, 2003
- APPLIED MATERIALS, INC.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20030038111
- Publication date Feb 27, 2003
- APPLIED MATERIALS, INC.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for providing uniform plasma in a magnetic fie...
- Publication number 20030006008
- Publication date Jan 9, 2003
- APPLIED MATERIALS, INC.
- Keiji Horioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature controlled semiconductor processing chamber liner
- Publication number 20020069970
- Publication date Jun 13, 2002
- APPLIED MATERIALS, INC.
- Hamid Noorbakhsh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetic barrier for plasma in chamber exhaust
- Publication number 20010032590
- Publication date Oct 25, 2001
- APPLIED MATERIALS, INC.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetic barrier for plasma in chamber exhaust
- Publication number 20010032591
- Publication date Oct 25, 2001
- APPLIED MATERIALS, INC.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Adjusting DC bias voltage in plasma chamber
- Publication number 20010014540
- Publication date Aug 16, 2001
- APPLIED MATERIALS, INC.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Electrostatic chuck assembly having a dielectric filler

Electrostatic chuck assembly having a dielectric filler

Methods for processing substrates in process systems having shared...

Methods for processing substrates in process systems having shared...

Method and apparatus for providing uniform plasma in a magnetic fie...

Method and apparatus for controlling the magnetic field intensity i...

Magnet assembly for plasma containment

Double slit-valve doors for plasma processing

Temperature controlled window with a fluid supply system

Magnetic barrier for plasma in chamber exhaust

Dielectric etch chamber with expanded process window

Magnetic barrier for plasma in chamber exhaust

Dielectric etch chamber with expanded process window

Double slit-valve doors for plasma processing

Adjusting DC bias voltage in plasma chamber

Plasma reactor cooled ceiling with an array of thermally isolated p...

Support assembly with thermal expansion compensation

Adjusting DC bias voltage in plasma chamber

Double slit-valve doors for plasma processing

Thin film processing plasma reactor chamber with radially upward sl...

Adjusting DC bias voltage in plasma chambers

Adjustable dc bias control in a plasma reactor

Patents Applicationslast 30 patents

ELECTROSTATIC CHUCK ASSEMBLY HAVING A DIELECTRIC FILLER

Electrostatic Chuck Assembly Having A Dielectric Filler

TWIN CHAMBER PROCESSING SYSTEM

TWIN CHAMBER PROCESSING SYSTEM WITH SHARED VACUUM PUMP

METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...

METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...

METHOD OF REFURBISHING A MAGNET ASSEMBLY FOR PLASMA PROCESS CHAMBER

TEMPERATURE CONTROLLED SEMICONDUCTOR PROCESSING CHAMBER LINER

Magnet assembly for plasma containment

Dielectric etch chamber with expanded process window

Double slit-valve doors for plasma processing

Method and apparatus for controlling the magnetic field intensity i...

Dielectric etch chamber with expanded process window

Dielectric etch chamber with expanded process window

Method and apparatus for providing uniform plasma in a magnetic fie...

Temperature controlled semiconductor processing chamber liner

Magnetic barrier for plasma in chamber exhaust

Magnetic barrier for plasma in chamber exhaust

Adjusting DC bias voltage in plasma chamber