Everhardus Cornelis MOS

Person

Best, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for controlling a semiconductor manufacturing process
- Patent number 12,276,919
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 12,189,302
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method to label substrates based on process parameters
- Patent number 12,045,555
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Vahid Bastani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for optimization of lithographic process
- Patent number 12,044,981
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 11,977,034
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Inspection method and apparatus and lithographic processing cell
- Patent number RE49460
- Issue date Mar 14, 2023
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
Information Patent Grant
Method for optimization of a lithographic process
- Patent number 11,480,884
- Issue date Oct 25, 2022
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus and lithographic processing cell
- Patent number RE49199
- Issue date Sep 6, 2022
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
Information Patent Grant
Method for determining contribution to a fingerprint
- Patent number 11,378,891
- Issue date Jul 5, 2022
- ASML Netherlands B.V.
- Davit Harutyunyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computational metrology
- Patent number 11,347,150
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method to change an etch parameter
- Patent number 11,300,887
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for calculating substrate model parameters an...
- Patent number 11,300,891
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Jasper Menger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 11,170,072
- Issue date Nov 9, 2021
- ASML Netherands B.V.
- Everhardus Cornelis Mos
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for optimization of lithographic process
- Patent number 11,099,487
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 11,067,902
- Issue date Jul 20, 2021
- ASML Netherlands B.V.
- Patrick Warnaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method
- Patent number 11,061,336
- Issue date Jul 13, 2021
- ASML Netherlands B.V.
- Hubertus Johannes Gertrudus Simons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to reduce effects of nonlinear behavior
- Patent number 11,036,146
- Issue date Jun 15, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 10,996,176
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- G05 - CONTROLLING REGULATING
Information Patent Grant
Computational metrology
- Patent number 10,990,018
- Issue date Apr 27, 2021
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for characterizing distortions in a lithographic process, li...
- Patent number 10,928,737
- Issue date Feb 23, 2021
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,915,689
- Issue date Feb 9, 2021
- ASML Netherlands B.V.
- Peter Ten Berge
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatus for calculating substrate model parameters an...
- Patent number 10,859,930
- Issue date Dec 8, 2020
- ASML Netherlands B.V.
- Jasper Menger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining contribution to a fingerprint
- Patent number 10,816,904
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Davit Harutyunyan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of monitoring and device manufacturing method
- Patent number 10,809,631
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimization of a lithographic process
- Patent number 10,802,408
- Issue date Oct 13, 2020
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 10,746,668
- Issue date Aug 18, 2020
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for reticle optimization
- Patent number 10,725,372
- Issue date Jul 28, 2020
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,691,863
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Peter Ten Berge
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatus for calculating substrate model parameters an...
- Patent number 10,495,990
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Jasper Menger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 10,317,191
- Issue date Jun 11, 2019
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND ASSO...
- Publication number 20240192610
- Publication date Jun 13, 2024
- ASML NETHERLANDS B.V.
- Gijs TEN HAAF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF FITTING MEASUREMENT DATA TO A MODEL AND MODELING A PERFO...
- Publication number 20240118629
- Publication date Apr 11, 2024
- ASML NETHERLANDS B.V.
- Aliasghar KEYVANI JANBAHAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20220342319
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Davit Harutyunyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20220260925
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CONTROLLING A SEMICONDUCTOR MANUFACTURING PROCESS
- Publication number 20220236647
- Publication date Jul 28, 2022
- ASML NETHERLANDS B.V.
- Marc HAUPTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20220027437
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR OPTIMIZATION OF LITHOGRAPHIC PROCESS
- Publication number 20210349402
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Marc HAUPTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20210349395
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Apparatus for Measuring a Property of a Substrate
- Publication number 20210215622
- Publication date Jul 15, 2021
- ASML NETHERLANDS B.V.
- Wouter Lodewijk ELINGS
- G05 - CONTROLLING REGULATING
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20210191278
- Publication date Jun 24, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUS FOR CALCULATING SUBSTRATE MODEL PARAMETERS AN...
- Publication number 20210191286
- Publication date Jun 24, 2021
- ASML NETHERLANDS B.V.
- Jasper MENGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20210003927
- Publication date Jan 7, 2021
- ASML NETHERLANDS B.V.
- Davit Harutyunyan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO LABEL SUBSTRATES BASED ON PROCESS PARAMETERS
- Publication number 20200356881
- Publication date Nov 12, 2020
- ASML NETHERLANDS B.V.
- Vahid BASTANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS
- Publication number 20200356012
- Publication date Nov 12, 2020
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Apparatus for Measuring a Property of a Substrate
- Publication number 20200319118
- Publication date Oct 8, 2020
- ASML NETHERLANDS B.V.
- Wouter Lodewijk ELINGS
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20200249576
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE MANUFACTURING METHOD
- Publication number 20200081353
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Hubertus Johannes Gertrudus SIMONS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR CALCULATING SUBSTRATE MODEL PARAMETERS AN...
- Publication number 20200057395
- Publication date Feb 20, 2020
- ASML NETHERLANDS B.V.
- Jasper MENGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR OPTIMIZATION OF LITHOGRAPHIC PROCESS
- Publication number 20200026201
- Publication date Jan 23, 2020
- ASML NETHERLANDS B.V.
- Marc HAUPTMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20190361358
- Publication date Nov 28, 2019
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS
- Publication number 20190317412
- Publication date Oct 17, 2019
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A PROCESSING APPARATUS AND A METHOD FOR CORRECTING A PARAMETER VARI...
- Publication number 20190311921
- Publication date Oct 10, 2019
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Apparatus for Measuring a Property of a Substrate
- Publication number 20190301850
- Publication date Oct 3, 2019
- ASML NETHERLANDS B.V.
- Wouter Lodewijk ELINGS
- G01 - MEASURING TESTING
Information Patent Application
A METHOD TO CHANGE AN ETCH PARAMETER
- Publication number 20190285992
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20190271919
- Publication date Sep 5, 2019
- ASML NETHERLANDS B.V.
- Davit HARUTYUNYAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CHARACTERIZING DISTORTIONS IN A LITHOGRAPHIC PROCESS, LI...
- Publication number 20190011842
- Publication date Jan 10, 2019
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
- Publication number 20180322237
- Publication date Nov 8, 2018
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO REDUCE EFFECTS OF NONLINEAR BEHAVIOR
- Publication number 20180314168
- Publication date Nov 1, 2018
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
- Publication number 20180307135
- Publication date Oct 25, 2018
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MONITORING AND DEVICE MANUFACTURING METHOD
- Publication number 20180307145
- Publication date Oct 25, 2018
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Everhardus Cornelis MOS

Person

Patents Grantslast 30 patents

Method for controlling a semiconductor manufacturing process

Computational metrology

Method to label substrates based on process parameters

Method and apparatus for optimization of lithographic process

Methods and apparatus for measuring a property of a substrate

Inspection method and apparatus and lithographic processing cell

Method for optimization of a lithographic process

Inspection method and apparatus and lithographic processing cell

Method for determining contribution to a fingerprint

Computational metrology

Method to change an etch parameter

Methods and apparatus for calculating substrate model parameters an...

Method and apparatus for inspection and metrology

Method and apparatus for optimization of lithographic process

Computational metrology

Device manufacturing method

Method and apparatus to reduce effects of nonlinear behavior

Methods and apparatus for measuring a property of a substrate

Computational metrology

Method for characterizing distortions in a lithographic process, li...

Method and apparatus to correct for patterning process error

Methods and apparatus for calculating substrate model parameters an...

Method for determining contribution to a fingerprint

Method of monitoring and device manufacturing method

Method for optimization of a lithographic process

Methods and apparatus for measuring a property of a substrate

Method and apparatus for reticle optimization

Method and apparatus to correct for patterning process error

Methods and apparatus for calculating substrate model parameters an...

Methods and apparatus for measuring a property of a substrate

Patents Applicationslast 30 patents

METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND ASSO...

METHODS OF FITTING MEASUREMENT DATA TO A MODEL AND MODELING A PERFO...

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

COMPUTATIONAL METROLOGY

METHOD FOR CONTROLLING A SEMICONDUCTOR MANUFACTURING PROCESS

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

METHOD AND APPARATUS FOR OPTIMIZATION OF LITHOGRAPHIC PROCESS

COMPUTATIONAL METROLOGY

Methods and Apparatus for Measuring a Property of a Substrate

COMPUTATIONAL METROLOGY

METHODS AND APPARATUS FOR CALCULATING SUBSTRATE MODEL PARAMETERS AN...

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

METHOD TO LABEL SUBSTRATES BASED ON PROCESS PARAMETERS

METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS

Methods and Apparatus for Measuring a Property of a Substrate

COMPUTATIONAL METROLOGY

DEVICE MANUFACTURING METHOD

METHODS AND APPARATUS FOR CALCULATING SUBSTRATE MODEL PARAMETERS AN...

METHOD AND APPARATUS FOR OPTIMIZATION OF LITHOGRAPHIC PROCESS

COMPUTATIONAL METROLOGY

A METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS

A PROCESSING APPARATUS AND A METHOD FOR CORRECTING A PARAMETER VARI...

Methods and Apparatus for Measuring a Property of a Substrate

A METHOD TO CHANGE AN ETCH PARAMETER

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

METHOD FOR CHARACTERIZING DISTORTIONS IN A LITHOGRAPHIC PROCESS, LI...

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

METHOD AND APPARATUS TO REDUCE EFFECTS OF NONLINEAR BEHAVIOR

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

METHOD OF MONITORING AND DEVICE MANUFACTURING METHOD