Evgeni Gurevich

Person

Yokneam Illit, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 11,537,043
- Issue date Dec 27, 2022
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Imaging overlay targets using Moiré elements and rotational symmetr...
- Patent number 11,256,177
- Issue date Feb 22, 2022
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Misregistration metrology by using fringe Moiré and optical Moiré e...
- Patent number 11,164,307
- Issue date Nov 2, 2021
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining the impacts of stochastic behavior on overlay metrology...
- Patent number 10,901,325
- Issue date Jan 26, 2021
- KLA-Tencor Corporation
- Evgeni Gurevich
- G01 - MEASURING TESTING
Information Patent Grant
Method of analyzing and utilizing landscapes to reduce or eliminate...
- Patent number 10,831,108
- Issue date Nov 10, 2020
- KLA Corporation
- Tal Marciano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20230099105
- Publication date Mar 30, 2023
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20220171297
- Publication date Jun 2, 2022
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY
- Publication number 20210175132
- Publication date Jun 10, 2021
- KLA-Tencor Corporation
- Barak Bringoltz
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20210149296
- Publication date May 20, 2021
- KLA-Tencor Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Application
Imaging Overlay Targets Using Moire Elements and Rotational Symmetr...
- Publication number 20210072650
- Publication date Mar 11, 2021
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20190250504
- Publication date Aug 15, 2019
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING THE IMPACTS OF STOCHASTIC BEHAVIOR ON OVERLAY METROLOGY...
- Publication number 20190049858
- Publication date Feb 14, 2019
- KLA-Tencor Corporation
- Evgeni GUREVICH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY
- Publication number 20180047646
- Publication date Feb 15, 2018
- KLA-Tencor Corporation
- Barak Bringoltz
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS OF ANALYZING AND UTILIZING LANDSCAPES TO REDUCE OR ELIMINAT...
- Publication number 20160313658
- Publication date Oct 27, 2016
- KLA-Tencor Corporation
- Tal Marciano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Evgeni Gurevich

Person

Patents Grantslast 30 patents

Reduction or elimination of pattern placement error in metrology me...

Imaging overlay targets using Moiré elements and rotational symmetr...

Misregistration metrology by using fringe Moiré and optical Moiré e...

Determining the impacts of stochastic behavior on overlay metrology...

Method of analyzing and utilizing landscapes to reduce or eliminate...

Patents Applicationslast 30 patents

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

Imaging Overlay Targets Using Moire Elements and Rotational Symmetr...

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

DETERMINING THE IMPACTS OF STOCHASTIC BEHAVIOR ON OVERLAY METROLOGY...

ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY

METHODS OF ANALYZING AND UTILIZING LANDSCAPES TO REDUCE OR ELIMINAT...