Fabian Wunn

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Freiburg, DE

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Patents Grantslast 30 patents

Information Patent Grant
Monitoring a discharge in a plasma process
- Patent number 10,181,392
- Issue date Jan 15, 2019
- TRUMPF Huettinger GmbH + Co. KG
- Daniel Leypold
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Monitoring a Discharge in a Plasma Process
- Publication number 20160217975
- Publication date Jul 28, 2016
- TRUMPF Huettinger GmbH + Co. KG
- Daniel Leypold
- G01 - MEASURING TESTING