Fangli Hao

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate support with improved process uniformity
- Patent number 11,984,296
- Issue date May 14, 2024
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with improved process uniformity
- Patent number 10,910,195
- Issue date Feb 2, 2021
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Helium plug design to reduce arcing
- Patent number 10,741,425
- Issue date Aug 11, 2020
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boltless substrate support assembly
- Patent number 10,460,978
- Issue date Oct 29, 2019
- Lam Research Corporation
- Fangli Hao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pin lifter assembly with small gap
- Patent number 10,262,887
- Issue date Apr 16, 2019
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating method for gas delivery system
- Patent number 9,689,533
- Issue date Jun 27, 2017
- Lam Research Corporation
- Ian Kenworthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pin lifting system
- Patent number 9,011,602
- Issue date Apr 21, 2015
- Lam Research Corporation
- Fangli J. Hao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Automated bubble detection apparatus and method
- Patent number 8,854,451
- Issue date Oct 7, 2014
- Lam Research Corporation
- Josh Cormier
- G01 - MEASURING TESTING
Information Patent Grant
Coating method for gas delivery system
- Patent number 8,852,685
- Issue date Oct 7, 2014
- Lam Research Corporation
- Ian Kenworthy
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus for shielding process chamber port
- Patent number 7,685,965
- Issue date Mar 30, 2010
- Lam Research Corporation
- Fangli J. Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lower electrode design for higher uniformity
- Patent number 7,524,397
- Issue date Apr 28, 2009
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for optimizing the delivery of a set of gases...
- Patent number 7,234,222
- Issue date Jun 26, 2007
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deformation reduction at the main chamber
- Patent number 6,949,204
- Issue date Sep 27, 2005
- Lam Research Corporation
- Eric Lenz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two position robot design for FOUP purge
- Patent number 6,922,867
- Issue date Aug 2, 2005
- Lam Research Corporation
- Fangli Hao
- B08 - CLEANING
Information Patent Grant
Symmetrical semiconductor reactor
- Patent number 6,889,627
- Issue date May 10, 2005
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear drive system for use in a plasma processing system
- Patent number 6,863,784
- Issue date Mar 8, 2005
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deformation reduction at the main chamber
- Patent number 6,712,929
- Issue date Mar 30, 2004
- Lam Research Corporation
- Eric Lenz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear drive system for use in a plasma processing system
- Patent number 6,669,811
- Issue date Dec 30, 2003
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sealing techniques suitable for different geometries and constraine...
- Patent number 6,536,777
- Issue date Mar 25, 2003
- Lam Research Corporation
- Fangli J. Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for elimination of plasma lighting inside a gas line in a...
- Patent number 6,528,949
- Issue date Mar 4, 2003
- Lam Research Corporation
- Fangli J. Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lift pin impact management
- Patent number 6,481,723
- Issue date Nov 19, 2002
- Lam Research Corporation
- Fangli J. Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer area pressure control
- Patent number 6,433,484
- Issue date Aug 13, 2002
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution apparatus for semiconductor processing
- Patent number 6,432,831
- Issue date Aug 13, 2002
- Lam Research Corporation
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution apparatus for semiconductor processing
- Patent number 6,415,736
- Issue date Jul 9, 2002
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lower electrode design for higher uniformity
- Patent number 6,363,882
- Issue date Apr 2, 2002
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear drive system for use in a plasma processing system
- Patent number 6,350,317
- Issue date Feb 26, 2002
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution apparatus for semiconductor processing
- Patent number 6,245,192
- Issue date Jun 12, 2001
- Lam Research Corporation
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for compensating non-uniform wafer processing...
- Patent number 6,188,564
- Issue date Feb 13, 2001
- Lam Research Corporation
- Fangli J. Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reaction chamber component having improved temperature uniformity
- Patent number 6,123,775
- Issue date Sep 26, 2000
- Lam Research Corporation
- Fangli Hao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Endpoint detection methods in plasma etch processes and apparatus t...
- Patent number 5,966,586
- Issue date Oct 12, 1999
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY
- Publication number 20240282551
- Publication date Aug 22, 2024
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY
- Publication number 20210166914
- Publication date Jun 3, 2021
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH FLEXIBLE WAFER TEMPERATURE CONTROL
- Publication number 20180286642
- Publication date Oct 4, 2018
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BOLTLESS SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20180261492
- Publication date Sep 13, 2018
- Lam Research Corporation
- Fangli Hao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HELIUM PLUG DESIGN TO REDUCE ARCING
- Publication number 20180240688
- Publication date Aug 23, 2018
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY
- Publication number 20180190526
- Publication date Jul 5, 2018
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PIN LIFTER ASSEMBLY WITH SMALL GAP
- Publication number 20180114716
- Publication date Apr 26, 2018
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING METHOD FOR GAS DELIVERY SYSTEM
- Publication number 20140366968
- Publication date Dec 18, 2014
- Ian Kenworthy
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
AUTOMATED BUBBLE DETECTION APPARATUS AND METHOD
- Publication number 20130100278
- Publication date Apr 25, 2013
- LAM RESEARCH CORPORATION
- Josh Cormier
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
COATING METHOD FOR GAS DELIVERY SYSTEM
- Publication number 20110259519
- Publication date Oct 27, 2011
- LAM RESEARCH CORPORATION
- Ian Kenworthy
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Application
PIN LIFTING SYSTEM
- Publication number 20100187777
- Publication date Jul 29, 2010
- Fangli J. Hao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for shielding process chamber port having dual zone and o...
- Publication number 20070169704
- Publication date Jul 26, 2007
- LAM RESEARCH CORPORATION
- Fangli J. Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Corrosion resistant apparatus for control of a multi-zone nozzle in...
- Publication number 20060065523
- Publication date Mar 30, 2006
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deformation reduction at the main chamber
- Publication number 20060032736
- Publication date Feb 16, 2006
- Lam Research Corporation
- Eric Lenz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Linear drive system for use in a plasma processing system
- Publication number 20040108301
- Publication date Jun 10, 2004
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for elimination of plasma lighting inside a gas line in a...
- Publication number 20020140358
- Publication date Oct 3, 2002
- Lam Research Corporation
- Fangli J. Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Linear drive system for use in a plasma processing system
- Publication number 20020100555
- Publication date Aug 1, 2002
- LAM RESEARCH
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEALING TECHNIQUES SUITABLE FOR DIFFERENT GEOMETRIES AND CONTRAINED...
- Publication number 20010045706
- Publication date Nov 29, 2001
- FANGLI J. HAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas distribution apparatus for semiconductor processing
- Publication number 20010027026
- Publication date Oct 4, 2001
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Substrate support with improved process uniformity

Substrate support with improved process uniformity

Helium plug design to reduce arcing

Boltless substrate support assembly

Pin lifter assembly with small gap

Coating method for gas delivery system

Pin lifting system

Automated bubble detection apparatus and method

Coating method for gas delivery system

Apparatus for shielding process chamber port

Lower electrode design for higher uniformity

Methods and apparatus for optimizing the delivery of a set of gases...

Deformation reduction at the main chamber

Two position robot design for FOUP purge

Symmetrical semiconductor reactor

Linear drive system for use in a plasma processing system

Deformation reduction at the main chamber

Linear drive system for use in a plasma processing system

Sealing techniques suitable for different geometries and constraine...

Apparatus for elimination of plasma lighting inside a gas line in a...

Lift pin impact management

Wafer area pressure control

Gas distribution apparatus for semiconductor processing

Gas distribution apparatus for semiconductor processing

Lower electrode design for higher uniformity

Linear drive system for use in a plasma processing system

Gas distribution apparatus for semiconductor processing

Method and apparatus for compensating non-uniform wafer processing...

Reaction chamber component having improved temperature uniformity

Endpoint detection methods in plasma etch processes and apparatus t...

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY

SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY

ELECTROSTATIC CHUCK WITH FLEXIBLE WAFER TEMPERATURE CONTROL

BOLTLESS SUBSTRATE SUPPORT ASSEMBLY

HELIUM PLUG DESIGN TO REDUCE ARCING

SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY

PIN LIFTER ASSEMBLY WITH SMALL GAP

COATING METHOD FOR GAS DELIVERY SYSTEM

AUTOMATED BUBBLE DETECTION APPARATUS AND METHOD

COATING METHOD FOR GAS DELIVERY SYSTEM

PIN LIFTING SYSTEM

Apparatus for shielding process chamber port having dual zone and o...

Corrosion resistant apparatus for control of a multi-zone nozzle in...

Deformation reduction at the main chamber

Linear drive system for use in a plasma processing system

Apparatus for elimination of plasma lighting inside a gas line in a...

Linear drive system for use in a plasma processing system

SEALING TECHNIQUES SUITABLE FOR DIFFERENT GEOMETRIES AND CONTRAINED...

Gas distribution apparatus for semiconductor processing