Fanyong Ran

Person

Tokyo, JP

People

Patents Applicationslast 30 patents

Information Patent Application
STRUCTURE INCLUDING SILICON GERMANIUM OXIDE PHOTORESIST UNDERLAYER...
- Publication number 20240377751
- Publication date Nov 14, 2024
- ASM IP HOLDING B.V.
- João Ricardo Antunes Afonso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-O...
- Publication number 20240361695
- Publication date Oct 31, 2024
- ASM IP HOLDING B.V.
- João Ricardo Antunes Afonso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR TUNING PHOTORESIST ADHESION LAYER PROPERTIES
- Publication number 20240170282
- Publication date May 23, 2024
- ASM IP HOLDING B.V.
- Jerome Samuel Nicolas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-TEMPERATURE METHODS OF FORMING PHOTORESIST UNDERLAYER AND SYST...
- Publication number 20230393477
- Publication date Dec 7, 2023
- ASM IP HOLDING B.V.
- Fanyong Ran
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA-ENHANCED METHOD AND SYSTEM FOR FORMING A SILICON OXYCARBIDE...
- Publication number 20230340663
- Publication date Oct 26, 2023
- ASM IP HOLDING B.V.
- Fanyong Ran
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING A STRUCTURE COMPRISING A PHOTORESIST UNDERLAYER
- Publication number 20230288810
- Publication date Sep 14, 2023
- ASM IP HOLDING B.V.
- Fanyong Ran
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Fanyong Ran

Person

Patents Applicationslast 30 patents

STRUCTURE INCLUDING SILICON GERMANIUM OXIDE PHOTORESIST UNDERLAYER...

STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-O...

METHOD AND SYSTEM FOR TUNING PHOTORESIST ADHESION LAYER PROPERTIES

HIGH-TEMPERATURE METHODS OF FORMING PHOTORESIST UNDERLAYER AND SYST...

PLASMA-ENHANCED METHOD AND SYSTEM FOR FORMING A SILICON OXYCARBIDE...

METHOD OF FORMING A STRUCTURE COMPRISING A PHOTORESIST UNDERLAYER