Fei Wang

Person

Tempe, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for use with hydrogen radicals and method of using same
- Patent number 12,272,527
- Issue date Apr 8, 2025
- ASM IP Holding B.V.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing preclean methods and apparatus
- Patent number 12,112,938
- Issue date Oct 8, 2024
- ASM IP Holding B.V.
- Chuang Wei
- B08 - CLEANING
Information Patent Grant
Apparatus and methods for selectively etching silicon oxide films
- Patent number 11,437,241
- Issue date Sep 6, 2022
- ASM IP Holding B.V.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for selectively etching films
- Patent number 11,315,794
- Issue date Apr 26, 2022
- ASM IP Holding B.V.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS
- Publication number 20240429038
- Publication date Dec 26, 2024
- ASM IP HOLDING B.V.
- Chuang Wei
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR PROCESSING A SILICON SURFACE USING MULTIPLE...
- Publication number 20230193475
- Publication date Jun 22, 2023
- ASM IP HOLDING, B.V.
- Gregory Deye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR SELECTIVELY REMOVING OXIDE FROM A SURFACE
- Publication number 20230159865
- Publication date May 25, 2023
- ASM IP HOLDING B.V.
- Charles Dezelah
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
APPARATUS AND METHODS FOR SELECTIVELY ETCHING SILICON OXIDE FILMS
- Publication number 20220384203
- Publication date Dec 1, 2022
- ASM IP HOLDING B.V.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR REMOVAL OF OXIDE AND CARBON FROM SEMICONDU...
- Publication number 20220367175
- Publication date Nov 17, 2022
- ASM IP HOLDING B.V.
- Xing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS
- Publication number 20220301856
- Publication date Sep 22, 2022
- ASM IP HOLDING B.V.
- Chuang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR SELECTIVELY ETCHING FILMS
- Publication number 20220301857
- Publication date Sep 22, 2022
- ASM IP HOLDING B.V.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR SELECTIVELY ETCHING FILMS
- Publication number 20220246436
- Publication date Aug 4, 2022
- ASM IP HOLDING B.V.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR SELECTIVELY ETCHING SILICON OXIDE FILMS
- Publication number 20210320010
- Publication date Oct 14, 2021
- ASM IP HOLDING B.V.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR SELECTIVELY ETCHING FILMS
- Publication number 20210118687
- Publication date Apr 22, 2021
- ASM IP HOLDING B.V.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR USE WITH HYDROGEN RADICALS AND METHOD OF USING SAME
- Publication number 20190348261
- Publication date Nov 14, 2019
- ASM IP HOLDING B.V.
- Xing Lin
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD FOR REMOVAL OF OXIDE AND CARBON FROM SEMICONDU...
- Publication number 20190019670
- Publication date Jan 17, 2019
- ASM IP HOLDING B.V.
- Xing Lin
- B08 - CLEANING

Person

Patents Grantslast 30 patents

Apparatus for use with hydrogen radicals and method of using same

Semiconductor processing preclean methods and apparatus

Apparatus and methods for selectively etching silicon oxide films

Apparatus and methods for selectively etching films

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS

SYSTEMS AND METHODS FOR PROCESSING A SILICON SURFACE USING MULTIPLE...

METHOD FOR SELECTIVELY REMOVING OXIDE FROM A SURFACE

APPARATUS AND METHODS FOR SELECTIVELY ETCHING SILICON OXIDE FILMS

APPARATUS AND METHOD FOR REMOVAL OF OXIDE AND CARBON FROM SEMICONDU...

SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS

SYSTEMS AND METHODS FOR SELECTIVELY ETCHING FILMS

APPARATUS AND METHODS FOR SELECTIVELY ETCHING FILMS

APPARATUS AND METHODS FOR SELECTIVELY ETCHING SILICON OXIDE FILMS

APPARATUS AND METHODS FOR SELECTIVELY ETCHING FILMS

APPARATUS FOR USE WITH HYDROGEN RADICALS AND METHOD OF USING SAME

APPARATUS AND METHOD FOR REMOVAL OF OXIDE AND CARBON FROM SEMICONDU...