Feng BAI

Follow

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Mask and method for correcting mask patterns
- Patent number 11,520,225
- Issue date Dec 6, 2022
- Semiconductor Manufacturing International (Shanghai) Corporation
- Feng Bai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Assistant pattern configuration method, mask and forming method the...
- Patent number 11,307,502
- Issue date Apr 19, 2022
- Semiconductor Manufacturing International (Shanghai) Corporation
- Feng Bai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ASSISTANT PATTERN CONFIGURATION METHOD, MASK AND FORMING METHOD THE...
- Publication number 20210271176
- Publication date Sep 2, 2021
- Semiconductor Manufacturing International (Shanghai) Corporation
- Feng Bai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK AND METHOD FOR CORRECTING MASK PATTERNS
- Publication number 20210208499
- Publication date Jul 8, 2021
- Semiconductor Manufacturing International (Shanghai) Corporation
- Feng BAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY