Feng Gao

Follow

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for reducing plasma charge damage for plasma processes
- Patent number 7,036,453
- Issue date May 2, 2006
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning residues from surfaces in a chamber by sputtering sacrific...
- Patent number 6,814,814
- Issue date Nov 9, 2004
- Applied Materials, Inc.
- Alan W. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of reducing plasma charge damage for plasma processes
- Patent number 6,660,662
- Issue date Dec 9, 2003
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system for a CVD processing chamber
- Patent number 6,486,081
- Issue date Nov 26, 2002
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution system for a CVD processing chamber
- Patent number 6,143,078
- Issue date Nov 7, 2000
- Applied Materials, Inc.
- Tetsuya Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Apparatus for reducing plasma charge damage for plasma processes
- Publication number 20040048492
- Publication date Mar 11, 2004
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning residues from surfaces in a chamber by sputtering sacrific...
- Publication number 20030183243
- Publication date Oct 2, 2003
- APPLIED MATERIALS, INC.
- Alan W. Collins
- B08 - CLEANING
Information Patent Application
Method of reducing plasma charge damage for plasma processes
- Publication number 20030024901
- Publication date Feb 6, 2003
- APPLIED MATERIALS, INC.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...