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Beijing, CN
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last 30 patents
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Patent Grant
Systems and methods for etching a substrate
Patent number
11,581,161
Issue date
Feb 14, 2023
ASML Netherlands, B.V.
Jie Fang
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Patents Applications
last 30 patents
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Patent Application
SYSTEMS AND METHODS FOR ETCHING A SUBSTRATE
Publication number
20200211817
Publication date
Jul 2, 2020
ASML NETHERLANDS B.V.
Jie FANG
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR