Fengji Yeh

Person

Wilmington, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
- Patent number 10,144,115
- Issue date Dec 4, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
- Patent number 10,105,825
- Issue date Oct 23, 2018
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,776,300
- Issue date Oct 3, 2017
- Rohm and Haas Electronic Materials CMP Holdings Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,586,305
- Issue date Mar 7, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad with polishing layer and window
- Patent number 9,259,820
- Issue date Feb 16, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Soft and conditionable chemical mechanical window polishing pad
- Patent number 9,238,295
- Issue date Jan 19, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Multilayer chemical mechanical polishing pad stack with soft and co...
- Patent number 9,238,296
- Issue date Jan 19, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- James Murnane
- B24 - GRINDING POLISHING
Information Patent Grant
Soft and conditionable chemical mechanical polishing pad stack
- Patent number 9,233,451
- Issue date Jan 12, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- James Murnane
- B24 - GRINDING POLISHING
Information Patent Grant
Soft and conditionable chemical mechanical polishing pad
- Patent number 9,144,880
- Issue date Sep 29, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Method of chemical mechanical polishing a substrate
- Patent number 9,102,034
- Issue date Aug 11, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Michelle Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Soft and conditionable chemical mechanical polishing pad with window
- Patent number 9,064,806
- Issue date Jun 23, 2015
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Method for chemical mechanical polishing silicon wafers
- Patent number 8,980,749
- Issue date Mar 17, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yasuyuki Itai
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
POLISHING PAD FORMED FROM DUAL CURATIVE
- Publication number 20250033161
- Publication date Jan 30, 2025
- DuPont Electronic Materials Holding, Inc.
- Fengji Yeh
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160379840
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160375543
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- G02 - OPTICS
Information Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20160375553
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20160375555
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD WITH POLISHING LAYER AND WINDOW
- Publication number 20150273652
- Publication date Oct 1, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Bainian Qian
- G02 - OPTICS
Information Patent Application
POLYURETHANE POLISHING PAD
- Publication number 20150059254
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Fengji Yeh
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20150065013
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Michelle Jensen
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF CHEMICAL MECHANICAL POLISHING A SUBSTRATE
- Publication number 20150065014
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Michelle Jensen
- B24 - GRINDING POLISHING
Information Patent Application
Multilayer Chemical Mechanical Polishing Pad Stack With Soft And Co...
- Publication number 20140357163
- Publication date Dec 4, 2014
- James Murnane
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Soft And Conditionable Chemical Mechanical Polishing Pad Stack
- Publication number 20140357169
- Publication date Dec 4, 2014
- James Murnane
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Soft and Conditionable Chemical Mechanical Window Polishing Pad
- Publication number 20140357170
- Publication date Dec 4, 2014
- Bainian Qian
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Soft And Conditionable Chemical Mechanical Polishing Pad
- Publication number 20140120809
- Publication date May 1, 2014
- Bainian Qian
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Person

Patents Grantslast 30 patents

Method of making polishing layer for chemical mechanical polishing pad

Method of making polishing layer for chemical mechanical polishing pad

Chemical mechanical polishing pad and method of making same

Chemical mechanical polishing pad and method of making same

Chemical mechanical polishing pad with polishing layer and window

Soft and conditionable chemical mechanical window polishing pad

Multilayer chemical mechanical polishing pad stack with soft and co...

Soft and conditionable chemical mechanical polishing pad stack

Soft and conditionable chemical mechanical polishing pad

Method of chemical mechanical polishing a substrate

Soft and conditionable chemical mechanical polishing pad with window

Method for chemical mechanical polishing silicon wafers

Patents Applicationslast 30 patents

POLISHING PAD FORMED FROM DUAL CURATIVE

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD

METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD

CHEMICAL MECHANICAL POLISHING PAD WITH POLISHING LAYER AND WINDOW

POLYURETHANE POLISHING PAD

CHEMICAL MECHANICAL POLISHING PAD

METHOD OF CHEMICAL MECHANICAL POLISHING A SUBSTRATE

Multilayer Chemical Mechanical Polishing Pad Stack With Soft And Co...

Soft And Conditionable Chemical Mechanical Polishing Pad Stack

Soft and Conditionable Chemical Mechanical Window Polishing Pad

Soft And Conditionable Chemical Mechanical Polishing Pad