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Ferdinandus Martinus Jozef Henricus Van De Wetering
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Eindhoven, NL
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last 30 patents
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Patent Grant
Component for use in a patterning device environment
Patent number
11,048,180
Issue date
Jun 29, 2021
ASML Netherlands B.V.
Andrey Nikipelov
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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last 30 patents
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Patent Application
PATTERNING DEVICE CONDITIONING SYSTEM AND METHOD
Publication number
20240094647
Publication date
Mar 21, 2024
ASML NETHERLANDS B.V.
Marcus Adrianus VAN DE KERKHOF
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY