Frances A. Houle

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for sub-pellicle defect reduction on photomasks
- Patent number 8,758,962
- Issue date Jun 24, 2014
- International Business Machines Corporation
- Jay S. Burnham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aromatic vinyl ether based reverse-tone step and flash imprint lith...
- Patent number 8,759,415
- Issue date Jun 24, 2014
- International Business Machines Corporation
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Stabilization of vinyl ether materials
- Patent number 8,637,602
- Issue date Jan 28, 2014
- International Business Machines Corporation
- Frances Anne Houle
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Aromatic vinyl ether based reverse-tone step and flash imprint lith...
- Patent number 8,262,961
- Issue date Sep 11, 2012
- International Business Machines Corporation
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for sub-pellicle defect reduction on photomasks
- Patent number 8,173,331
- Issue date May 8, 2012
- International Business Machines Corporation
- Jay S. Burnham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vinyl ether resist formulations for imprint lithography and process...
- Patent number 8,168,691
- Issue date May 1, 2012
- International Business Machines Corporation
- Frances A. Houle
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Stabilizers for vinyl ether resist formulations for imprint lithogr...
- Patent number 8,168,109
- Issue date May 1, 2012
- International Business Machines Corporation
- Frances A. Houle
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Processes and materials for step and flash imprint lithography
- Patent number 8,128,832
- Issue date Mar 6, 2012
- International Business Machines Corporation
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Amorphous oxide release layers for imprint lithography, and method...
- Patent number 8,114,331
- Issue date Feb 14, 2012
- International Business Machines Corporation
- Frances A Houle
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Amorphous nitride release layers for imprint lithography, and metho...
- Patent number 8,029,716
- Issue date Oct 4, 2011
- International Business Machines Corporation
- Frances A Houle
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Phase change materials and associated memory devices
- Patent number 7,875,873
- Issue date Jan 25, 2011
- International Business Machines Corporation
- Yi-Chou Chen
- G11 - INFORMATION STORAGE
Information Patent Grant
Release layer for imprinted photocationic curable resins
- Patent number 7,749,422
- Issue date Jul 6, 2010
- International Business Machines Corporation
- Robert D. Allen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Phase change materials and associated memory devices
- Patent number 7,501,648
- Issue date Mar 10, 2009
- International Business Machines Corporation
- Yi-Chou Chen
- G11 - INFORMATION STORAGE
Information Patent Grant
Stabilization of vinyl ether materials
- Patent number 7,488,771
- Issue date Feb 10, 2009
- International Business Machines Corporation
- Frances Anne Houle
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Processes and materials for step and flash imprint lithography
- Patent number 7,419,611
- Issue date Sep 2, 2008
- International Business Machines Corporation
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus for characterization of photoresist resolution, and metho...
- Patent number 7,179,571
- Issue date Feb 20, 2007
- International Business Machines Corporation
- William Dinan Hinsberg, III
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for forming features of 50 nm or less half-pitch with chemi...
- Patent number 7,090,963
- Issue date Aug 15, 2006
- International Business Machines Corporation
- David R. Medeiros
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fast model-based optical proximity correction
- Patent number 7,079,223
- Issue date Jul 18, 2006
- International Business Machines Corporation
- Alan E. Rosenbluth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for characterization of photoresist resolution, and metho...
- Patent number 7,046,342
- Issue date May 16, 2006
- International Business Machines Corporation
- William Dinan Hinsberg, III
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Low silicon-outgassing resist for bilayer lithography
- Patent number 6,770,419
- Issue date Aug 3, 2004
- International Business Machines Corporation
- Mahmoud M. Khojasteh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Self-longitudinally biased magnetoresistive read transducer
- Patent number 6,188,550
- Issue date Feb 13, 2001
- International Business Machines Corporation
- Robert Edward Fontana
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Software architecture for stochastic simulation of non-homogeneous...
- Patent number 5,826,065
- Issue date Oct 20, 1998
- International Business Machines Corporation
- William Dinan Hinsberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for stochastic and deterministic timebase control in stochas...
- Patent number 5,745,385
- Issue date Apr 28, 1998
- International Business Machines Corproation
- William Dinan Hinsberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Stochastic simulation method for processes containing equilibrium s...
- Patent number 5,625,579
- Issue date Apr 29, 1997
- International Business Machines Corporation
- William D. Hinsberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for producing thin film magnetic structure
- Patent number 5,582,860
- Issue date Dec 10, 1996
- International Business Machines Corporation
- Robert E. Fontana
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for producing thin film magnetic structure
- Patent number 5,503,870
- Issue date Apr 2, 1996
- International Business Machines Corporation
- Robert E. Fontana
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Spatially resolved stochastic simulation system
- Patent number 5,446,870
- Issue date Aug 29, 1995
- International Business Machines Corporation
- William D. Hinsberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Rapid etching method for silicon by SF.sub.6 gas
- Patent number 4,617,086
- Issue date Oct 14, 1986
- International Business Machines Corporation
- Tung J. Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of copper
- Patent number 4,574,095
- Issue date Mar 4, 1986
- International Business Machines Corporation
- Thomas H. Baum
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
STABILIZATION OF VINYL ETHER MATERIALS
- Publication number 20140110888
- Publication date Apr 24, 2014
- International Business Machines Corporation
- Frances A. Houle
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...
- Publication number 20120291668
- Publication date Nov 22, 2012
- International Business Machines Corporation
- Richard Anthony DiPietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS
- Publication number 20120196212
- Publication date Aug 2, 2012
- International Business Machines Corporation
- JAY S. BURNHAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stabilizers for Vinyl Ether Resist Formulations for Imprint Lithogr...
- Publication number 20110042862
- Publication date Feb 24, 2011
- International Business Corporation
- Frances A. Houle
- B82 - NANO-TECHNOLOGY
Information Patent Application
VINYL ETHER RESIST FORMULATIONS FOR IMPRINT LITHOGRAPHY AND PROCESS...
- Publication number 20100201043
- Publication date Aug 12, 2010
- International Business Machines Corporation
- Frances A. Houle
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS
- Publication number 20100178598
- Publication date Jul 15, 2010
- International Business Machines Corporation
- JAY S. BURNHAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AMORPHOUS NITRIDE RELEASE LAYERS FOR IMPRINT LITHOGRAPHY, AND METHO...
- Publication number 20090194502
- Publication date Aug 6, 2009
- International Business Machines Corporation
- Frances A. Houle
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
AMORPHOUS OXIDE RELEASE LAYERS FOR IMPRINT LITHOGRAPHY, AND METHOD...
- Publication number 20090169663
- Publication date Jul 2, 2009
- International Business Machines Corporation
- Frances A. Houle
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHASE CHANGE MATERIALS AND ASSOCIATED MEMORY DEVICES
- Publication number 20090095953
- Publication date Apr 16, 2009
- International Business Machines Corporation
- Yi-Chou Chen
- G11 - INFORMATION STORAGE
Information Patent Application
STABILIZATION OF VINYL ETHER MATERIALS
- Publication number 20090092767
- Publication date Apr 9, 2009
- Frances Anne Houle
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RELEASE LAYER FOR IMPRINTED PHOTOCATIONICALLY CURED FILMS
- Publication number 20080248213
- Publication date Oct 9, 2008
- International Business Machines Corporation
- Robert D. Allen
- B82 - NANO-TECHNOLOGY
Information Patent Application
RELEASE LAYER FOR IMPRINTED PHOTOCATIONIC CURABLE RESINS
- Publication number 20080241418
- Publication date Oct 2, 2008
- International Business Machines Corporation
- Robert D. Allen
- B82 - NANO-TECHNOLOGY
Information Patent Application
AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...
- Publication number 20080174051
- Publication date Jul 24, 2008
- Richard Anthony DiPietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY
- Publication number 20080169268
- Publication date Jul 17, 2008
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHASE CHANGE MATERIALS AND ASSOCIATED MEMORY DEVICES
- Publication number 20080042167
- Publication date Feb 21, 2008
- Yi-Chou Chen
- G11 - INFORMATION STORAGE
Information Patent Application
AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...
- Publication number 20070298176
- Publication date Dec 27, 2007
- Richard Anthony DiPietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Stabilization of vinyl ether materials
- Publication number 20070066750
- Publication date Mar 22, 2007
- Frances Anne Houle
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Processes and materials for step and flash imprint lithography
- Publication number 20070051697
- Publication date Mar 8, 2007
- Richard Anthony DiPietro
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus for characterization of photoresist resolution, and metho...
- Publication number 20060126053
- Publication date Jun 15, 2006
- William Dinan Hinsberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fast model-based optical proximity correction
- Publication number 20050185159
- Publication date Aug 25, 2005
- International Business Machines Corporation
- Alan E. Rosenbluth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for characterization of photoresist resolution, and metho...
- Publication number 20050168717
- Publication date Aug 4, 2005
- William Dinan Hinsberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR FORMING FEATURES OF 50 NM OR LESS HALF-PITCH WITH CHEMI...
- Publication number 20040265747
- Publication date Dec 30, 2004
- International Business Machines Corporation
- David R. Medeiros
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low silicon-outgassing resist for bilayer lithography
- Publication number 20040048187
- Publication date Mar 11, 2004
- Mahmoud M. Khojasteh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Frances A. Houle

Person

Patents Grantslast 30 patents

Method and apparatus for sub-pellicle defect reduction on photomasks

Aromatic vinyl ether based reverse-tone step and flash imprint lith...

Stabilization of vinyl ether materials

Aromatic vinyl ether based reverse-tone step and flash imprint lith...

Method and apparatus for sub-pellicle defect reduction on photomasks

Vinyl ether resist formulations for imprint lithography and process...

Stabilizers for vinyl ether resist formulations for imprint lithogr...

Processes and materials for step and flash imprint lithography

Amorphous oxide release layers for imprint lithography, and method...

Amorphous nitride release layers for imprint lithography, and metho...

Phase change materials and associated memory devices

Release layer for imprinted photocationic curable resins

Phase change materials and associated memory devices

Stabilization of vinyl ether materials

Processes and materials for step and flash imprint lithography

Apparatus for characterization of photoresist resolution, and metho...

Process for forming features of 50 nm or less half-pitch with chemi...

Fast model-based optical proximity correction

Apparatus for characterization of photoresist resolution, and metho...

Low silicon-outgassing resist for bilayer lithography

Self-longitudinally biased magnetoresistive read transducer

Software architecture for stochastic simulation of non-homogeneous...

Method for stochastic and deterministic timebase control in stochas...

Stochastic simulation method for processes containing equilibrium s...

Method for producing thin film magnetic structure

Method for producing thin film magnetic structure

Spatially resolved stochastic simulation system

Rapid etching method for silicon by SF.sub.6 gas

Selective deposition of copper

Patents Applicationslast 30 patents

STABILIZATION OF VINYL ETHER MATERIALS

AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...

METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS

Stabilizers for Vinyl Ether Resist Formulations for Imprint Lithogr...

VINYL ETHER RESIST FORMULATIONS FOR IMPRINT LITHOGRAPHY AND PROCESS...

METHOD AND APPARATUS FOR SUB-PELLICLE DEFECT REDUCTION ON PHOTOMASKS

AMORPHOUS NITRIDE RELEASE LAYERS FOR IMPRINT LITHOGRAPHY, AND METHO...

AMORPHOUS OXIDE RELEASE LAYERS FOR IMPRINT LITHOGRAPHY, AND METHOD...

PHASE CHANGE MATERIALS AND ASSOCIATED MEMORY DEVICES

STABILIZATION OF VINYL ETHER MATERIALS

RELEASE LAYER FOR IMPRINTED PHOTOCATIONICALLY CURED FILMS

RELEASE LAYER FOR IMPRINTED PHOTOCATIONIC CURABLE RESINS

AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...

PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY

PHASE CHANGE MATERIALS AND ASSOCIATED MEMORY DEVICES

AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITH...

Stabilization of vinyl ether materials

Processes and materials for step and flash imprint lithography

Apparatus for characterization of photoresist resolution, and metho...

Fast model-based optical proximity correction

Apparatus for characterization of photoresist resolution, and metho...

PROCESS FOR FORMING FEATURES OF 50 NM OR LESS HALF-PITCH WITH CHEMI...

Low silicon-outgassing resist for bilayer lithography