Francesco DE REGE THESAURO

Person

Naperville, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
CMP compositions and methods for suppressing polysilicon removal rates
- Patent number 8,691,695
- Issue date Apr 8, 2014
- Cabot Microelectronics Corporation
- Kevin Moeggenborg
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compositions for polishing silicon-containing substrates
- Patent number 8,597,540
- Issue date Dec 3, 2013
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- B24 - GRINDING POLISHING
Information Patent Grant
Compositions for CMP of semiconductor materials
- Patent number 8,529,680
- Issue date Sep 10, 2013
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methods and compositions for polishing silicon-containing substrates
- Patent number 8,247,327
- Issue date Aug 21, 2012
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical-mechanical polishing composition and method for using the...
- Patent number 8,101,093
- Issue date Jan 24, 2012
- Cabot Microelectronics Corporation
- Francesco de Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compositions and methods for CMP of semiconductor materials
- Patent number 7,803,203
- Issue date Sep 28, 2010
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP system utilizing halogen adduct
- Patent number 7,776,230
- Issue date Aug 17, 2010
- Cabot Microelectronics Corporation
- Steven Grumbine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP composition with a polymer additive for polishing noble metals
- Patent number 7,563,383
- Issue date Jul 21, 2009
- Cabot Mircroelectronics Corporation
- Francesco de Rege Thesauro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions and methods for CMP of low-k-dielectric materials
- Patent number 7,456,107
- Issue date Nov 25, 2008
- Cabot Microelectronics Corporation
- Jason Keleher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions and methods for tantalum CMP
- Patent number 7,316,603
- Issue date Jan 8, 2008
- Cabot Microelectronics Corporation
- Phillip W. Carter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical-mechanical polishing of metals in an oxidized form
- Patent number 7,288,021
- Issue date Oct 30, 2007
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition for noble metals
- Patent number 7,161,247
- Issue date Jan 9, 2007
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CMP of noble metals
- Patent number 7,160,807
- Issue date Jan 9, 2007
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CMP method for noble metals
- Patent number 7,097,541
- Issue date Aug 29, 2006
- Cabot Microelectronics Corporation
- Francesco DeRege Thesauro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for preparing a vanadium/titanium catalyst and use in olefi...
- Patent number 6,677,266
- Issue date Jan 13, 2004
- Eastman Chemical Company
- Francesco De Rege Thesauro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
CMP COMPOSITIONS AND METHODS FOR SUPPRESSING POLYSILICON REMOVAL RATES
- Publication number 20140197356
- Publication date Jul 17, 2014
- Kevin MOEGGENBORG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES
- Publication number 20120280170
- Publication date Nov 8, 2012
- Cabot Microelectronics Corporation
- Francesco DE REGE THESAURO
- B24 - GRINDING POLISHING
Information Patent Application
CMP COMPOSITIONS AND METHODS FOR SUPPRESSING POLYSILICON REMOVAL RATES
- Publication number 20120094489
- Publication date Apr 19, 2012
- Cabot Microelectronics Corporation
- Kevin Moeggenborg
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DILUTABLE CMP COMPOSITION CONTAINING A SURFACTANT
- Publication number 20110247996
- Publication date Oct 13, 2011
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP SYSTEM UTILIZING HALOGEN ADDUCT
- Publication number 20100276392
- Publication date Nov 4, 2010
- Cabot Microelectronics Corporation
- Steven Grumbine
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Methods and compositions for polishing silicon-containing substrates
- Publication number 20100029181
- Publication date Feb 4, 2010
- Francesco De Rege Thesauro
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION AND METHOD FOR USING THE...
- Publication number 20090152240
- Publication date Jun 18, 2009
- Cabot Microelectronics Corporation
- Francesco de Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DILUTABLE CMP COMPOSITION CONTAINING A SURFACTANT
- Publication number 20080203059
- Publication date Aug 28, 2008
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Compositions and methods for CMP of low-k-dielectric materials
- Publication number 20080111101
- Publication date May 15, 2008
- Jason Keleher
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP SYSTEM UTILIZING HALOGEN ADDUCT
- Publication number 20080057715
- Publication date Mar 6, 2008
- Cabot Microelectronics Corporation
- Steven Grumbine
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITIONS AND METHODS FOR CMP OF SEMICONDUCTOR MATERIALS
- Publication number 20070181535
- Publication date Aug 9, 2007
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP composition with a polymer additive for polishing noble metals
- Publication number 20060076317
- Publication date Apr 13, 2006
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing composition for noble metals
- Publication number 20060024967
- Publication date Feb 2, 2006
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical-mechanical polishing composition and method for using the...
- Publication number 20050211950
- Publication date Sep 29, 2005
- Cabot Microelectronics Corporation
- Francesco de Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical-mechanical polishing of metals in an oxidized form
- Publication number 20050148290
- Publication date Jul 7, 2005
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP of noble metals
- Publication number 20040266196
- Publication date Dec 30, 2004
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMP method for noble metals
- Publication number 20030181142
- Publication date Sep 25, 2003
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Francesco DE REGE THESAURO

Person

Patents Grantslast 30 patents

CMP compositions and methods for suppressing polysilicon removal rates

Compositions for polishing silicon-containing substrates

Compositions for CMP of semiconductor materials

Methods and compositions for polishing silicon-containing substrates

Chemical-mechanical polishing composition and method for using the...

Compositions and methods for CMP of semiconductor materials

CMP system utilizing halogen adduct

CMP composition with a polymer additive for polishing noble metals

Compositions and methods for CMP of low-k-dielectric materials

Compositions and methods for tantalum CMP

Chemical-mechanical polishing of metals in an oxidized form

Polishing composition for noble metals

CMP of noble metals

CMP method for noble metals

Process for preparing a vanadium/titanium catalyst and use in olefi...

Patents Applicationslast 30 patents

CMP COMPOSITIONS AND METHODS FOR SUPPRESSING POLYSILICON REMOVAL RATES

COMPOSITIONS FOR POLISHING SILICON-CONTAINING SUBSTRATES

CMP COMPOSITIONS AND METHODS FOR SUPPRESSING POLYSILICON REMOVAL RATES

DILUTABLE CMP COMPOSITION CONTAINING A SURFACTANT

CMP SYSTEM UTILIZING HALOGEN ADDUCT

Methods and compositions for polishing silicon-containing substrates

CHEMICAL-MECHANICAL POLISHING COMPOSITION AND METHOD FOR USING THE...

DILUTABLE CMP COMPOSITION CONTAINING A SURFACTANT

Compositions and methods for CMP of low-k-dielectric materials

CMP SYSTEM UTILIZING HALOGEN ADDUCT

COMPOSITIONS AND METHODS FOR CMP OF SEMICONDUCTOR MATERIALS

CMP composition with a polymer additive for polishing noble metals

Polishing composition for noble metals

Chemical-mechanical polishing composition and method for using the...

Chemical-mechanical polishing of metals in an oxidized form

CMP of noble metals

CMP method for noble metals