Francisco Juarez

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Hybrid impedance matching for inductively coupled plasma system
- Patent number 9,918,376
- Issue date Mar 13, 2018
- Lam Research Corporation
- George Thomas
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Methods and apparatuses for atomic layer cleaning of contacts and vias
- Patent number 9,362,163
- Issue date Jun 7, 2016
- Lam Research Corporation
- Michal Danek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hybrid impedance matching for inductively coupled plasma system
- Patent number 9,082,589
- Issue date Jul 14, 2015
- Novellus Systems, Inc.
- George Thomas
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for modulation of precursor exposure during a...
- Patent number 7,700,155
- Issue date Apr 20, 2010
- Novellus Systems, Inc.
- Francisco Juarez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conductive planarization assembly for electrochemical mechanical pl...
- Patent number 7,695,597
- Issue date Apr 13, 2010
- Novellus Systems, Inc.
- John Drewery
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and methods for processing semiconductor substrates using...
- Patent number 7,503,334
- Issue date Mar 17, 2009
- Novellus Systems, Inc.
- Krishnan Shrinivasan
- B08 - CLEANING
Information Patent Grant
Conductive contacts and methods for fabricating conductive contacts...
- Patent number 7,391,086
- Issue date Jun 24, 2008
- Novellus Systems, Inc.
- John Drewery
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for introduction of solid precursors and react...
- Patent number 6,951,765
- Issue date Oct 4, 2005
- Novellus Systems, Inc.
- Sanjay Gopinath
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Properties of a silica thin film produced by a rapid vapor depositi...
- Patent number 6,867,152
- Issue date Mar 15, 2005
- Novellus Systems, Inc.
- Dennis M. Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for processing semiconductor substrates using...
- Patent number 6,848,458
- Issue date Feb 1, 2005
- Novellus Systems, Inc.
- Krishnan Shrinivasan
- B08 - CLEANING
Information Patent Grant
Apparatus for maintaining wafer back side and edge exclusion during...
- Patent number 6,550,484
- Issue date Apr 22, 2003
- Novellus Systems, Inc.
- Sanjay Gopinath
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DEPOSITION OF METAL-CONTAINING FILMS AND CHAMBER CLEAN
- Publication number 20250226227
- Publication date Jul 10, 2025
- LAM RESEARCH CORPORATION
- Dustin Zachary Austin
- B08 - CLEANING
Information Patent Application
TRANSFORMER COUPLED PLASMA SOURCE DESIGN FOR THIN DIELECTRIC FILM D...
- Publication number 20250132127
- Publication date Apr 24, 2025
- LAM RESEARCH CORPORATION
- Tongtong Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES FOR CLEANING A MULTI-STATION SEMICONDUCTOR PROCESSING C...
- Publication number 20250006514
- Publication date Jan 2, 2025
- LAM RESEARCH CORPORATION
- Harish Kumar Premakumar
- B08 - CLEANING
Information Patent Application
INDEPENDENTLY ADJUSTABLE FLOWPATH CONDUCTANCE IN MULTI-STATION SEMI...
- Publication number 20220228263
- Publication date Jul 21, 2022
- LAM RESEARCH CORPORATION
- Michael Philip Roberts
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HYBRID IMPEDANCE MATCHING FOR INDUCTIVELY COUPLED PLASMA SYSTEM
- Publication number 20150313000
- Publication date Oct 29, 2015
- Novellus Systems, Inc.
- George Thomas
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS AND APPARATUSES FOR ATOMIC LAYER CLEANING OF CONTACTS AND VIAS
- Publication number 20150037972
- Publication date Feb 5, 2015
- LAM RESEARCH CORPORATION
- Michal Danek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HYBRID IMPEDANCE MATCHING FOR INDUCTIVELY COUPLED PLASMA SYSTEM
- Publication number 20140097751
- Publication date Apr 10, 2014
- George Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MODULATION OF PRECURSOR EXPOSURE DURING A...
- Publication number 20100173074
- Publication date Jul 8, 2010
- NOVELLUS SYSTEMS INC.
- Francisco Juarez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Francisco Juarez

Person

Patents Grantslast 30 patents

Hybrid impedance matching for inductively coupled plasma system

Methods and apparatuses for atomic layer cleaning of contacts and vias

Hybrid impedance matching for inductively coupled plasma system

Method and apparatus for modulation of precursor exposure during a...

Conductive planarization assembly for electrochemical mechanical pl...

Apparatus and methods for processing semiconductor substrates using...

Conductive contacts and methods for fabricating conductive contacts...

Method and apparatus for introduction of solid precursors and react...

Properties of a silica thin film produced by a rapid vapor depositi...

Apparatus and methods for processing semiconductor substrates using...

Apparatus for maintaining wafer back side and edge exclusion during...

Patents Applicationslast 30 patents

DEPOSITION OF METAL-CONTAINING FILMS AND CHAMBER CLEAN

TRANSFORMER COUPLED PLASMA SOURCE DESIGN FOR THIN DIELECTRIC FILM D...

APPARATUSES FOR CLEANING A MULTI-STATION SEMICONDUCTOR PROCESSING C...

INDEPENDENTLY ADJUSTABLE FLOWPATH CONDUCTANCE IN MULTI-STATION SEMI...

HYBRID IMPEDANCE MATCHING FOR INDUCTIVELY COUPLED PLASMA SYSTEM

METHODS AND APPARATUSES FOR ATOMIC LAYER CLEANING OF CONTACTS AND VIAS

HYBRID IMPEDANCE MATCHING FOR INDUCTIVELY COUPLED PLASMA SYSTEM

METHOD AND APPARATUS FOR MODULATION OF PRECURSOR EXPOSURE DURING A...