Franciscus Godefridus Casper BIJNEN

Person

Valkenswaard, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,966,166
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alignment method and associated alignment and lithographic apparatuses
- Patent number 11,927,892
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement apparatus
- Patent number 11,874,103
- Issue date Jan 16, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G01 - MEASURING TESTING
Information Patent Grant
Phase modulators in alignment to decrease mark size
- Patent number 11,803,130
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compact alignment sensor arrangements
- Patent number 11,531,280
- Issue date Dec 20, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed Elazhary
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring an alignment mark or an alignment mark assembly...
- Patent number 11,442,372
- Issue date Sep 13, 2022
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining deformation
- Patent number 11,181,836
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement apparatus
- Patent number 11,105,619
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G01 - MEASURING TESTING
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,079,684
- Issue date Aug 3, 2021
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for controlling an industrial process using pr...
- Patent number 11,054,813
- Issue date Jul 6, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 11,029,610
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,962,887
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a lithographic apparatus and device manufactu...
- Patent number 10,901,326
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a lithographic apparatus and device manufactu...
- Patent number 10,620,549
- Issue date Apr 14, 2020
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 10,527,958
- Issue date Jan 7, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method
- Patent number 10,514,620
- Issue date Dec 24, 2019
- ASML Holding N.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,474,045
- Issue date Nov 12, 2019
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for determining the position of a target stru...
- Patent number 10,444,647
- Issue date Oct 15, 2019
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a lithographic apparatus and device manufactu...
- Patent number 10,331,040
- Issue date Jun 25, 2019
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring method, apparatus and substrate
- Patent number 10,151,987
- Issue date Dec 11, 2018
- ASML Netherlands B.V.
- David Deckers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,139,740
- Issue date Nov 27, 2018
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring method, measurement apparatus, lithographic apparatus and...
- Patent number 9,891,540
- Issue date Feb 13, 2018
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus, substrates for use therein and dev...
- Patent number 9,835,954
- Issue date Dec 5, 2017
- ASML Netherlands B.V.
- Erik Willem Bogaart
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device, method of producing a marker on a substrate and...
- Patent number 9,726,991
- Issue date Aug 8, 2017
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to determine the usefulness of alignment marks to correct ov...
- Patent number 9,454,084
- Issue date Sep 27, 2016
- ASML Netherlands B.V.
- Irina Lyulina
- G01 - MEASURING TESTING
Information Patent Grant
Determining position and curvature information directly from a surf...
- Patent number 9,377,700
- Issue date Jun 28, 2016
- ASML Holding N.V.
- Mark Josef Schuster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment measurement system, lithographic apparatus, and a method...
- Patent number 9,280,057
- Issue date Mar 8, 2016
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G01 - MEASURING TESTING
Information Patent Grant
Alignment measurement system, lithographic apparatus, and a method...
- Patent number 9,046,385
- Issue date Jun 2, 2015
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G01 - MEASURING TESTING
Information Patent Grant
Alignment mark deformation estimating method, substrate position pr...
- Patent number 8,982,347
- Issue date Mar 17, 2015
- ASML Netherlands B.V.
- Xiuhong Wei
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and device manufacturing method to determine...
- Patent number 8,908,152
- Issue date Dec 9, 2014
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MEASUREMENT APPARATUS
- Publication number 20240151520
- Publication date May 9, 2024
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G01 - MEASURING TESTING
Information Patent Application
A TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS
- Publication number 20230236515
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20230168595
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20230004097
- Publication date Jan 5, 2023
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE
- Publication number 20220397833
- Publication date Dec 15, 2022
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MEASURING AN ALIGNMENT MARK OR AN ALIGNMENT MARK ASSEMBLY...
- Publication number 20220187722
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF SIMULTANEOUSLY ACQUIRING PARALLEL ALIGN...
- Publication number 20220100109
- Publication date Mar 31, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS
- Publication number 20210381826
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID
- Publication number 20210341846
- Publication date Nov 4, 2021
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPACT ALIGNMENT SENSOR ARRANGEMENTS
- Publication number 20210318627
- Publication date Oct 14, 2021
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING DEFORMATION
- Publication number 20210149316
- Publication date May 20, 2021
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200272061
- Publication date Aug 27, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...
- Publication number 20200201194
- Publication date Jun 25, 2020
- ASML NETHERLANDS B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS
- Publication number 20200132447
- Publication date Apr 30, 2020
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20200081356
- Publication date Mar 12, 2020
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...
- Publication number 20190265598
- Publication date Aug 29, 2019
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID
- Publication number 20190235391
- Publication date Aug 1, 2019
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ALIGNMENT METHOD
- Publication number 20190227446
- Publication date Jul 25, 2019
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR DETERMINING THE POSITION OF A TARGET STRU...
- Publication number 20190219936
- Publication date Jul 18, 2019
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20190094721
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE IN A LITHOGRAPHIC A...
- Publication number 20180356742
- Publication date Dec 13, 2018
- ASML NETHERLANDS B.V.
- Cayetano SANCHEZ-FABRES COBALEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180348654
- Publication date Dec 6, 2018
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180196363
- Publication date Jul 12, 2018
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING METHOD, MEASUREMENT APPARATUS, LITHOGRAPHIC APPARATUS AND...
- Publication number 20170235230
- Publication date Aug 17, 2017
- ASML Holding N.V.
- Earl William EBERT
- G01 - MEASURING TESTING
Information Patent Application
Inspection Method and Apparatus, Substrates for use Therein and Dev...
- Publication number 20160097983
- Publication date Apr 7, 2016
- ASML NETHERLANDS B.V.
- Erik Willem BOGAART
- G01 - MEASURING TESTING
Information Patent Application
PATTERNING DEVICE, METHOD OF PRODUCING A MARKER ON A SUBSTRATE AND...
- Publication number 20150370174
- Publication date Dec 24, 2015
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Measurement System, Lithographic Apparatus, and a Method...
- Publication number 20150261100
- Publication date Sep 17, 2015
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G01 - MEASURING TESTING
Information Patent Application
METHOD TO DETERMINE THE USEFULNESS OF ALIGNMENT MARKS TO CORRECT OV...
- Publication number 20150146188
- Publication date May 28, 2015
- ASML NETHERLANDS B.V.
- Irina Lyulina
- G01 - MEASURING TESTING
Information Patent Application
DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURF...
- Publication number 20140307246
- Publication date Oct 16, 2014
- ASML Holding N.V.
- Mark Josef Schuster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Mark Deformation Estimating Method, Substrate Position Pr...
- Publication number 20130141723
- Publication date Jun 6, 2013
- ASML Netherlands N.V.
- Xiuhong WEI
- G01 - MEASURING TESTING

Franciscus Godefridus Casper BIJNEN

Person

Patents Grantslast 30 patents

Measurement apparatus and a method for determining a substrate grid

Alignment method and associated alignment and lithographic apparatuses

Measurement apparatus

Phase modulators in alignment to decrease mark size

Compact alignment sensor arrangements

Method of measuring an alignment mark or an alignment mark assembly...

Method for determining deformation

Measurement apparatus

Measurement apparatus and a method for determining a substrate grid

Method and apparatus for controlling an industrial process using pr...

Lithographic method

Lithographic method

Method of controlling a lithographic apparatus and device manufactu...

Method of controlling a lithographic apparatus and device manufactu...

Lithographic method

Alignment method

Lithographic apparatus and device manufacturing method

Methods and apparatus for determining the position of a target stru...

Method of controlling a lithographic apparatus and device manufactu...

Measuring method, apparatus and substrate

Lithographic apparatus and device manufacturing method

Measuring method, measurement apparatus, lithographic apparatus and...

Inspection method and apparatus, substrates for use therein and dev...

Patterning device, method of producing a marker on a substrate and...

Method to determine the usefulness of alignment marks to correct ov...

Determining position and curvature information directly from a surf...

Alignment measurement system, lithographic apparatus, and a method...

Alignment measurement system, lithographic apparatus, and a method...

Alignment mark deformation estimating method, substrate position pr...

Lithographic apparatus and device manufacturing method to determine...

Patents Applicationslast 30 patents

MEASUREMENT APPARATUS

A TARGET FOR MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE

METHOD OF MEASURING AN ALIGNMENT MARK OR AN ALIGNMENT MARK ASSEMBLY...

APPARATUS FOR AND METHOD OF SIMULTANEOUSLY ACQUIRING PARALLEL ALIGN...

MEASUREMENT APPARATUS

MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID

COMPACT ALIGNMENT SENSOR ARRANGEMENTS

METHOD FOR DETERMINING DEFORMATION

LITHOGRAPHIC METHOD

METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...

MEASUREMENT APPARATUS

LITHOGRAPHIC METHOD

METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTU...

MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID

ALIGNMENT METHOD

METHODS AND APPARATUS FOR DETERMINING THE POSITION OF A TARGET STRU...

LITHOGRAPHIC METHOD

METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE IN A LITHOGRAPHIC A...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

MEASURING METHOD, MEASUREMENT APPARATUS, LITHOGRAPHIC APPARATUS AND...

Inspection Method and Apparatus, Substrates for use Therein and Dev...

PATTERNING DEVICE, METHOD OF PRODUCING A MARKER ON A SUBSTRATE AND...

Alignment Measurement System, Lithographic Apparatus, and a Method...

METHOD TO DETERMINE THE USEFULNESS OF ALIGNMENT MARKS TO CORRECT OV...

DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURF...

Alignment Mark Deformation Estimating Method, Substrate Position Pr...