Frank Chilese

Person

San Ramon, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dual vacuum seal
- Patent number 12,044,313
- Issue date Jul 23, 2024
- KLA Corporation
- Francis Chilese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differential height measurement using interstitial mirror plate
- Patent number 11,566,887
- Issue date Jan 31, 2023
- KLA Corporation
- Frank Chilese
- G01 - MEASURING TESTING
Information Patent Grant
Laser produced plasma light source having a target material coated...
- Patent number 11,419,202
- Issue date Aug 16, 2022
- KLA Corporation
- Alexey Kuritsyn
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for cleaning optical surfaces of an extreme ultra...
- Patent number 10,953,441
- Issue date Mar 23, 2021
- KLA Corporation
- Gildardo Delgado
- B08 - CLEANING
Information Patent Grant
Laser produced plasma light source having a target material coated...
- Patent number 10,893,599
- Issue date Jan 12, 2021
- KLA Corporation
- Alexey Kuritsyn
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-column spacing for photomask and reticle inspection and wafer...
- Patent number 10,777,377
- Issue date Sep 15, 2020
- KLA-Tencor Corporation
- Robert Haynes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Array-based characterization tool
- Patent number 10,438,769
- Issue date Oct 8, 2019
- KLA-Tencor Corporation
- Alex Lipkind
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser produced plasma light source having a target material coated...
- Patent number 10,021,773
- Issue date Jul 10, 2018
- KLA-Tencor Corporation
- Alexey Kuritsyn
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and methods for reticle handling in an EUV reticle inspec...
- Patent number 9,851,643
- Issue date Dec 26, 2017
- KLA-Tencor Corporation
- Francis Charles Chilese
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
System and method for cleaning EUV optical elements
- Patent number 9,810,991
- Issue date Nov 7, 2017
- KLA-Tencor Corporation
- Frank Chilese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle and chemical control using tunnel flow
- Patent number 9,759,912
- Issue date Sep 12, 2017
- KLA-Tencor Corporation
- Frank Chilese
- G02 - OPTICS
Information Patent Grant
System and method for generation of extreme ultraviolet light
- Patent number 9,544,984
- Issue date Jan 10, 2017
- KLA-Tencor Corporation
- Alexander Bykanov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Segmented mirror apparatus for imaging and method of using the same
- Patent number 9,448,343
- Issue date Sep 20, 2016
- KLA-Tencor Corporation
- Damon Kvamme
- G01 - MEASURING TESTING
Information Patent Grant
Gas bearing assembly for an EUV light source
- Patent number 9,422,978
- Issue date Aug 23, 2016
- KLA-Tencor Corporation
- Francis C. Chilese
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Methods and apparatus for use with extreme ultraviolet light having...
- Patent number 9,389,180
- Issue date Jul 12, 2016
- KLA-Tencor Corporation
- Francis C. Chilese
- G01 - MEASURING TESTING
Information Patent Grant
Spectral purity filter and light monitor for an EUV reticle inspect...
- Patent number 9,348,214
- Issue date May 24, 2016
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Grant
Particle control near reticle and optics using showerhead
- Patent number 9,244,368
- Issue date Jan 26, 2016
- KLA-Tencor Corporation
- Gildardo R. Delgado
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Temperature control in EUV reticle inspection tool
- Patent number 9,164,388
- Issue date Oct 20, 2015
- KLA-Tencor Corporation
- Frank Chilese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Continuous generation of extreme ultraviolet light
- Patent number 8,963,110
- Issue date Feb 24, 2015
- KLA-Tencor Corporation
- Layton Hale
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multiplexing EUV sources in reticle inspection
- Patent number 8,917,432
- Issue date Dec 23, 2014
- KLA-Tencor Corporation
- Daniel Wack
- G02 - OPTICS
Information Patent Grant
Recirculation high purity system for protecting optical modules or...
- Patent number 8,414,688
- Issue date Apr 9, 2013
- KLA-Tencor Corporation
- Gildardo Delgado
- B08 - CLEANING
Information Patent Grant
Apparatus and method for maintaining uniform and stable temperature...
- Patent number 7,050,170
- Issue date May 23, 2006
- Picarro, Inc.
- Frank Chilese
- G01 - MEASURING TESTING
Information Patent Grant
System and method to correct for distortion caused by bulk heating...
- Patent number 6,424,879
- Issue date Jul 23, 2002
- Applied Materials, Inc.
- Francis C. Chilese
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
HIGH-PRECISION ALIGNABLE OPTICAL MOUNTING
- Publication number 20240361556
- Publication date Oct 31, 2024
- KLA Corporation
- Shreyas Bhaban
- G02 - OPTICS
Information Patent Application
Dual Vacuum Seal
- Publication number 20220260156
- Publication date Aug 18, 2022
- KLA Corporation
- Francis Chilese
- B08 - CLEANING
Information Patent Application
Laser Produced Plasma Light Source Having a Target Material Coated...
- Publication number 20210136903
- Publication date May 6, 2021
- KLA Corporation
- Alexey Kuritsyn
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Laser Produced Plasma Light Source Having a Target Material Coated...
- Publication number 20190075641
- Publication date Mar 7, 2019
- KLA-Tencor Corporation
- Alexey Kuritsyn
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Multi-Column Spacing for Photomask and Reticle Inspection and Wafer...
- Publication number 20180233318
- Publication date Aug 16, 2018
- KLA-Tencor Corporation
- Robert Haynes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laser Produced Plasma Light Source Having a Target Material Coated...
- Publication number 20170142817
- Publication date May 18, 2017
- KLA-Tencor Corporation
- Alexey Kuritsyn
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
System and Method for Cleaning EUV Optical Elements
- Publication number 20150253675
- Publication date Sep 10, 2015
- KLA-Tencor Corporation
- Frank Chilese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Generation of Extreme Ultraviolet Light
- Publication number 20150076359
- Publication date Mar 19, 2015
- KLA-Tencor Corporation
- Alexander Bykanov
- G01 - MEASURING TESTING
Information Patent Application
GAS BEARING ASSEMBLY FOR AN EUV LIGHT SOURCE
- Publication number 20140376842
- Publication date Dec 25, 2014
- Francis C. Chilese
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
Continuous Generation of Extreme Ultraviolet Light
- Publication number 20140374611
- Publication date Dec 25, 2014
- Layton Hale
- G01 - MEASURING TESTING
Information Patent Application
System and Method for Cleaning Optical Surfaces of an Extreme Ultra...
- Publication number 20140261568
- Publication date Sep 18, 2014
- KLA-Tencor Corporation
- Gildardo Delgado
- B08 - CLEANING
Information Patent Application
SEGMENTED MIRROR APPARATUS FOR IMAGING AND METHOD OF USING THE SAME
- Publication number 20140264051
- Publication date Sep 18, 2014
- KLA-Tencor Corporation
- Damon Kvamme
- G02 - OPTICS
Information Patent Application
METHODS AND APPARATUS FOR USE WITH EXTREME ULTRAVIOLET LIGHT HAVING...
- Publication number 20140231659
- Publication date Aug 21, 2014
- Frank Chilese
- G01 - MEASURING TESTING
Information Patent Application
SPECTRAL PURITY FILTER AND LIGHT MONITOR FOR AN EUV ACTINIC RETICLE...
- Publication number 20140217298
- Publication date Aug 7, 2014
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF USING POLISHED SILICON WAFER STRIPS FOR EUV HOMOGENIZER
- Publication number 20140151580
- Publication date Jun 5, 2014
- KLA-Tencor Corporation
- Daimian Wang
- G02 - OPTICS
Information Patent Application
PARTICLE AND CHEMICAL CONTROL USING TUNNEL FLOW
- Publication number 20140085724
- Publication date Mar 27, 2014
- Frank Chilese
- G02 - OPTICS
Information Patent Application
PARTICLE CONTROL NEAR RETICLE AND OPTICS USING SHOWERHEAD
- Publication number 20140085618
- Publication date Mar 27, 2014
- Gildardo R. Delgado
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION
- Publication number 20140036333
- Publication date Feb 6, 2014
- KLA-Tencor Corporation
- Daniel Wack
- G02 - OPTICS
Information Patent Application
SMART MEMORY ALLOYS FOR AN EXTREME ULTRA-VIOLET (EUV) RETICLE INSPE...
- Publication number 20130270461
- Publication date Oct 17, 2013
- KLA-Tencor Corporation
- Gildardo Delgado
- G02 - OPTICS
Information Patent Application
INDEXING OPTICS FOR AN ACTINIC EXTREME ULTRA-VIOLET (EUV) RETICLE I...
- Publication number 20130271827
- Publication date Oct 17, 2013
- KLA-Tencor Corporation
- Gildardo Delgado
- G02 - OPTICS
Information Patent Application
TEMPERATURE CONTROL IN EUV RETICLE INSPECTION TOOL
- Publication number 20130265557
- Publication date Oct 10, 2013
- KLA-Tencor Corporation
- Frank Chilese
- G01 - MEASURING TESTING
Information Patent Application
Apparatus And Methods For Reticle Handling In An EUV Reticle Inspec...
- Publication number 20130255407
- Publication date Oct 3, 2013
- Francis Charles Chilese
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
System and Method for Particle Control Near A Reticle
- Publication number 20130235357
- Publication date Sep 12, 2013
- KLA-Tencor Corporation
- Gildardo Delgado
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and method for maintaining uniform and stable temperature...
- Publication number 20050018193
- Publication date Jan 27, 2005
- Frank Chilese
- G01 - MEASURING TESTING
Information Patent Application
Method and system to achieve thermal transfer between a workpiece a...
- Publication number 20020155364
- Publication date Oct 24, 2002
- David Trost
- H01 - BASIC ELECTRIC ELEMENTS

Frank Chilese

Person

Patents Grantslast 30 patents

Dual vacuum seal

Differential height measurement using interstitial mirror plate

Laser produced plasma light source having a target material coated...

System and method for cleaning optical surfaces of an extreme ultra...

Laser produced plasma light source having a target material coated...

Multi-column spacing for photomask and reticle inspection and wafer...

Array-based characterization tool

Laser produced plasma light source having a target material coated...

Apparatus and methods for reticle handling in an EUV reticle inspec...

System and method for cleaning EUV optical elements

Particle and chemical control using tunnel flow

System and method for generation of extreme ultraviolet light

Segmented mirror apparatus for imaging and method of using the same

Gas bearing assembly for an EUV light source

Methods and apparatus for use with extreme ultraviolet light having...

Spectral purity filter and light monitor for an EUV reticle inspect...

Particle control near reticle and optics using showerhead

Temperature control in EUV reticle inspection tool

Continuous generation of extreme ultraviolet light

Multiplexing EUV sources in reticle inspection

Recirculation high purity system for protecting optical modules or...

Apparatus and method for maintaining uniform and stable temperature...

System and method to correct for distortion caused by bulk heating...

Patents Applicationslast 30 patents

HIGH-PRECISION ALIGNABLE OPTICAL MOUNTING

Dual Vacuum Seal

Laser Produced Plasma Light Source Having a Target Material Coated...

Laser Produced Plasma Light Source Having a Target Material Coated...

Multi-Column Spacing for Photomask and Reticle Inspection and Wafer...

Laser Produced Plasma Light Source Having a Target Material Coated...

System and Method for Cleaning EUV Optical Elements

System and Method for Generation of Extreme Ultraviolet Light

GAS BEARING ASSEMBLY FOR AN EUV LIGHT SOURCE

Continuous Generation of Extreme Ultraviolet Light

System and Method for Cleaning Optical Surfaces of an Extreme Ultra...

SEGMENTED MIRROR APPARATUS FOR IMAGING AND METHOD OF USING THE SAME

METHODS AND APPARATUS FOR USE WITH EXTREME ULTRAVIOLET LIGHT HAVING...

SPECTRAL PURITY FILTER AND LIGHT MONITOR FOR AN EUV ACTINIC RETICLE...

METHODS OF USING POLISHED SILICON WAFER STRIPS FOR EUV HOMOGENIZER

PARTICLE AND CHEMICAL CONTROL USING TUNNEL FLOW

PARTICLE CONTROL NEAR RETICLE AND OPTICS USING SHOWERHEAD

MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION

SMART MEMORY ALLOYS FOR AN EXTREME ULTRA-VIOLET (EUV) RETICLE INSPE...

INDEXING OPTICS FOR AN ACTINIC EXTREME ULTRA-VIOLET (EUV) RETICLE I...

TEMPERATURE CONTROL IN EUV RETICLE INSPECTION TOOL

Apparatus And Methods For Reticle Handling In An EUV Reticle Inspec...

System and Method for Particle Control Near A Reticle

Apparatus and method for maintaining uniform and stable temperature...

Method and system to achieve thermal transfer between a workpiece a...