Frank Eisert

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Aalen, DE

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Patents Grantslast 30 patents

Information Patent Grant
Optical arrangement and microlithographic projection exposure appar...
- Patent number 9,436,101
- Issue date Sep 6, 2016
- Carl Zeiss SMT GmbH
- Armin Schoeppach
- G02 - OPTICS
Information Patent Grant
Projection objective
- Patent number 7,557,902
- Issue date Jul 7, 2009
- Carl Zeiss SMT AG
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror for use in a projection exposure apparatus
- Patent number 7,481,543
- Issue date Jan 27, 2009
- Carl Zeiss SMT AG
- Udo Dinger
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing an optical element
- Patent number 7,118,449
- Issue date Oct 10, 2006
- Carl Zeiss SMT AG
- Udo Dinger
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate material for X-ray optical components
- Patent number 7,031,428
- Issue date Apr 18, 2006
- Carl Zeiss SMT AG
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
DIFFRACTIVE OPTICAL ELEMENT FOR A TEST INTERFEROMETER
- Publication number 20220170735
- Publication date Jun 2, 2022
- Carl Zeiss SMT GMBH
- Alexander Winkler
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL ARRANGEMENT AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPAR...
- Publication number 20120182533
- Publication date Jul 19, 2012
- Carl Zeiss SMT GMBH
- Armin Schoeppach
- G02 - OPTICS
Information Patent Application
Euv projection lens with mirrors made from material with differing...
- Publication number 20070035814
- Publication date Feb 15, 2007
- Udo Dinger
- G02 - OPTICS
Information Patent Application
Substrate material for X-ray optical components
- Publication number 20040202278
- Publication date Oct 14, 2004
- Carl-Zeiss Stiftung Trading as Schott-Glas and Carl Zeiss SMT AG
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING