Frank EVERTS

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 11,686,951
- Issue date Jun 27, 2023
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 11,054,665
- Issue date Jul 6, 2021
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Online calibration for repetition rate dependent performance variables
- Patent number 11,050,213
- Issue date Jun 29, 2021
- Cymer, LLC
- Joshua Jon Thornes
- G01 - MEASURING TESTING
Information Patent Grant
Online calibration for repetition rate dependent performance variables
- Patent number 10,727,642
- Issue date Jul 28, 2020
- Cymer, LLC
- Joshua Jon Thornes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,627,724
- Issue date Apr 21, 2020
- ASML Netherlands B.V.
- Frank Everts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 10,451,890
- Issue date Oct 22, 2019
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- G01 - MEASURING TESTING
Information Patent Grant
Online calibration for repetition rate dependent performance variables
- Patent number 9,762,023
- Issue date Sep 12, 2017
- Cymer, LLC
- Joshua Jon Thornes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a radiation source and lithographic apparatus...
- Patent number 9,645,510
- Issue date May 9, 2017
- ASML Netherlands B.V.
- Wilhelmus Patrick Elisabeth Maria Op 'T Root
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE
- Publication number 20210239998
- Publication date Aug 5, 2021
- CYMER, LLC
- Wilhelmus Patrick Elisabeth Maria op `t Root
- G01 - MEASURING TESTING
Information Patent Application
Control System and Method
- Publication number 20200401050
- Publication date Dec 24, 2020
- ASML NETHERLANDS B.V.
- Herman Philip GODFRIED
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES
- Publication number 20200321746
- Publication date Oct 8, 2020
- CYMER, LLC
- Joshua Jon THORNES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE
- Publication number 20190324286
- Publication date Oct 24, 2019
- CYMER, LLC
- Wilhelmus Patrick Elisabeth Maria op `t Root
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20180253014
- Publication date Sep 6, 2018
- ASML NETHERLANDS B.V.
- Frank EVERTS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE
- Publication number 20180203248
- Publication date Jul 19, 2018
- CYMER, LLC
- Wilhelmus Patrick Elisabeth Maria op `t Root
- G02 - OPTICS
Information Patent Application
ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES
- Publication number 20180006425
- Publication date Jan 4, 2018
- CYMER, LLC
- Joshua Jon Thornes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES
- Publication number 20170179677
- Publication date Jun 22, 2017
- CYMER, LLC
- Joshua Jon THORNES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING A RADIATION SOURCE AND LITHOGRAPHIC APPARATUS...
- Publication number 20160070179
- Publication date Mar 10, 2016
- ASML NETHERLANDS B.V.
- Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Frank EVERTS

Person

Patents Grantslast 30 patents

Reducing speckle in an excimer light source

Reducing speckle in an excimer light source

Online calibration for repetition rate dependent performance variables

Online calibration for repetition rate dependent performance variables

Lithographic apparatus and method

Reducing speckle in an excimer light source

Online calibration for repetition rate dependent performance variables

Method of controlling a radiation source and lithographic apparatus...

Patents Applicationslast 30 patents

REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE

Control System and Method

ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES

REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE

LITHOGRAPHIC APPARATUS AND METHOD

REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE

ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES

ONLINE CALIBRATION FOR REPETITION RATE DEPENDENT PERFORMANCE VARIABLES

METHOD OF CONTROLLING A RADIATION SOURCE AND LITHOGRAPHIC APPARATUS...