FRANK LEONARD SCHADT, III

Person

WILMINGTON, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Screen-printable encapsulants based on soluble polybenzoxazoles
- Patent number 8,270,145
- Issue date Sep 18, 2012
- CDA Processing Limited Liability Company
- Thomas Eugene Dueber
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers
- Patent number 8,048,604
- Issue date Nov 1, 2011
- E. I. Du Pont de Nemours and Company
- Christopher P. Junk
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Hydrofluoroalkanesulfonic acids from fluorovinyl ethers
- Patent number 7,834,209
- Issue date Nov 16, 2010
- E. I. Du Pont de Nemours and Company
- Christopher P. Junk
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist compositions and processes for preparing the same
- Patent number 7,834,113
- Issue date Nov 16, 2010
- E. I. Du Pont de Nemours and Company
- James R. Sounik
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low-polydispersity photoimageable acrylic polymers, photoresists an...
- Patent number 7,696,292
- Issue date Apr 13, 2010
- Commonwealth Scientific and Industrial Research Organisation
- William Brown Farnham
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresists comprising polymers derived from fluoroalcohol-substit...
- Patent number 7,507,522
- Issue date Mar 24, 2009
- E. I. DuPont de Nemours and Company
- Michael Karl Crawford
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low-polydispersity photoimageable polymers and photoresists and pro...
- Patent number 7,408,013
- Issue date Aug 5, 2008
- Commonwealth Scientific and Industrial Research Organization
- Andrew Edward Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorinated monomers, fluorinated polymers having polycyclic groups...
- Patent number 7,326,796
- Issue date Feb 5, 2008
- E. I. Du Pont de Nemours and Company
- Andrew E. Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorinated polymers useful as photoresists, and processes for micr...
- Patent number 7,312,287
- Issue date Dec 25, 2007
- E. I. Du Pont de Nemours and Company
- Andrew Edward Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorinated polymers having polycyclic groups with fused 4-membered...
- Patent number 7,264,914
- Issue date Sep 4, 2007
- E. I. Du Pont de Nemours and Company
- Andrew E. Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresists and processes for microlithography
- Patent number 7,261,993
- Issue date Aug 28, 2007
- E. I. Du Pont de Nemours and Company
- Frank Leonard Schadt, III
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorinated polymers, photoresists and processes for microlithography
- Patent number 7,217,495
- Issue date May 15, 2007
- E I du Pont de Nemours and Company
- Andrew Edward Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Multilayer elements containing photoresist compositions and their u...
- Patent number 7,205,086
- Issue date Apr 17, 2007
- E. I. Du Pont de Nemours and Company
- Larry L. Berger
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Protecting groups in polymers, photoresists and processes for micro...
- Patent number 7,166,416
- Issue date Jan 23, 2007
- E. I. Du Pont de Nemours and Company
- Andrew E. Feiring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dissolution inhibitors in photoresist compositions for microlithogr...
- Patent number 7,108,953
- Issue date Sep 19, 2006
- E. I. Du Pont de Nemours and Company
- Larry L. Berger
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers blends and their use in photoresist compositions for micro...
- Patent number 7,045,268
- Issue date May 16, 2006
- E. I. Du Pont de Nemours and Company
- Larry L. Berger
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresists with hydroxylated, photoacid-cleavable groups
- Patent number 7,022,457
- Issue date Apr 4, 2006
- E. I. Du Pont de Nemours and Company
- William Brown Farnham
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorinated copolymers for microlithography
- Patent number 7,019,092
- Issue date Mar 28, 2006
- E. I. Du Pont de Nemours and Company
- Andrew Edward Feiring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions for microlithography
- Patent number 6,974,657
- Issue date Dec 13, 2005
- E. I. Du Pont de Nemours and Company
- Larry L. Berger
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers for photoresist compositions for microlithography
- Patent number 6,951,705
- Issue date Oct 4, 2005
- E. I. Du Pont de Nemours and Company
- Michael Fryd
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Protecting groups in polymers, photoresists and processes for micro...
- Patent number 6,899,995
- Issue date May 31, 2005
- E. I. Du Pont de Nemours and Company
- Andrew E. Feiring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresists and processes for microlithography
- Patent number 6,884,562
- Issue date Apr 26, 2005
- E. I. Du Pont de Nemours and Company
- Frank Leonard Schadt, III
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorinated polymers having ester groups and photoresists for micro...
- Patent number 6,884,564
- Issue date Apr 26, 2005
- E. I. Du Pont de Nemours and Company
- Andrew E. Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation and use of EXO-2-fluoroalkyl(bicyclo[2.2.1] hept-5-enes)
- Patent number 6,875,555
- Issue date Apr 5, 2005
- E. I. Du Pont de Nemours and Company
- Andrew Edward Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymers for photoresists and processes therefor
- Patent number 6,872,503
- Issue date Mar 29, 2005
- E. I. Du Pont de Nemours and Company
- Robert Clayton Wheland
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresists, polymers and processes for microlithography
- Patent number 6,849,377
- Issue date Feb 1, 2005
- E. I. Du Pont de Nemours and Company
- Andrew E. Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Hydrofluoroalkanesulfonic Acids and Salts from Fluorovinyl Ethers
- Publication number 20110039203
- Publication date Feb 17, 2011
- E.I. du Pont de Nemours and Company
- CHRISTOPHER P. JUNK
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR MEMBRANE PROTECTION DURING REACTIVE ION/PLASMA ETCHING P...
- Publication number 20100112820
- Publication date May 6, 2010
- E.I. du Pont de Nemours and Company
- CHESTER E. BALUT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCREEN-PRINTABLE ENCAPSULANTS BASED ON SOLUBLE POLYBENZOXAZOLES
- Publication number 20090141425
- Publication date Jun 4, 2009
- Thomas Eugene Dueber
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorinated monomers, fluorinated polymers having polycyclic groups...
- Publication number 20060167284
- Publication date Jul 27, 2006
- Andrew E. Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorinated polymers useful as photoresists, and processes for micr...
- Publication number 20060166129
- Publication date Jul 27, 2006
- Andrew Edward Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Fluorinated polymers having polycyclic groups with fused 4-membered...
- Publication number 20050277052
- Publication date Dec 15, 2005
- Andrew E. Feiring
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Dissolution inhibitors in photoresist compositions for microlithogr...
- Publication number 20050260519
- Publication date Nov 24, 2005
- Larry L. Berger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bases and surfactants and their use in photoresist compositions for...
- Publication number 20050100814
- Publication date May 12, 2005
- Larry L. Berger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compositions for microlithography
- Publication number 20040033436
- Publication date Feb 19, 2004
- Larry L. Berger
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymers for photoresist compositions for microlithography
- Publication number 20030211417
- Publication date Nov 13, 2003
- Michael Fryd
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

FRANK LEONARD SCHADT, III

Person

Patents Grantslast 30 patents

Screen-printable encapsulants based on soluble polybenzoxazoles

Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers

Hydrofluoroalkanesulfonic acids from fluorovinyl ethers

Photoresist compositions and processes for preparing the same

Low-polydispersity photoimageable acrylic polymers, photoresists an...

Photoresists comprising polymers derived from fluoroalcohol-substit...

Low-polydispersity photoimageable polymers and photoresists and pro...

Fluorinated monomers, fluorinated polymers having polycyclic groups...

Fluorinated polymers useful as photoresists, and processes for micr...

Fluorinated polymers having polycyclic groups with fused 4-membered...

Photoresists and processes for microlithography

Fluorinated polymers, photoresists and processes for microlithography

Multilayer elements containing photoresist compositions and their u...

Protecting groups in polymers, photoresists and processes for micro...

Dissolution inhibitors in photoresist compositions for microlithogr...

Polymers blends and their use in photoresist compositions for micro...

Photoresists with hydroxylated, photoacid-cleavable groups

Fluorinated copolymers for microlithography

Compositions for microlithography

Polymers for photoresist compositions for microlithography

Protecting groups in polymers, photoresists and processes for micro...

Photoresists and processes for microlithography

Fluorinated polymers having ester groups and photoresists for micro...

Preparation and use of EXO-2-fluoroalkyl(bicyclo[2.2.1] hept-5-enes)

Copolymers for photoresists and processes therefor

Photoresists, polymers and processes for microlithography

Patents Applicationslast 30 patents

Hydrofluoroalkanesulfonic Acids and Salts from Fluorovinyl Ethers

METHOD FOR MEMBRANE PROTECTION DURING REACTIVE ION/PLASMA ETCHING P...

SCREEN-PRINTABLE ENCAPSULANTS BASED ON SOLUBLE POLYBENZOXAZOLES

Fluorinated monomers, fluorinated polymers having polycyclic groups...

Fluorinated polymers useful as photoresists, and processes for micr...

Fluorinated polymers having polycyclic groups with fused 4-membered...

Dissolution inhibitors in photoresist compositions for microlithogr...

Bases and surfactants and their use in photoresist compositions for...

Compositions for microlithography

Polymers for photoresist compositions for microlithography