Frank Sobel

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Meiningen, DE

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Patents Grantslast 30 patents

Information Patent Grant
Mask blank for use in EUV lithography and method for its production
- Patent number 7,517,617
- Issue date Apr 14, 2009
- Schott AG
- Lutz Aschke
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Attenuating phase shift mask blank and photomask
- Patent number 7,029,803
- Issue date Apr 18, 2006
- Schott AG
- Hans Becker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Attenuated phase shift mask blank and photomask
- Publication number 20070076833
- Publication date Apr 5, 2007
- Hans Becker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of producing a mask blank for photolithographic applications...
- Publication number 20060115744
- Publication date Jun 1, 2006
- Lutz Aschke
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for manufacturing of a mask blank for EUV photolithography a...
- Publication number 20060008749
- Publication date Jan 12, 2006
- Frank Sobel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Attenuating phase shift mask blank and photomask
- Publication number 20050053845
- Publication date Mar 10, 2005
- SCHOTT GLAS
- Hans Becker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mask blank for use in EUV lithography and method for its production
- Publication number 20040234870
- Publication date Nov 25, 2004
- Lutz Aschke
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photo mask blank, photo mask, method and apparatus for manufacturin...
- Publication number 20040231971
- Publication date Nov 25, 2004
- Hans Becker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...