Frank STAALS

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,287,582
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 12,197,136
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 12,112,260
- Issue date Oct 8, 2024
- ASML Netherlands B.V.
- Lorenzo Tripodi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,050,406
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 11,768,442
- Issue date Sep 26, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,733,615
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system to monitor a process apparatus
- Patent number 11,733,610
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,586,114
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Separation of contributions to metrology data
- Patent number 11,520,239
- Issue date Dec 6, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 11,513,442
- Issue date Nov 29, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 11,487,209
- Issue date Nov 1, 2022
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimization of a lithographic process
- Patent number 11,480,884
- Issue date Oct 25, 2022
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for monitoring a lithographic manufacturing p...
- Patent number 11,422,476
- Issue date Aug 23, 2022
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and method for determining a characteristic rel...
- Patent number 11,385,554
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Miguel Garcia Granda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining contribution to a fingerprint
- Patent number 11,378,891
- Issue date Jul 5, 2022
- ASML Netherlands B.V.
- Davit Harutyunyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method for a scanning exposure apparatus
- Patent number 11,360,395
- Issue date Jun 14, 2022
- ASML Netherlands B.V.
- Valerio Altini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,314,174
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Laurentius Cornelius De Winter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,204,557
- Issue date Dec 21, 2021
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining a fingerprint of a performance...
- Patent number 11,194,258
- Issue date Dec 7, 2021
- ASML Netherlands B.V.
- Léon Maria Albertus Van Der Logt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computational metrology
- Patent number 11,067,902
- Issue date Jul 20, 2021
- ASML Netherlands B.V.
- Patrick Warnaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,054,754
- Issue date Jul 6, 2021
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Level sensor apparatus, method of measuring topographical variation...
- Patent number 11,029,614
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G05 - CONTROLLING REGULATING
Information Patent Grant
Metrology robustness based on through-wavelength similarity
- Patent number 10,871,716
- Issue date Dec 22, 2020
- ASML Netherlands B.V.
- Miguel Garcia Granda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window tracker
- Patent number 10,866,523
- Issue date Dec 15, 2020
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for monitoring a lithographic manufacturing p...
- Patent number 10,866,527
- Issue date Dec 15, 2020
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining contribution to a fingerprint
- Patent number 10,816,904
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Davit Harutyunyan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimization of a lithographic process
- Patent number 10,802,408
- Issue date Oct 13, 2020
- ASML Netherlands B.V.
- Everhardus Cornelis Mos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for reticle optimization
- Patent number 10,725,372
- Issue date Jul 28, 2020
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement method, inspection apparatus, patterning device, lithog...
- Patent number 10,691,030
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining a fingerprint of a performance...
- Patent number 10,649,342
- Issue date May 12, 2020
- ASML Netherlands B.V.
- Léon Maria Albertus Van Der Logt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Metrology Apparatus And Method For Determining A Characteristic Of...
- Publication number 20240412067
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Lorenzo Tripodi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20240012337
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS
- Publication number 20240004299
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND PATTERNING DEVICES AND APPARATUSES FOR MEASURING FOCUS...
- Publication number 20230305407
- Publication date Sep 28, 2023
- ASML NETHERLANDS B.V.
- Fei LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...
- Publication number 20230161264
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20230058839
- Publication date Feb 23, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA
- Publication number 20230042759
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...
- Publication number 20230021079
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR INFERRING A PROCESSING PARAMETER SUCH AS FOCUS AND ASSOC...
- Publication number 20220357672
- Publication date Nov 10, 2022
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20220342319
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Davit Harutyunyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...
- Publication number 20220146946
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND PATTERNING DEVICES AND APPARATUSES FOR MEASURING FOCUS...
- Publication number 20220091517
- Publication date Mar 24, 2022
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...
- Publication number 20210364929
- Publication date Nov 25, 2021
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20210349395
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...
- Publication number 20210149312
- Publication date May 20, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTROL METHOD FOR A SCANNING EXPOSURE APPARATUS
- Publication number 20210096472
- Publication date Apr 1, 2021
- ASML NETHERLANDS B.V.
- Valerio ALTINI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...
- Publication number 20210018847
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
- Publication number 20210003927
- Publication date Jan 7, 2021
- ASML NETHERLANDS B.V.
- Davit Harutyunyan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS
- Publication number 20200356012
- Publication date Nov 12, 2020
- ASML NETHERLANDS B.V.
- Everhardus Cornelis MOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...
- Publication number 20200348603
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200264522
- Publication date Aug 20, 2020
- ASML NETHERLANDS B.V.
- Laurentius Cornelius DE WINTER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20200249576
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING A FINGERPRINT OF A PERFORMANCE...
- Publication number 20200233310
- Publication date Jul 23, 2020
- ASML NATHERLANDS B. V.
- Léon Maria Albertus VAN DER LOGT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200159130
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200142324
- Publication date May 7, 2020
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS
- Publication number 20200124968
- Publication date Apr 23, 2020
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic Rel...
- Publication number 20200026182
- Publication date Jan 23, 2020
- ASML NETHERLANDS B.V.
- Miguel GARCIA GRANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...
- Publication number 20200004164
- Publication date Jan 2, 2020
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY ROBUSTNESS BASED ON THROUGH-WAVELENGTH SIMILARITY
- Publication number 20190377264
- Publication date Dec 12, 2019
- ASML NETHERLANDS B.V.
- Miguel GARCIA GRANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic of...
- Publication number 20190378012
- Publication date Dec 12, 2019
- ASML NETHERLANDS B.V.
- Lorenzo Tripodi
- G06 - COMPUTING CALCULATING COUNTING

Frank STAALS

Person

Patents Grantslast 30 patents

Method for controlling a lithographic apparatus and associated appa...

Method of determining control parameters of a device manufacturing...

Metrology apparatus and method for determining a characteristic of...

Method for controlling a lithographic apparatus and associated appa...

Method of determining control parameters of a device manufacturing...

Methods and patterning devices and apparatuses for measuring focus...

Method and system to monitor a process apparatus

Wavefront optimization for tuning scanner based on performance matc...

Separation of contributions to metrology data

Method of determining control parameters of a device manufacturing...

Method for controlling a lithographic apparatus and associated appa...

Method for optimization of a lithographic process

Methods and apparatus for monitoring a lithographic manufacturing p...

Metrology apparatus and method for determining a characteristic rel...

Method for determining contribution to a fingerprint

Control method for a scanning exposure apparatus

Methods and patterning devices and apparatuses for measuring focus...

Methods and patterning devices and apparatuses for measuring focus...

Method and apparatus for determining a fingerprint of a performance...

Computational metrology

Methods and patterning devices and apparatuses for measuring focus...

Level sensor apparatus, method of measuring topographical variation...

Metrology robustness based on through-wavelength similarity

Process window tracker

Methods and apparatus for monitoring a lithographic manufacturing p...

Method for determining contribution to a fingerprint

Method for optimization of a lithographic process

Method and apparatus for reticle optimization

Measurement method, inspection apparatus, patterning device, lithog...

Method and apparatus for determining a fingerprint of a performance...

Patents Applicationslast 30 patents

Metrology Apparatus And Method For Determining A Characteristic Of...

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS

METHODS AND PATTERNING DEVICES AND APPARATUSES FOR MEASURING FOCUS...

WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA

METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...

METHOD FOR INFERRING A PROCESSING PARAMETER SUCH AS FOCUS AND ASSOC...

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...

METHODS AND PATTERNING DEVICES AND APPARATUSES FOR MEASURING FOCUS...

WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...

COMPUTATIONAL METROLOGY

METHOD OF DETERMINING CONTROL PARAMETERS OF A DEVICE MANUFACTURING...

CONTROL METHOD FOR A SCANNING EXPOSURE APPARATUS

METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

METHOD FOR OPTIMIZATION OF A LITHOGRAPHIC PROCESS

METHOD FOR CONTROLLING A LITHOGRAPHIC APPARATUS AND ASSOCIATED APPA...

Methods and Patterning Devices and Apparatuses for Measuring Focus...

COMPUTATIONAL METROLOGY

METHOD AND APPARATUS FOR DETERMINING A FINGERPRINT OF A PERFORMANCE...

Methods and Patterning Devices and Apparatuses for Measuring Focus...

Methods and Patterning Devices and Apparatuses for Measuring Focus...

METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS

Metrology Apparatus and Method for Determining a Characteristic Rel...

METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...

METROLOGY ROBUSTNESS BASED ON THROUGH-WAVELENGTH SIMILARITY

Metrology Apparatus and Method for Determining a Characteristic of...