Frank Yun Lin

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Fabrication of a silicon structure and deep silicon etch with profi...
- Patent number 9,865,472
- Issue date Jan 9, 2018
- Lam Research Corporation
- Robert Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of a silicon structure and deep silicon etch with profi...
- Patent number 9,330,926
- Issue date May 3, 2016
- Lam Research Corporation
- Robert Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for achieving smooth side walls after Bosch etch process
- Patent number 8,871,105
- Issue date Oct 28, 2014
- Lam Research Corporation
- Jaroslaw W. Winniczek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line end shortening reduction during etch
- Patent number 8,668,805
- Issue date Mar 11, 2014
- Lam Research Corporation
- Gowri Kota
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for providing high etch rate
- Patent number 8,609,548
- Issue date Dec 17, 2013
- Lam Research Corporation
- Qing Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus with control of plasma excit...
- Patent number 8,480,913
- Issue date Jul 9, 2013
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control and N/P loading in dual doped gat...
- Patent number 7,682,980
- Issue date Mar 23, 2010
- Lam Research Corporation
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line end shortening reduction during etch
- Patent number 7,491,343
- Issue date Feb 17, 2009
- Lam Research Corporation
- Yoko Yamaguchi Adams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line end shortening reduction during etch
- Patent number 7,407,597
- Issue date Aug 5, 2008
- Lam Research Corporation
- Gowri Kota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control and N/P loading in dual doped gat...
- Patent number 7,186,661
- Issue date Mar 6, 2007
- Lam Research Corporation
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum plasma processor method
- Patent number 6,897,156
- Issue date May 24, 2005
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma excitation coil
- Patent number 6,646,385
- Issue date Nov 11, 2003
- Lam Research Corporation
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching organic antireflective coating
- Patent number 6,617,257
- Issue date Sep 9, 2003
- Lam Research Corporation
- Tuqiang Ni
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Vacuum plasma processor apparatus and method
- Patent number 6,531,029
- Issue date Mar 11, 2003
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving uniformity and reducing etch rate variation of...
- Patent number 6,514,378
- Issue date Feb 4, 2003
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma excitation coil
- Patent number 6,441,555
- Issue date Aug 27, 2002
- Lam Research Corporation
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Copper replenishment technique for precision copper plating system
- Patent number 5,997,712
- Issue date Dec 7, 1999
- Cutek Research, Inc.
- Chiu H. Ting
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Patents Applicationslast 30 patents

Information Patent Application
MULTI-LOCATION GAS INJECTION TO IMPROVE UNIFORMITY IN RAPID ALTERNA...
- Publication number 20220108875
- Publication date Apr 7, 2022
- LAM RESEARCH CORPORATION
- William THIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...
- Publication number 20160233102
- Publication date Aug 11, 2016
- LAM RESEARCH CORPORATION
- Robert CHEBI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ACHIEVING SMOOTH SIDE WALLS AFTER BOSCH ETCH PROCESS
- Publication number 20130237062
- Publication date Sep 12, 2013
- Jaroslaw W. Winniczek
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD FOR PROVIDING HIGH ETCH RATE
- Publication number 20120309194
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- Qing Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS WITH CONTROL OF PLASMA EXCIT...
- Publication number 20110253673
- Publication date Oct 20, 2011
- LAM RESEARCH CORPORATION
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...
- Publication number 20090184089
- Publication date Jul 23, 2009
- LAM RESEARCH CORPORATION
- Robert CHEBI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE END SHORTENING REDUCTION DURING ETCH
- Publication number 20080268211
- Publication date Oct 30, 2008
- LAM RESEARCH CORPORATION
- Gowri Kota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE END SHORTENING REDUCTION DURING ETCH
- Publication number 20080087639
- Publication date Apr 17, 2008
- Lam Research Corporation
- Yoko Yamaguchi Adams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line end shortening reduction during etch
- Publication number 20080087637
- Publication date Apr 17, 2008
- LAM RESEARCH CORPORATION
- Gowri Kota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...
- Publication number 20070119545
- Publication date May 31, 2007
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...
- Publication number 20070117399
- Publication date May 24, 2007
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to improve profile control and n/p loading in dual doped gat...
- Publication number 20040175950
- Publication date Sep 9, 2004
- Lam Research Corporation
- Helene Del Puppo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum plasma processor apparatus and method
- Publication number 20030106645
- Publication date Jun 12, 2003
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma excitation coil
- Publication number 20030001511
- Publication date Jan 2, 2003
- Lam Research Corporation
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching organic antireflective coating
- Publication number 20020182881
- Publication date Dec 5, 2002
- Tuqiang Ni
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Plasma processing method and apparatus with control of plasma excit...
- Publication number 20020139477
- Publication date Oct 3, 2002
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS

Frank Yun Lin

Person

Patents Grantslast 30 patents

Fabrication of a silicon structure and deep silicon etch with profi...

Fabrication of a silicon structure and deep silicon etch with profi...

Method for achieving smooth side walls after Bosch etch process

Line end shortening reduction during etch

Method for providing high etch rate

Plasma processing method and apparatus with control of plasma excit...

Method to improve profile control and N/P loading in dual doped gat...

Line end shortening reduction during etch

Line end shortening reduction during etch

Method to improve profile control and N/P loading in dual doped gat...

Vacuum plasma processor method

Plasma excitation coil

Method of plasma etching organic antireflective coating

Vacuum plasma processor apparatus and method

Method for improving uniformity and reducing etch rate variation of...

Plasma excitation coil

Copper replenishment technique for precision copper plating system

Patents Applicationslast 30 patents

MULTI-LOCATION GAS INJECTION TO IMPROVE UNIFORMITY IN RAPID ALTERNA...

FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...

METHOD FOR ACHIEVING SMOOTH SIDE WALLS AFTER BOSCH ETCH PROCESS

METHOD FOR PROVIDING HIGH ETCH RATE

PLASMA PROCESSING METHOD AND APPARATUS WITH CONTROL OF PLASMA EXCIT...

FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...

LINE END SHORTENING REDUCTION DURING ETCH

LINE END SHORTENING REDUCTION DURING ETCH

Line end shortening reduction during etch

METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...

METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GAT...

Method to improve profile control and n/p loading in dual doped gat...

Vacuum plasma processor apparatus and method

Plasma excitation coil

Method of plasma etching organic antireflective coating

Plasma processing method and apparatus with control of plasma excit...