Franz-Josef Stickel

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for machining a workpiece in the production of an optical el...
- Patent number 11,980,990
- Issue date May 14, 2024
- Carl Zeiss SMT GmbH
- Manfred Matena
- B24 - GRINDING POLISHING
Information Patent Grant
Method for polishing a workpiece in the production of an optical el...
- Patent number 11,213,926
- Issue date Jan 4, 2022
- Carl Zeiss SMT GmbH
- Andreas Wolpert
- B24 - GRINDING POLISHING
Information Patent Grant
Lithography apparatus and method
- Patent number 10,831,114
- Issue date Nov 10, 2020
- Carl Zeiss SMT GmbH
- Björn Liebaug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,317,802
- Issue date Jun 11, 2019
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for producing an optical element for an optical system, in p...
- Patent number 10,146,138
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G02 - OPTICS
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,031,423
- Issue date Jul 24, 2018
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Surface correction of mirrors with decoupling coating
- Patent number 9,921,483
- Issue date Mar 20, 2018
- Carl Zeiss SMT GmbH
- Oliver Dier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,746,778
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mirror for use in a microlithography projection exposure apparatus
- Patent number 9,568,845
- Issue date Feb 14, 2017
- Carl Zeiss SMT GmbH
- Martin Rocktaeschel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,316,929
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Surface correction on coated mirrors
- Patent number 9,249,501
- Issue date Feb 2, 2016
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Projection objective for microlithography, projection exposure appa...
- Patent number 8,228,483
- Issue date Jul 24, 2012
- Carl Zeiss SMT GmbH
- Ulrich Loering
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithography lens system and projection exposure system provided wit...
- Patent number 7,551,361
- Issue date Jun 23, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Objective with at least one aspheric lens
- Patent number 6,831,794
- Issue date Dec 14, 2004
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICOND...
- Publication number 20230288662
- Publication date Sep 14, 2023
- Carl Zeiss SMT GMBH
- Franz-Josef STICKEL
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD FOR POLISHING A WORKPIECE IN THE PRODUCTION OF AN OPTICAL EL...
- Publication number 20200376623
- Publication date Dec 3, 2020
- Carl Zeiss SMT GMBH
- Andreas WOLPERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MACHINING A WORKPIECE IN THE PRODUCTION OF AN OPTICAL EL...
- Publication number 20200198086
- Publication date Jun 25, 2020
- Carl Zeiss SMT GMBH
- Manfred Matena
- B24 - GRINDING POLISHING
Information Patent Application
LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20190377273
- Publication date Dec 12, 2019
- Carl Zeiss SMT GMBH
- Björn Liebaug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20190310555
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20180299784
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method For Producing An Optical Element For An Optical System, In P...
- Publication number 20170315452
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20170315449
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING
- Publication number 20160209750
- Publication date Jul 21, 2016
- Carl Zeiss SMT GMBH
- Oliver DIER
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20160195818
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
EUV Exposure Apparatus
- Publication number 20130141707
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
SURFACE CORRECTION ON COATED MIRRORS
- Publication number 20120300184
- Publication date Nov 29, 2012
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MIRROR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS
- Publication number 20120229784
- Publication date Sep 13, 2012
- Carl Zeiss SMT GMBH
- Martin ROCKTAESCHEL
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPA...
- Publication number 20100195070
- Publication date Aug 5, 2010
- Carl Zeiss SMT AG
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Lens System And Projection Exposure System Provided Wit...
- Publication number 20070258134
- Publication date Nov 8, 2007
- Hans-Juergen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM
- Publication number 20070024982
- Publication date Feb 1, 2007
- Carl Zeiss SMT AG
- Franz Josef Stickel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OBJECTIVE WITH AT LEAST ONE ASPHERIC LENS
- Publication number 20040212899
- Publication date Oct 28, 2004
- Karl-Heinz Schuster
- G02 - OPTICS

Franz-Josef Stickel

Person

Patents Grantslast 30 patents

Method for machining a workpiece in the production of an optical el...

Method for polishing a workpiece in the production of an optical el...

Lithography apparatus and method

EUV exposure apparatus with reflective elements having reduced infl...

EUV exposure apparatus with reflective elements having reduced infl...

Method for producing an optical element for an optical system, in p...

EUV exposure apparatus with reflective elements having reduced infl...

Surface correction of mirrors with decoupling coating

EUV exposure apparatus with reflective elements having reduced infl...

Mirror for use in a microlithography projection exposure apparatus

EUV exposure apparatus with reflective elements having reduced infl...

Surface correction on coated mirrors

Projection objective for microlithography, projection exposure appa...

Lithography lens system and projection exposure system provided wit...

Objective with at least one aspheric lens

Patents Applicationslast 30 patents

METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICOND...

METHOD FOR POLISHING A WORKPIECE IN THE PRODUCTION OF AN OPTICAL EL...

METHOD FOR MACHINING A WORKPIECE IN THE PRODUCTION OF AN OPTICAL EL...

LITHOGRAPHY APPARATUS AND METHOD

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

Method For Producing An Optical Element For An Optical System, In P...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

EUV Exposure Apparatus

SURFACE CORRECTION ON COATED MIRRORS

MIRROR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPA...

Lithography Lens System And Projection Exposure System Provided Wit...

IMAGING SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM

OBJECTIVE WITH AT LEAST ONE ASPHERIC LENS